Patents by Inventor Juanita M. PARRIS
Juanita M. PARRIS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11976202Abstract: Layers of energy curable inks and coatings containing little to no photoinitiator, are printed over or are covered with ink or coating layers that are not energy curable but do comprise a photoinitiator. All energy curable inks are then simultaneously cured when exposed to actinic radiation that passes through the ink or coating layers that are not energy curable but comprise photoinitiators.Type: GrantFiled: April 14, 2021Date of Patent: May 7, 2024Assignee: Sun Chemical CorporationInventors: John G. Tiessen, Juanita M. Parris
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Patent number: 11767395Abstract: Described herein is a polar non-aqueous dispersion comprising polar polymeric microparticles in a polar non-aqueous medium, the polar polymeric microparticles being insoluble in the medium and being produced by dispersion polymerization of vinyl monomers such as acrylate monomers in the medium in the presence of a polymeric acrylic stabilizer. Inks, coatings and overprint varnishes are formulated that employ the polar non-aqueous dispersion. Such inks, etc., exhibit superior chemical resistance properties, for example in one-part and two-part systems.Type: GrantFiled: March 13, 2017Date of Patent: September 26, 2023Assignee: Sun Chemical CorporationInventors: Juanita M. Parris, Soichiro Omizu, Carl S. Weisbecker, Josie M. Rosen, Ralph Arcurio, Ramasamy Krishnan, Alex Chudolij
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Patent number: 11707945Abstract: A method for printing on a substrate comprises two steps. The first step consists essentially of: applying onto a substrate one or more layers of an energy curable ink and applying one or more layers of a water-based coating over the top of the one or more layers of energy curable ink. The second step comprises the steps of, in any order: a) drying the one or more layers of water-based coating, and b) actinically or electron beam curing simultaneously all the energy curable ink layers.Type: GrantFiled: August 12, 2020Date of Patent: July 25, 2023Assignee: SUN CHEMICAL CORPORATIONInventors: John G. Tiessen, Juanita M. Parris, Russell Schwartz
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Publication number: 20220340768Abstract: Layers of energy curable inks and coatings containing little to no photoinitiator, are printed over or are covered with ink or coating layers that are not energy curable but do comprise a photoinitiator. All energy curable inks are then simultaneously cured when exposed to actinic radiation that passes through the ink or coating layers that are not energy curable but comprise photoinitiators.Type: ApplicationFiled: April 14, 2021Publication date: October 27, 2022Applicant: SUN CHEMICAL CORPORATIONInventors: John G. Tiessen, Juanita M. Parris
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Patent number: 11306216Abstract: Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.Type: GrantFiled: June 19, 2020Date of Patent: April 19, 2022Assignee: Sun Chemical CorporationInventors: Michael J. Jurek, John G. Tiessen, Soichiro Omizu, Juanita M. Parris
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Patent number: 11254830Abstract: Described herein are inks and coating compositions comprising semiconductor metal oxides and composites thereof, which are natural environmentally sustainable materials that may be recycled and/or reused indefinitely. Semiconductor metal oxides offer an alternative to relatively more toxic, non-sustainable, photo and heat-degrading, migrating traditional photoinitiator agents used in actinic radiation curable compositions. The semiconductor metal oxides and composites thereof absorb visible or UV-light as photocatalysts and/or semiconductors, or absorb electron beam radiation, forming radicals for radical events as polymerization reactions and color enhancement events.Type: GrantFiled: January 9, 2019Date of Patent: February 22, 2022Assignee: Sun Chemical CorporationInventors: Aldo G. Bruccoleri, Juanita M. Parris, Richard R. Durand, Jr., Terry Best
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Publication number: 20210087421Abstract: Described herein are inks and coating compositions comprising semiconductor metal oxides and composites thereof, which are natural environmentally sustainable materials that may be recycled and/or reused indefinitely. Semiconductor metal oxides offer an alternative to relatively more toxic, non-sustainable, photo and heat-degrading, migrating traditional photoinitiator agents used in actinic radiation curable compositions. The semiconductor metal oxides and composites thereof absorb visible or UV-light as photocatalysts and/or semiconductors, or absorb electron beam radiation, forming radicals for radical events as polymerization reactions and color enhancement events.Type: ApplicationFiled: January 9, 2019Publication date: March 25, 2021Applicant: SUN CHEMICAL CORPORATIONInventors: Aldo G. Bruccoleri, Juanita M. Parris, Richard R. Durand, Jr., Terry Best
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Publication number: 20200369065Abstract: A method for printing on a substrate comprises two steps. The first step consists essentially of: applying onto a substrate one or more layers of an energy curable ink and applying one or more layers of a water-based coating over the top of the one or more layers of energy curable ink. The second step comprises the steps of, in any order: a) drying the one or more layers of water-based coating, and b) actinically or electron beam curing simultaneously all the energy curable ink layers.Type: ApplicationFiled: August 12, 2020Publication date: November 26, 2020Inventors: John G. Tiessen, Juanita M. Parris, Russell Schwartz
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Publication number: 20200317939Abstract: Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.Type: ApplicationFiled: June 19, 2020Publication date: October 8, 2020Applicant: SUN CHEMICAL CORPORATIONInventors: Michael J. JUREK, John G. TIESSEN, Soichiro OMIZU, Juanita M. PARRIS
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Patent number: 10689500Abstract: Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.Type: GrantFiled: February 8, 2017Date of Patent: June 23, 2020Assignee: Sun Chemical CorporationInventors: Michael J. Jurek, John G. Tiessen, Soichiro Omizu, Juanita M. Parris
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Publication number: 20190112404Abstract: Described herein is a polar non-aqueous dispersion comprising polar polymeric microparticles in a polar non-aqueous medium, the polar polymeric microparticles being insoluble in the medium and being produced by dispersion polymerization of vinyl monomers such as acrylate monomers in the medium in the presence of a polymeric acrylic stabilizer. Inks, coatings and overprint varnishes are formulated that employ the polar non-aqueous dispersion. Such inks, etc., exhibit superior chemical resistance properties, for example in one-part and two-part systems.Type: ApplicationFiled: March 13, 2017Publication date: April 18, 2019Applicant: SUN CHEMICAL CORPORATIONInventors: Juanita M. Parris, Soichiro Omizu, Carl S. Weisbecker, Josie M. Rosen, Ralph Arcurio, Ramasamy KRISHNAN
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Publication number: 20190062518Abstract: Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.Type: ApplicationFiled: February 8, 2017Publication date: February 28, 2019Applicant: SUN CHEMICAL CORPORATIONInventors: Michael J. JUREK, John G. TIESSEN, Soichiro OMIZU, Juanita M. PARRIS