Patents by Inventor Judith Sobresky

Judith Sobresky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a semiconductor device by DUV resist patterning
    Patent number: 5851927
    Abstract: A method for forming a semiconductor device, including providing a silicon substrate (10), forming a gate stack (11) on the substrate (10), coating a deep ultra-violet (DUV) photoresist (30) on the gate stack (11), exposing and developing the photoresist (30), and etching the gate stack (11). According to the present invention, the gate stack (11) has a dielectric nitride layer (26), particularly, a silicon nitride layer. An adhesive oxide layer (28) is provided between the nitride layer (26) and the photoresist (30) to prevent undesirable lifting of the photoresist (30). Yield is greatly increased and defectivity is reduced.
    Type: Grant
    Filed: August 29, 1997
    Date of Patent: December 22, 1998
    Assignee: Motorola, Inc.
    Inventors: Paul Kevin Cox, Thy Ngu-Uyen Tran, Samuel Jay Wright, Judith Sobresky