Patents by Inventor Juha A. Kustaa-Adolf Poutiainen

Juha A. Kustaa-Adolf Poutiainen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Atomic layer deposition apparatus and loading methods
    Patent number: 10011904
    Abstract: The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf, and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question.
    Type: Grant
    Filed: October 5, 2012
    Date of Patent: July 3, 2018
    Assignee: Picosun Oy
    Inventors: Sven Lindfors, Juha A. Kustaa-Adolf Poutiainen
  • Atomic layer deposition apparatus and loading methods
    Patent number: 8282334
    Abstract: The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf, and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question.
    Type: Grant
    Filed: August 1, 2008
    Date of Patent: October 9, 2012
    Assignee: Picosun Oy
    Inventors: Sven Lindfors, Juha A. Kustaa-Adolf Poutiainen
  • Atomic layer deposition apparatus and loading methods
    Publication number: 20100028122
    Abstract: The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being figured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf, and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question.
    Type: Application
    Filed: August 1, 2008
    Publication date: February 4, 2010
    Inventors: Sven Lindfors, Juha A. Kustaa-Adolf Poutiainen