Patents by Inventor Jui-Chieh CHEN
Jui-Chieh CHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240118583Abstract: A display apparatus including a display panel, a camera module, and a diffraction suppression device is provided. The display panel is provided with multiple signal lines and multiple display pixels. The signal lines and the display pixels are alternately arranged along at least one direction. The camera module has a light receiving surface facing the display panel. The light receiving surface is overlapped with the display panel. The diffraction suppression device is disposed between the display panel and the camera module, and has multiple first light-transmitting regions and multiple second light-transmitting regions alternately arranged along the at least one direction. The first light-transmitting regions are respectively overlapped with the display pixels. The second light-transmitting regions are respectively overlapped with the signal lines.Type: ApplicationFiled: April 19, 2023Publication date: April 11, 2024Applicant: Acer IncorporatedInventors: Jui-Chieh Hsiang, Chih-Chiang Chen
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Publication number: 20240119283Abstract: A method of performing automatic tuning on a deep learning model includes: utilizing an instruction-based learned cost model to estimate a first type of operational performance metrics based on a tuned configuration of layer fusion and tensor tiling; utilizing statistical data gathered during a compilation process of the deep learning model to determine a second type of operational performance metrics based on the tuned configuration of layer fusion and tensor tiling; performing an auto-tuning process to obtain a plurality of optimal configurations based on the first type of operational performance metrics and the second type of operational performance metrics; and configure the deep learning model according to one of the plurality of optimal configurations.Type: ApplicationFiled: October 6, 2023Publication date: April 11, 2024Applicant: MEDIATEK INC.Inventors: Jui-Yang Hsu, Cheng-Sheng Chan, Jen-Chieh Tsai, Huai-Ting Li, Bo-Yu Kuo, Yen-Hao Chen, Kai-Ling Huang, Ping-Yuan Tseng, Tao Tu, Sheng-Je Hung
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Patent number: 11927870Abstract: A pixel structure is provided. The pixel structure includes a display unit and a shading unit, and at least a portion of the shading unit is disposed on the display unit. The display unit includes a pixel switch element and a self-illuminating element, and the self-illuminating element is electrically connected to the pixel switch element. The shading unit includes a shading electrode and a shading layer, and the shading layer is disposed on the self-illuminating element and electrically connected to the shading layer.Type: GrantFiled: September 24, 2020Date of Patent: March 12, 2024Assignee: ACER INCORPORATEDInventors: Jui-Chieh Hsiang, Chih-Chiang Chen
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Publication number: 20230288820Abstract: Particulate deposition rate on a photolithographic mask, particularly of tin (Sn) particles produced within an EUV light source, is reduced by producing turbulence within a radiation source chamber of the EUV light source. Turbulence can be produced by changing the temperature, pressure, and/or gas flow rate within the radiation source chamber. The turbulence reduces the number of particles exiting the EUV light source which could be deposited on the photomask.Type: ApplicationFiled: May 19, 2023Publication date: September 14, 2023Inventors: Jui Chieh Chen, Yi-Wei Lee
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Patent number: 11693325Abstract: Particulate deposition rate on a photolithographic mask, particularly of tin (Sn) particles produced within an EUV light source, is reduced by producing turbulence within a radiation source chamber of the EUV light source. Turbulence can be produced by changing the temperature, pressure, and/or gas flow rate within the radiation source chamber. The turbulence reduces the number of particles exiting the EUV light source which could be deposited on the photomask.Type: GrantFiled: June 28, 2021Date of Patent: July 4, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Jui Chieh Chen, Yi-Wei Lee
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Publication number: 20230073062Abstract: A method for preventing photomask contamination includes securing a photomask on a bottom surface of an electrostatic chuck; generating a first voltage at a peripheral area of the bottom surface of the electrostatic chuck to attract a particle onto the peripheral area of the bottom surface of the electrostatic chuck, wherein the peripheral area of the bottom surface of the electrostatic chuck is not directly above the photomask; after generating the first voltage, generating a second voltage at the peripheral area of the bottom surface of the electrostatic chuck to repulse the particle, wherein the first voltage and the second voltage have opposite electrical properties; and generating a third voltage, by using a collecting plate, near a sidewall of the photomask to attract the repulsed particle.Type: ApplicationFiled: November 16, 2022Publication date: March 9, 2023Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jui-Chieh CHEN, Tsung-Chih CHIEN, Chih-Tsung SHIH, Tsung-Chuan LEE
