Patents by Inventor Judocus Marie Dominicus Stoeldraijer
Judocus Marie Dominicus Stoeldraijer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8896809Abstract: A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.Type: GrantFiled: August 15, 2007Date of Patent: November 25, 2014Assignee: ASML Netherlands B.V.Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Diederik Jan Maas
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Patent number: 7903234Abstract: In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.Type: GrantFiled: November 21, 2007Date of Patent: March 8, 2011Assignee: ASML Netherlands B.V.Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Heine Melle Mulder, Timotheus Franciscus Sengers, Freerk Adriaan Stoffels, Laurentius Catrinus Jorritsma, Reiner Maria Jungblut
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Patent number: 7804582Abstract: A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.Type: GrantFiled: July 28, 2006Date of Patent: September 28, 2010Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Judocus Marie Dominicus Stoeldraijer, Antonius Johannes De Kort, Franciscus Van De Mast, Marteijn De Jong
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Patent number: 7732110Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.Type: GrantFiled: February 25, 2009Date of Patent: June 8, 2010Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk
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Patent number: 7670731Abstract: A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally distributed function, wherein the effective probability density function of the first apparatus is substantially similar to the probability density function of the second apparatus.Type: GrantFiled: October 18, 2006Date of Patent: March 2, 2010Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Johannes Anna Quaedackers, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk, Alexander Serebryakov
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Patent number: 7655368Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.Type: GrantFiled: September 9, 2004Date of Patent: February 2, 2010Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk
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Publication number: 20090190115Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.Type: ApplicationFiled: February 25, 2009Publication date: July 30, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Jozef Maria FINDERS, Judocus Marie Dominicus STOELDRAIJER, Johannes Wilhelmus DE KLERK
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Publication number: 20090047604Abstract: A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.Type: ApplicationFiled: August 15, 2007Publication date: February 19, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Diederik Jan Maas
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Publication number: 20080158528Abstract: In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.Type: ApplicationFiled: November 21, 2007Publication date: July 3, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Heine Melle Mulder, Timotheus Franciscus Sengers, Freerk Adriaan Stoffels, Laurentius Catrinus Jorritsma, Reiner Maria Jungblut
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Publication number: 20080024748Abstract: A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.Type: ApplicationFiled: July 28, 2006Publication date: January 31, 2008Applicant: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Judocus Marie Dominicus Stoeldraijer, Antonius Johannes De Kort, Franciscus Van De Mast, Marteijn De Jong
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Patent number: 7148952Abstract: The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.Type: GrantFiled: October 29, 2004Date of Patent: December 12, 2006Assignee: ASML Netherlands B.V.Inventors: Markus Franciscus Antonius Eurlings, Johannes Jacobus Matheus Baselmans, Hako Botma, Jan Bruining, Marcel Mathijs Theodore Marie Dierichs, Antonius Johannes Josephus Van Dijsseldonk, Judocus Marie Dominicus Stoeldraijer