Abstract: A computer-implemented knowledge management platform system (KMPS) comprises at least one processor and a non-transitory memory unit that is configured to include instructions which, when performed by the processor, induce an organization of knowledge management platform items (KMPI) within a repository, wherein the KMPIs are allocated to knowledge management platform types (KMPT), which are components of a meta-modeled structure that is stored within the non-transitory memory unit and forms an object model, in particular an ontology, with at least one of the KMPTs being implemented as a core KMPT, wherein each core KMPT is attributed to each KMPI within the repository, and wherein each core KMPT defines an essential group of properties, wherein the essential group of properties of the at least one core KMPT defines lifecycle states, and wherein the meta-modeled structure is self-referential, such that each lifecycle state is stored as a KMPI within the repository itself.

Abstract: The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame.

Abstract: A computer-implemented knowledge management platform system (KMPS) comprises at least one processor and a non-transitory memory unit that is configured to include instructions which, when performed by the processor, induce an organization of knowledge management platform items (KMPI) within a repository, wherein the KMPIs are allocated to knowledge management platform types (KMPT), which are components of a meta-modeled structure that is stored within the non-transitory memory unit and forms an object model, in particular an ontology, with at least one of the KMPTs being implemented as a core KMPT, wherein each core KMPT is attributed to each KMPI within the repository, and wherein each core KMPT defines an essential group of properties, wherein the essential group of properties of the at least one core KMPT defines lifecycle states, and wherein the meta-modeled structure is self-referential, such that each lifecycle state is stored as a KMPI within the repository itself.

Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.

Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus

Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.

Abstract: The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame.

Abstract: The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided.

Abstract: A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.

Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus

Abstract: The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame.

Abstract: A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.

Abstract: An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation and/or position, but not the shape, of at least two mirror facets. In this way aberrations can be corrected.

Abstract: An inference engine is described with improved speed in evaluating queries posed to a data structure based on an ontology with a declarative set of rules. The inference engine comprises: rule rewriters, a rule compiler, and an operator net. The operator net comprises a graph with operators as nodes and with connections between the operators as edges of the graph. The operators serve for: retrieving facts; matching facts and variables in rules; expressing rule bodies and rule heads; expressing negations; and expressing logical AND operations between rule bodies. The operator net is a very general and versatile representation of the rules and queries. It also lends itself easily to multithreading and debugging.

Abstract: The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.