Abstract: An apparatus for reprocessing special waste of photocrosslinkable scrap material is composed of a housing equipped with a feed hopper, one or more UV emitters arranged in the housing to irradiate the scrap material, and a chopper arranged in the housing to comminute the scrap material by chopping. The apparatus is usefully employed in a method for reprocessing photocrosslinkable scrap material.

Abstract: A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.-carbonyl-.alpha.-sulfonyl-diazomethane, which forms a strong acid on irradiation, of the general formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, denote an alkyl-, cycloalkyl-, aryl- or heteroaryl radicalb) a compound having at least one C--O--C or C--O--Si bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photoylsis products on exposure to light.

Abstract: A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.,.alpha.-bis(sulfonyl)diazomethane, which forms a strong acid on irradiation, of the general formula ##STR1## in which R is an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical,b) a compound having at least one C--O--C or C--O--Si--bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photolysis products on exposure to light.

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pK.sub.a value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

Abstract: A photopolymerizable mixture is disclosed that contains a polymer binder, a polymerizable compound having at least one terminal ethylene double bond and a boiling point above 100.degree. C. at normal pressure, a hexaarylbisimidazole and a 1,3-diarylpyrazoline or a 1-aryl-3-aralkenyl-pyrazoline. The mixture is suitable for the preparation of printing plates and photoresists and is distinguished by high photosensitivity and low sensitivity towards acid solutions.

Abstract: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pK.sub.a value of less than about 12 or is a derivative of a compound having such a pK.sub.a value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

Abstract: An electrically conductive resist material is disclosed, comprising at least one polymer which is sensitive to ionizing radiation and a soluble electrically conductive oligomer or polymer. A process for producing the resist material is also described, comprising admixing an electrically conductive oligomer or polymer dissolved in a solvent to at least one polymer which is sensitive to ionizing radiation. The resist material is useful in preparing electron beam resists which prevent electrostatic charging and resultant electrostatic fields.

Abstract: 3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After subsequent esterification with acetic anhydride and catalyzed hydrogenation to form 1-(3',5'-dimethyl-4'-acetoxyphenyl)ethanol, this intermediate is then dehydrated with an acid and a polymerization inhibitor to produce 3,5-dimethyl-4-acetoxystyrene.

Abstract: The invention relates to 4-chlorooxazole derivatives of the general formula I ##STR1## which carry an unsaturated group in the 2- or 5-position, e.g., the --CH.dbd.CH-- or --CH.dbd.CH--CH.dbd.CH-- group.In the formulaR.sub.1 is phenyl, which is optionally substituted in one or more positions by (C.sub.1 -C.sub.4)-alkoxy or di-(C.sub.1 -C.sub.4)-alkylamino radicals andR.sub.2 is phenyl, phenyloxazolyl, pyridyl, julolidin-9-yl, N-(C.sub.1 -C.sub.4 -alkyl)-carbazol-3-yl, coumarin-6-yl, or stilben-4-yl, which are optionally substituted in one or more positions by (C.sub.1 -C.sub.4)-alkyl, (C.sub.1 -C.sub.4)-alkoxy, halogen-(C.sub.1 -C.sub.4)-alkoxy, hydroxy, halogen, di-(C.sub.1 -C.sub.4)-alkylamino, or dibenzylamino radicals.The compounds are used as photoconductive substances.

Abstract: A negative-working radiation-sensitive mixture comprising a binder and a polymer containing 1,2,3-thiadiazole groups is disclosed. The binder is a polyfunctional compound having functional groups that react with ketene. The polymer is a compound obtained by polymerization of a compound of the general formula I ##STR1## in which R is a polymerizable group. If the polymer is a copolymer containing comonomers having functional groups capable of reacting with ketene, the binder can be omitted. The negative-working radiation-sensitive mixture is particularly suitable for UV, electron beam and X-ray lithography.

Abstract: 3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After subsequent esterification with acetic anhydride and catalyzed hydrogenation to form 1-(3',5'-dimethyl-4'-acetoxyphenyl)ethanol, this intermediate is then dehydrated with an acid and a polymerization inhibitor to produce 3,5-dimethyl-4-acetoxystyrene.

