Abstract: The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, including at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.

Abstract: The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, comprising at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.

Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

Abstract: Centimeter thick plates or lenses made from calcium fluoride or barium fluoride with beam propagation in the direction of the <110> crystal direction or of a main axis equivalent thereto are provided as retardation elements for the deep ultraviolet. They can be installed in an unstressed fashion. In a particular embodiment a retardation plate comprises a birefringent crystal plate which has an entry face and an exit face for incident and emerging light, respectively. A form-birefringent dielectric layer structure is applied to the entry and/or exit face. It may, for example, be a periodic sequence of at least two layers with alternating refractive indices. The retardation plate is suitable for ultraviolet light, and permits a large range of angles of incidence. Retardation elements according to the invention are particularly suitable for microlithography at 157 nm.

Abstract: A device is used to hold an optical element, in particular one made of a crystalline material, in particular of CaF2, while the optical element is being coated, in particular by the vapor-deposition of at least one functional layer in a vacuum coating plant. The latter has a device for mounting the optical element, it being possible for the optical element to be heated in the vacuum coating plant via suitable radiation, in particular infrared radiation. An intermediate element which has a lower thermal absorption than the device for mounting the optical element is arranged between the device for mounting the optical element and the optical element.