Patents by Inventor Juan Valdivia, III

Juan Valdivia, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for determining field non-uniformities of a wafer processing chamber using a wafer processing parameter
    Patent number: 10763142
    Abstract: A system for controlling a condition of a wafer processing chamber is disclosed. According the principles of the present disclosure, the system includes memory and a first controller. The memory stores a plurality of profiles of respective ones of a plurality of first control elements. The plurality of first control elements are arranged throughout the chamber. The first controller determines non-uniformities in a substrate processing parameter associated with the plurality of first control elements. The substrate processing parameter is different than the condition of the chamber. The first controller adjusts at least one of the plurality of profiles based on the non-uniformities in the substrate processing parameter and a sensitivity of the substrate processing parameter to the condition.
    Type: Grant
    Filed: September 21, 2015
    Date of Patent: September 1, 2020
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Marcus Musselman, Juan Valdivia, III, Hua Xiang, Andrew D. Bailey, III, Yoko Yamaguchi, Qian Fu, Aaron Eppler
  • SYSTEM AND METHOD FOR DETERMINING FIELD NON-UNIFORMITIES OF A WAFER PROCESSING CHAMBER USING A WAFER PROCESSING PARAMETER
    Publication number: 20160370796
    Abstract: A system for controlling a condition of a wafer processing chamber is disclosed. According the principles of the present disclosure, the system includes memory and a first controller. The memory stores a plurality of profiles of respective ones of a plurality of first control elements. The plurality of first control elements are arranged throughout the chamber. The first controller determines non-uniformities in a substrate processing parameter associated with the plurality of first control elements. The substrate processing parameter is different than the condition of the chamber. The first controller adjusts at least one of the plurality of profiles based on the non-uniformities in the substrate processing parameter and a sensitivity of the substrate processing parameter to the condition.
    Type: Application
    Filed: September 21, 2015
    Publication date: December 22, 2016
    Inventors: Marcus Musselman, Juan Valdivia, III, Hua Xiang, Andrew D. Bailey, III, Yoko Yamaguchi, Qian Fu, Aaron Eppler