Abstract: The present application relates to a bioreactor system for culturing cells, especially cells without cell walls; the bioreactor system includes: a container containing a hollow cylinder with a diameter of D1 and a height of H1, and a hollow circular truncated cone with an upper diameter of D2, a lower diameter of D3, and a height of H2, where the hollow cylinder is connected to a top surface of the hollow circular truncated cone, and D1=D2; an oscillator, configured to cause the container to make an eccentric motion according to a certain eccentricity and rotational speed; a ventilation device, configured to introduce an oxygen-containing gas from an upper portion of the container to the inside of the container, and a culture solution filled in the container, of which a top surface is exposed to the oxygen-containing gas; where the oscillator is configured to maintain the eccentric motion of the container, such that a ratio of the total liquid surface area to the volume (S/V) of the culture solution when in a

Abstract: A magnetron drive mechanism is provided. The magnetron drive mechanism includes: a driving assembly, a rotating assembly, a transmission assembly, and a limiting assembly. The driving assembly is configured to drive the rotating assembly and the transmission assembly to rotate clockwise or counterclockwise around a first rotation axis. The rotating assembly is connected to a magnetron, and through the transmission assembly, the driving assembly drives the rotating assembly and the magnetron to rotate clockwise or counterclockwise around a second rotation axis. The second rotation axis and the first rotation axis are parallel with each other. The limiting assembly is configured to block the rotating assembly from rotating clockwise or counterclockwise, respectively, to confine the magnetron to positions at different radii of the first rotation axis. The present disclosure also provides a magnetron assembly and a reaction chamber.

Abstract: Embodiments of the invention provide a bearing device and a plasma processing apparatus. According to at least one embodiment, the bearing device includes a base, a base driving mechanism, a pressing ring and a baffle ring.

Abstract: A three-sided brush head for electric toothbrushes comprises a C-shaped brush head body and a sleeve rod to be disposed around a power shaft of an electric toothbrush. A connecting groove is formed in a front side of the middle of the brush head body, and mounting grooves are formed in front sides of two ends of the brush head body. A back side of a top end of the sleeve rod is correspondingly mounted and integrally injection-molded in the in the connecting groove. Brush blocks are correspondingly injection-molded in the mounting grooves. Brush sets are disposed on the front side of the top end of the sleeve rod and on the brush blocks. An arc-shaped U-groove is formed in a back side of a corner of the brush head body.

Abstract: A magnetron drive mechanism is provided. The magnetron drive mechanism includes: a driving assembly, a rotating assembly, a transmission assembly, and a limiting assembly. The driving assembly is configured to drive the rotating assembly and the transmission assembly to rotate clockwise or counterclockwise around a first rotation axis. The rotating assembly is connected to a magnetron, and through the transmission assembly, the driving assembly drives the rotating assembly and the magnetron to rotate clockwise or counterclockwise around a second rotation axis. The second rotation axis and the first rotation axis are parallel with each other. The limiting assembly is configured to block the rotating assembly from rotating clockwise or counterclockwise, respectively, to confine the magnetron to positions at different radii of the first rotation axis. The present disclosure also provides a magnetron assembly and a reaction chamber.

Abstract: The present disclosure provides a degassing method, a degassing chamber, and a semiconductor processing apparatus. The degassing method includes heating a degassing chamber to provide an internal temperature at a preset temperature, and maintaining the internal temperature of the degassing chamber at the preset temperature; and transferring substrates to be degassed into the degassing chamber and heating the substrates for a preset period of time, and taking the substrates out after the preset period of time of the heating. The disclosed degassing method is able to improve the temperature uniformity not only for a same batch of substrates but also for different batches of substrates. In addition, the disclosed degassing method can also realize anytime instant loading/unloading of the substrates to be degassed, thereby increasing the productivity of the equipment.

Abstract: Embodiments of the invention provide a mechanical chuck and a plasma processing apparatus.

Abstract: Embodiments of the invention provide a mechanical chuck and a plasma processing apparatus.

Abstract: Embodiments of the invention provide a bearing device and a plasma processing apparatus. According to at least one embodiment, the bearing device includes a base, a base driving mechanism, a pressing ring and a baffle ring.