Patents by Inventor Judi Quan Rizzuto

Judi Quan Rizzuto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Insitu hardmask and metal etch in a single etcher
    Patent number: 6159863
    Abstract: A method of manufacturing a semiconductor wafer wherein a layer of hardmask material is formed on the surface of a metal layer formed on a layer of interlayer dielectric formed on a semiconductor substrate on and in which active devices have been formed. A layer of photoresist is formed on the surface of the layer of hardmask material, patterned and developed exposing portions of the underlying layer of hardmask material. The semiconductor wafer is placed in an etched and the layer of hardmask material is etched in a first process utilizing a combination fluorine and chlorine chemistry and the metal layer is etched in a second process utilizing a combination fluorine and chlorine chemistry.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: December 12, 2000
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Susan Chen, Judi Quan Rizzuto, Anne E. Sanderfer