Abstract: A bathing aid device comprises adjustments to accommodate varying user body shapes and sizes and may be used in conjunction with most, if not all, bathtubs. The bathing aid device, when used as described, allows for more complete and safer bathing for those incapable of bathing themselves. The device includes a kneeling platform for being placed beside a bathtub, a column assembly, which extends from the kneeling platform to a position above and preferably slightly forward relative to the bathtub wall, and which holds a preferably pivotal clavicle-region support. The user leans on the clavicle-region support, and, because of its location relative to the bathtub and the user's upper chest, and because of its small dimensions, the support is especially comfortable and effective.

Abstract: Apparatus detects defects and microstructural changes in hard translucent materials such as ceramic bulk compositions and ceramic coatings such as after use under load conditions. The beam from a tunable laser is directed onto the sample under study and light reflected by the sample is directed to two detectors, with light scattered with a small scatter angle directed to a first detector and light scattered with a larger scatter angle directed to a second detector for monitoring the scattering surface. The sum and ratio of the two detector outputs respectively provide a gray-scale, or “sum” image, and an indication of the lateral spread of the subsurface scatter, or “ratio” image. This two detector system allows for very high speed crack detection for on-line, real-time inspection of damage in ceramic components.

Abstract: A process for improving the strength of laser-machined articles formed of a silicon-based ceramic material such as silicon nitride, in which the laser-machined surface is immersed in an etching solution of hydrofluoric acid and nitric acid for a duration sufficient to remove substantially all of a silicon film residue on the surface but insufficient to allow the solution to unduly attack the grain boundaries of the underlying silicon nitride substrate. This effectively removes the silicon film as a source of cracks that otherwise could propagate downwardly into the silicon nitride substrate and significantly reduce its strength.