Abstract: A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of actinic radiation, and an acid-cleavable compound, the acid-cleavable compound producing, as cleavage product, an aromatically-substituted alcohol of the general formula I. The radiation-sensitive mixture according to the inventionexhibits a wide processing latitude since different holding times do not cause any changes with respect to the development times.

Abstract: The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerization, hydrolysis, and use in a variety of compositions.

Abstract: 3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After subsequent esterification with acetic anhydride and catalyzed hydrogenation to form 1-(3',5'-dimethyl-4'-acetoxyphenyl)ethanol, this intermediate is then dehydrated with an acid and a polymerization inhibitor to produce 3,5-dimethyl-4-acetoxystyrene.

Abstract: The invention relates to 4-chlorooxazole derivatives of the general formula I ##STR1## which carry an unsaturated group in the 2- or 5-position, e.g., the --CH.dbd.CH-- or --CH.dbd.CH--CH.dbd.CH-- group.In the formulaR.sub.1 is phenyl, which is optionally substituted in one or more positions by (C.sub.1 -C.sub.4)-alkoxy or di-(C.sub.1 -C.sub.4)-alkylamino radicals andR.sub.2 is phenyl, phenyloxazolyl, pyridyl, julolidin-9-yl, N-(C.sub.1 -C.sub.4 -alkyl)-carbazol-3-yl, coumarin-6-yl, or stilben-4-yl, which are optionally substituted in one or more positions by (C.sub.1 -C.sub.4)-alkyl, (C.sub.1-C.sub.4)-alkoxy, halogen-(C.sub.1 -C.sub.4)-alioxy, hydroxy, halogen, di-(C.sub.1 -C.sub.4)-alkylamino, or dibenzylamino radicals.The compounds are used as photoconductive substances.

Abstract: Method and composition for a sulfonyl-containing styrene derivative of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, optionally halogen-, hydroxyl-, cyano- or (C.sub.1 -C.sub.4 -alkoxy mono- or poly-substituted (C.sub.1 -C.sub.8)-alkyl or phenyl, R.sub.3 denotes hydrogen or a (C.sub.1 -C.sub.4)-alkyl or -alkoxy group, n is a number from 1 to 4 or R.sub.1, R.sub.2 and R.sub.3 together with the associated aminophenyl radical denote julolidinyl or N-(C.sub.1 -C.sub.3)-alkylcarbazol-3-yl, R.sub.4 and R.sub.5 denote hydrogen or the necessary valences for forming a condensation product with formamide derivatives, and R.sub.6 denotes a cyano group, or R.sub.4 denotes hydrogen and R.sub.5 and R.sub.6 together denote the grouping C.dbd.N--R.sub.7, with R.sub.7 being a benzoyl radical which is unsubstituted or substituted by (C.sub.1 -C.sub.4)-alkyl or -alkoxy groups, halogen, cyno, amino or mono- or di-(C.sub.1 -C.sub.

Abstract: The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerization, hydrolysis, and use in a variety of compositions.

Abstract: The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerization, hydrolysis, and use in a variety of compositions.

Abstract: Disclosed is a process and apparatus for measuring, in a continuous and contact-free manner, the thickness of a layer applied to a support. The apparatus includes a measuring apparatus which comprises a corona and a first electrostatic voltmeter positioned downstream of the corona in the direction of travel of the layer being measured. The process includes the steps of passing the layer under the apparatus, charging the layer in a contact-free manner, and measuring the level of the charging voltage.

Abstract: Printing forms or metallized images can be prepared electrophotographically by a process comprising the electrostatic chargeup, imagewise exposure and tonering of a photoconductor layer applied to an electroconductive base material, followed by fixing of the tonered image areas, removal of the photoconductive layer in the non-image areas by decoating and, where appropriate, etching of the bared base material surface. A recording material is used that comprises a photoconductive layer containing at least one organic n-conducting pigment in a concentration between 10 and 50 percent by weight and an organic p-conducting photoconductor in a concentration of 0 to 20 percent by weight, based on the layer weight, together with a binder which is soluble or dispersible in aqueous-alkaline solution. The decoating is carried out with an aqueous-alkaline decoater solution, which preferably contains alkali metal hydroxides and/or phosphates.