Patents by Inventor Jue-Goo Lee

Jue-Goo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming a dielectric layer
    Patent number: 6337282
    Abstract: A dielectric layer is formed by depositing a first dielectric layer above a semiconductor substrate including recessed regions, etching the first dielectric layer to remove any voids and to lower the aspect ratio of the recessed regions, and depositing a second dielectric layer on the first dielectric layer in the recessed regions. The method is particularly useful when the aspect ratios are high for recessed regions formed between patterns.
    Type: Grant
    Filed: July 30, 1999
    Date of Patent: January 8, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ju-Wan Kim, Byung-Keun Hwang, Sung-Jin Kim, Jue-Goo Lee, Chang-Hyun Cho, Gwan-Hyeob Koh
  • METHOD FOR FORMING A DIELECTRIC LAYER
    Publication number: 20010046777
    Abstract: A dielectric layer is formed by depositing a first dielectric layer above a semiconductor substrate including recessed regions, etching the first dielectric layer to remove any voids and to lower the aspect ratio of the recessed regions, and depositing a second dielectric layer on the first dielectric layer in the recessed regions. The method is particularly useful when the aspect ratios are high for recessed regions formed between patterns.
    Type: Application
    Filed: July 30, 1999
    Publication date: November 29, 2001
    Inventors: JU-WAN KIM, BYUNG-KEUN HWANG, SUNG-JIN KIM, JUE-GOO LEE, CHANG-HYUN CHO, GWAN-HYEOB KOH