Abstract: The present disclosure is directed to a repair method including providing a scanning electron microscope (SEM) with an electron beam directed at a defective multilayer photomask disposed in the SEM; disposing a droplet of a liquid precursor on a surface of the defective multilayer photomask with a defect; pointing a gas flow on the droplet, wherein the gas flow is configured to planarize the droplet; and repairing the defect in the defective multilayer photomask by performing a chemical reaction on the planarized droplet. A photomask repair system and a photomask repair tool is also provided.

Abstract: A 3D nanoprinter electron beam lithography module for a lithography system, such as a scanning electron microscope (SEM) or an environmental SEM (ESEM) with a beam blanker and electron beam lithography attachment, but generally applicable to any electron beam lithography capable system. The module is comprised of an in-situ spin-coating stage that is compatible with a cooling-SEM stage, with a spin-coating motor, a spin-coating sample stub, a liquid waste collector cup, a liquid dispensing arm holding a tube bundle that is connected via tubing to micro-syringe pumps or a pressure driven flow controller or pumps connected to fluid reservoirs, an electron beam scan generator control box, electrical feedthroughs, control electronics, and a computing system responsible for controlling the entire module. The dispensing arm can be controlled by a servo motor.