Patents by Inventor Judith Coffin

Judith Coffin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6475893
    Abstract: A method for preparing a semiconductor material for formation of a silicide layer on selected areas thereupon is disclosed. In an exemplary embodiment of the invention, the method includes removing at least one of a nitride and an oxynitride film from the selected areas, removing metallic particles from the selected areas, removing surface particles from the selected areas, removing organics from the selected areas, and removing an oxide layer from the selected areas.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: November 5, 2002
    Assignee: International Business Machines Corporation
    Inventors: Kenneth J. Giewont, Yun Yu Wang, Russell Arndt, Craig Ransom, Judith Coffin, Anthony Domenicucci, Michael MacDonald, Brian E. Johnson
  • Publication number: 20020142616
    Abstract: A method for preparing a semiconductor material for the formation of a silicide layer on selected areas thereupon is disclosed. In an exemplary embodiment of the invention, the method includes removing at least one of a nitride and an oxynitride film from the selected areas, removing metallic particles from the selected areas, removing surface particles from the selected areas, removing organics from the selected areas, and removing an oxide layer from the selected areas.
    Type: Application
    Filed: March 30, 2001
    Publication date: October 3, 2002
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Kenneth J. Giewont, Yun Yu Wang, Russell Arndt, Craig Ransom, Judith Coffin, Anthony Domenicucci, Michael MacDonald, Brian E. Johnson
  • Patent number: 5290586
    Abstract: Microreflectance infrared (IR) spectroscopy is used to determine the degree of cure of Meta-Paete (pyromellitic dianhydride-oxydianiline ethyl ester) films on metallized substrates. In this method, the infrared bands at 1028 and 1015 cm.sup.-1 are used to indirectly monitor ethanol evolution during Meta-Paete cure. The 1015 cm.sup.-1 band serves as internal reference, while the 1028 cm.sup.-1 band, which corresponds to the C--O stretch in the ethoxy group, is used to monitor imidization through loss of the ethoxy group during cure. Quantification of ethanol evolution is possible, since no apparent distortion is observed in the external reflection spectra at these two frequencies. The method can also be applied to measure the cure uniformity of Meta-Paete films, to provide an estimate of film thickness over metallized substrates, and to monitor temperature uniformity in an oven cavity.
    Type: Grant
    Filed: September 10, 1992
    Date of Patent: March 1, 1994
    Assignee: International Business Machines Corporation
    Inventors: Lorraine P. McDonnell Bushnell, Judith A. Coffin, Guillermo Prada-Silva