Abstract: A method is provided for producing a visual hydrogen sensor and to a sensor produced in this manner, the sensor allowing the presence of hydrogen gas in a medium to be detected by the naked eye as a result of a change of color in the sensor. The method involves the deposition of thin porous layers of oxides that do not absorb visible light in their completely oxidized state which become colored when they are partially reduced. This deposition is carried out using vapor phase deposition (PVD) in a glancing angle configuration (GLAD). The method also involves the preparation of a solution of an active metal precursor capable of dissociating the hydrogen molecule and a carrier vector and the deposition of this solution on the oxide layer in order to incorporate a minimum quantity of active metal within the pores of the oxide layer in the form of nanoparticles.

Abstract: A method is provided for producing a visual hydrogen sensor and to a sensor produced in this manner, the sensor allowing the presence of hydrogen gas in a medium to be detected by the naked eye as a result of a change of colour in the sensor. The method involves the deposition of thin porous layers of oxides that do not absorb visible light in their completely oxidised state which become coloured when they are partially reduced. This deposition is carried out using vapour phase deposition (PVD) in a glancing angle configuration (GLAD). The method also involves the preparation of a solution of an active metal precursor capable of dissociating the hydrogen molecule and a carrier vector and the deposition of this solution on the oxide layer in order to incorporate a minimum quantity of active metal within the pores of the oxide layer in the form of nanoparticles.

Abstract: The present invention relates to the procedure for the preparation of barrier and/or dielectric layers on a substrate, characterized in that it comprises the following stages: (a) cleaning the substrate, (b) placing the substrate on a sample holder and the introduction thereof into a vacuum chamber, (c) dosage of said vacuum chamber with an inert gas and a reactive gas, (d) injection into the vacuum chamber of a volatile precursor that has at least one cation of the compound to be deposited, (e) activation of a radio frequency source and activation of at least one magnetron, (f) decomposition of the volatile precursor using plasma, the reaction between the cation of the volatile precursor and the reactive gas occurring at the same time that the reaction between the reactive gas contained in the plasma and the cation from the target by sputtering takes place, thus leading to the deposition of the film onto the substrate. The device for carrying out said method is also object of the invention.