Abstract: A wafer orientation sensor includes a laser source, a laser detector, and an evaluator. The laser source is configured to emit a laser beam in a direction of a wafer in an evaluation region of the wafer orientation sensor so that the laser beam is reflected at a main surface of the wafer resulting in a reflected laser beam. The laser detector is configured to receive the reflected laser beam at least when the wafer is within a tolerance range regarding the orientation of the wafer. The evaluator is configured to receive a beam reception information from the laser detector and to determine an orientation information based on the beam reception information.

Abstract: A process for polymerization of a diene is provided. The process comprises: a) reacting the diene with hydrogen peroxide in a hydrophilic organic solvent in the presence of water to obtain a polymerization reaction mixture; b) contacting the polymerization reaction mixture with water having a temperature of from 20 to 80° C. to form a mixture having an organic phase and an aqueous phase; c) removing unreacted gaseous diene from the water mixture obtained in b); d) separating the aqueous phase comprising the hydrophilic solvent from the organic phase of the water mixture; and e) distilling volatile materials from the separated organic phase from d) to obtain the polymerization product; wherein a temperature of the reaction a) is from 50-150° C.

Abstract: A wafer orientation sensor includes a laser source, a laser detector, and an evaluator. The laser source is configured to emit a laser beam in a direction of a wafer in an evaluation region of the wafer orientation sensor so that the laser beam is reflected at a main surface of the wafer resulting in a reflected laser beam. The laser detector is configured to receive the reflected laser beam at least when the wafer is within a tolerance range regarding the orientation of the wafer. The evaluator is configured to receive a beam reception information from the laser detector and to determine an orientation information based on the beam reception information.