Abstract: Integrated circuits and methods of manufacturing such circuits are disclosed herein that feature metal line-via matrix insertion after place and route processes are performed and/or completed for the integrated circuit's layout. The metal line-via matrix consists of one or more additional metal lines and one or more additional vias that are inserted into the integrated circuit's layout at a specific point to lower the current and current density through a first conductive path that has been determined to suffer from electromigration, IR-voltage drop, and/or jitter. Specifically, the metal line-via matrix provides one or more auxiliary conductive paths to divert and carry a portion of the current that would otherwise flow through the first conductive path. This mitigates electromigration issues and IR-voltage drop along the first conductive path. It may also help alleviate problems due to jitter along the path.

Abstract: A three-dimensional integrated circuit (3D-IC) architecture incorporates multiple layers, each layer including at least one die and at least one switch to connect the dies on the different layers. In some aspects, a power distribution network (PDN) is routed from a first layer through the switches to supply power to at least one other layer, thereby reducing routing congestion on the layers. The switches can be placed around the periphery of an IC package to improve heat dissipation (e.g., by improving heat transfer from the center to the edge of the IC package). The switches can be used for routing test signals and/or other signals between layers, thereby improving test functionality and/or fault recovery.

Abstract: Methods and an apparatus related to generating parameters and guidelines used in the manufacture of semiconductor IC devices are described. A method includes measuring a first oscillating signal produced by a first ring oscillator that includes a first interconnect provided in a first interconnect layer of an IC, selecting a first mode of operation for a second ring oscillator circuit that includes a second interconnect disposed in alignment with the first interconnect, selecting a second mode of operation for the second ring oscillator circuit, and determining one or more characteristics of the first interconnect based on a difference in frequency of the first oscillating signal produced when the second ring oscillator circuit is operated in the first mode and frequency of the first oscillating signal when the second ring oscillator circuit is operated in the second mode.

Abstract: Integrated circuits and methods of manufacturing such circuits are disclosed herein that feature metal line-via matrix insertion after place and route processes are performed and/or completed for the integrated circuit's layout. The metal line-via matrix consists of one or more additional metal lines and one or more additional vias that are inserted into the integrated circuit's layout at a specific point to lower the current and current density through a first conductive path that has been determined to suffer from electromigration, IR-voltage drop, and/or jitter. Specifically, the metal line-via matrix provides one or more auxiliary conductive paths to divert and carry a portion of the current that would otherwise flow through the first conductive path. This mitigates electromigration issues and IR-voltage drop along the first conductive path. It may also help alleviate problems due to jitter along the path.

Abstract: Integrated circuits and methods of manufacturing such circuits are disclosed herein that feature metal line-via matrix insertion after place and route processes are performed and/or completed for the integrated circuit's layout. The metal line-via matrix consists of one or more additional metal lines and one or more additional vias that are inserted into the integrated circuit's layout at a specific point to lower the current and current density through a first conductive path that has been determined to suffer from electromigration, IR-voltage drop, and/or jitter. Specifically, the metal line-via matrix provides one or more auxiliary conductive paths to divert and carry a portion of the current that would otherwise flow through the first conductive path. This mitigates electromigration issues and IR-voltage drop along the first conductive path. It may also help alleviate problems due to jitter along the path.

Abstract: Methods and an apparatus related to generating parameters and guidelines used in the manufacture of semiconductor IC devices are described. A method includes measuring a first oscillating signal produced by a first ring oscillator that includes a first interconnect provided in a first interconnect layer of an IC, selecting a first mode of operation for a second ring oscillator circuit that includes a second interconnect disposed in alignment with the first interconnect, selecting a second mode of operation for the second ring oscillator circuit, and determining one or more characteristics of the first interconnect based on a difference in frequency of the first oscillating signal produced when the second ring oscillator circuit is operated in the first mode and frequency of the first oscillating signal when the second ring oscillator circuit is operated in the second mode.

Abstract: Aspects disclosed in the detailed description include optimizing interconnect designs in low-power integrated circuits (ICs). In this regard, in one aspect, functional blocks having substantially correlated power utilization patterns are grouped into a power-related cluster to share a sleeping cell, thus leading to a reduced number of sleep transistors and a simplified interconnect design in a low-power IC. In another aspect, functional blocks having higher block temperatures are separated into more than one power-related cluster, improving heat dissipation in the low-power IC. A simulated annealing (SA) process is employed to determine an optimized placement for the low-power IC based on a power-related cost function that includes a power-related parameter and a heat-related parameter. By running the SA process based on the power-related cost function, it is possible to determine the optimized placement that leads to the reduced number of sleep transistors and improved heat dissipation in the low-power IC.

Abstract: A three-dimensional integrated circuit (3D-IC) architecture incorporates multiple layers, each layer including at least one die and at least one switch to connect the dies on the different layers. In some aspects, a power distribution network (PDN) is routed from a first layer through the switches to supply power to at least one other layer, thereby reducing routing congestion on the layers. The switches can be placed around the periphery of an IC package to improve heat dissipation (e.g., by improving heat transfer from the center to the edge of the IC package). The switches can be used for routing test signals and/or other signals between layers, thereby improving test functionality and/or fault recovery.

Abstract: Integrated circuits and methods of manufacturing such circuits are disclosed herein that feature metal line-via matrix insertion after place and route processes are performed and/or completed for the integrated circuit's layout. The metal line-via matrix consists of one or more additional metal lines and one or more additional vias that are inserted into the integrated circuit's layout at a specific point to lower the current and current density through a first conductive path that has been determined to suffer from electromigration, IR-voltage drop, and/or jitter. Specifically, the metal line-via matrix provides one or more auxiliary conductive paths to divert and carry a portion of the current that would otherwise flow through the first conductive path. This mitigates electromigration issues and IR-voltage drop along the first conductive path. It may also help alleviate problems due to jitter along the path.