Patents by Inventor Juyong JANG

Juyong JANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240160335
    Abstract: An electronic device is provided. The electronic device includes a display and a processor, wherein the processor is set to control the display to display an execution screen of a camera application through a first region of the display and display an image list linked with the camera application through a second region different from the first region of the display in response to the execution of the camera application, the image list including a plurality of images and the plurality of images including still images and moving images, acquire a first image captured using the camera application in response to an image capture request, control the display to display a first temporary image corresponding to the first image in the image list through the second region when it is determined that post-processing of the first image is required, and control the display to display a first post-processed image.
    Type: Application
    Filed: January 22, 2024
    Publication date: May 16, 2024
    Inventors: Minho KIM, Juyong CHOI, Jinhyun KIM, Jongwoon JANG
  • Patent number: 11967491
    Abstract: The present invention provides a method and apparatus for cleaning parts used in substrate processing. In a method for cleaning parts of a substrate processing, plasma generated from cleaning gas is supplied together with a cooling medium to clean the parts, but the cooling medium may be provided at a lower temperature than the plasma.
    Type: Grant
    Filed: February 16, 2021
    Date of Patent: April 23, 2024
    Assignee: SEMES CO., LTD.
    Inventors: Soon-Cheon Cho, Su Hyung Lee, Youngran Ko, Juyong Jang
  • Publication number: 20210257193
    Abstract: The present invention provides a method and apparatus for cleaning parts used in substrate processing. In a method for cleaning parts of a substrate processing, plasma generated from cleaning gas is supplied together with a cooling medium to clean the parts, but the cooling medium may be provided at a lower temperature than the plasma.
    Type: Application
    Filed: February 16, 2021
    Publication date: August 19, 2021
    Applicant: SEMES CO., LTD.
    Inventors: SOON-CHEON CHO, SU HYUNG LEE, YOUNGRAN KO, JUYONG JANG
  • Patent number: 10328441
    Abstract: An embodiment includes a coating apparatus comprising: a support unit for supporting a coating object; and a spray assembly for spraying a fluid which includes a coating material to be coated by the coating object supported on the support unit. The spray assembly comprises: a nozzle unit where the fluid is sprayed; and a fluid supply unit for supplying the fluid to the nozzle unit. The nozzle unit comprises: a body including a passageway for the fluid therein and a dielectric unit provided with a dielectric material; and a plasma source for generating plasma from the fluid which flows to an area adjacent to inner lateral surface of the dielectric unit. The plasma source comprises: a power electrode applying a power; and a ground electrode to be grounded.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: June 25, 2019
    Assignee: Semes Co., Ltd.
    Inventor: Juyong Jang
  • Publication number: 20170312770
    Abstract: An embodiment includes a coating apparatus comprising: a support unit for supporting a coating object; and a spray assembly for spraying a fluid which includes a coating material to be coated by the coating object supported on the support unit. The spray assembly comprises: a nozzle unit where the fluid is sprayed; and a fluid supply unit for supplying the fluid to the nozzle unit. The nozzle unit comprises: a body including a passageway for the fluid therein and a dielectric unit provided with a dielectric material; and a plasma source for generating plasma from the fluid which flows to an area adjacent to inner lateral surface of the dielectric unit. The plasma source comprises: a power electrode applying a power; and a ground electrode to be grounded.
    Type: Application
    Filed: March 24, 2017
    Publication date: November 2, 2017
    Applicant: SEMES CO., LTD.
    Inventor: Juyong JANG