Patents by Inventor Juhyen LEE

Juhyen LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FUNCTIONALIZED POLYCYCLIC AROMATIC HYDROCARBON COMPOUND AND LIGHT-EMITTING DEVICE INCLUDING THE SAME
    Publication number: 20210300845
    Abstract: Provided are a functionalized polycyclic aromatic hydrocarbon compound and a light-emitting device including the same. The functionalized polycyclic aromatic hydrocarbon compound is structurally stable, and exhibits high light-emission characteristics since aggregation caused by ?-? stacking is inhibited, and thus may have high efficiency and long lifespan characteristics.
    Type: Application
    Filed: March 24, 2021
    Publication date: September 30, 2021
    Applicants: Samsung Electronics Co., Ltd., RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Sangwon KIM, Changsik SONG, Juhyen LEE, Hyejin CHO, Hyeonjin SHIN, Minsu SEOL, Dongwook LEE
  • Hardmask composition, method of forming pattern by using the hardmask composition, and hardmask formed using the hardmask composition
    Patent number: 10685844
    Abstract: Provided are a hardmask composition, a method of forming a pattern using the hardmask composition, and a hardmask formed using the hardmask composition. The hardmask composition includes a polar nonaqueous organic solvent and one of: i) a mixture of graphene quantum dots and at least one selected from a diene and a dienophile, ii) a Diels-Alder reaction product of the graphene quantum dots and the at least one selected from a diene and a dienophile, iii) a thermal treatment product of the Diels-Alder reaction product of graphene quantum dots and the at least one selected from a diene and a dienophile, or iv) a combination thereof.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: June 16, 2020
    Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation, Sungkyunkwan University
    Inventors: Sangwon Kim, Changsik Song, Dongcheol Jeong, Minsu Seol, Hyeonjin Shin, Dongwook Lee, Taewoo Kim, Juhyen Lee, Hyejin Cho
  • HARDMASK COMPOSITION, METHOD OF FORMING PATTERN BY USING THE HARDMASK COMPOSITION, AND HARDMASK FORMED USING THE HARDMASK COMPOSITION
    Publication number: 20190035635
    Abstract: Provided are a hardmask composition, a method of forming a pattern using the hardmask composition, and a hardmask formed using the hardmask composition. The hardmask composition includes a polar nonaqueous organic solvent and one of: i) a mixture of graphene quantum dots and at least one selected from a diene and a dienophile, ii) a Diels-Alder reaction product of the graphene quantum dots and the at least one selected from a diene and a dienophile, iii) a thermal treatment product of the Diels-Alder reaction product of graphene quantum dots and the at least one selected from a diene and a dienophile, or iv) a combination thereof.
    Type: Application
    Filed: July 16, 2018
    Publication date: January 31, 2019
    Applicants: Samsung Electronics Co., Ltd., Research & Business Foundation SUNGKYUNKWAN UNIVERSITY
    Inventors: Sangwon KIM, Changsik SONG, Dongcheol JEONG, Minsu SEOL, Hyeonjin SHIN, Dongwook LEE, Taewoo KIM, Juhyen LEE, Hyejin CHO