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Patent number: 11506985Abstract: A method for preventing photomask contamination includes generating a first electric field from an electrostatic chuck to attract a charged particle onto the electrostatic chuck, controlling the first electric field to detach the charged particle from the electrostatic chuck, and generating a second electric field below the electrostatic chuck to attract the charged particle.Type: GrantFiled: April 29, 2019Date of Patent: November 22, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jui-Chieh Chen, Tsung-Chih Chien, Chih-Tsung Shih, Tsung-Chuan Lee
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Publication number: 20220326628Abstract: Particulate deposition rate on a photolithographic mask, particularly of tin (Sn) particles produced within an EUV light source, is reduced by producing turbulence within a radiation source chamber of the EUV light source. Turbulence can be produced by changing the temperature, pressure, and/or gas flow rate within the radiation source chamber. The turbulence reduces the number of particles exiting the EUV light source which could be deposited on the photomask.Type: ApplicationFiled: June 28, 2021Publication date: October 13, 2022Inventors: Jui Chieh Chen, Yi-Wei Lee
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Patent number: 11119420Abstract: In accordance with some embodiments, a method for processing a semiconductor wafer is provided. The method includes transporting a carrier along with a reticle supported by the carrier in a lithography exposure apparatus. The method also includes regulating particles in the carrier through a magnetic field. In addition, the method includes removing the reticle from the carrier. The method further includes performing, using the reticle, a lithography exposure process to the semiconductor wafer in the lithography exposure apparatus.Type: GrantFiled: May 27, 2020Date of Patent: September 14, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Wei Lee, Jui-Chieh Chen, Chih-Tsung Shih, Tsung-Chuan Lee
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Publication number: 20210191283Abstract: In accordance with some embodiments, a method for processing a semiconductor wafer is provided. The method includes transporting a carrier along with a reticle supported by the carrier in a lithography exposure apparatus. The method also includes regulating particles in the carrier through a magnetic field. In addition, the method includes removing the reticle from the carrier. The method further includes performing, using the reticle, a lithography exposure process to the semiconductor wafer in the lithography exposure apparatus.Type: ApplicationFiled: May 27, 2020Publication date: June 24, 2021Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Wei LEE, Jui-Chieh CHEN, Chih-Tsung SHIH, Tsung-Chuan LEE
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Publication number: 20200341388Abstract: A method for preventing photomask contamination includes generating a first electric field from an electrostatic chuck to attract a charged particle onto the electrostatic chuck, controlling the first electric field to detach the charged particle from the electrostatic chuck, and generating a second electric field below the electrostatic chuck to attract the charged particle.Type: ApplicationFiled: April 29, 2019Publication date: October 29, 2020Inventors: Jui-Chieh CHEN, Tsung-Chih CHIEN, Chih-Tsung SHIH, Tsung-Chuan LEE
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Patent number: 10732725Abstract: A method of interactive display based on gesture recognition includes determining a plurality of gestures corresponding to a plurality of images, interpreting a predetermined combination of gestures among the plurality of gestures as a command, and displaying a scene in response to the command.Type: GrantFiled: September 25, 2018Date of Patent: August 4, 2020Assignee: XRSpace CO., LTD.Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
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Patent number: 10678342Abstract: A method of virtual user interface interaction based on gesture recognition comprises detecting two hands in a plurality of images, recognizing each hand's gesture, projecting a virtual user interface on an open gesture hand when one hand is recognized with a point gesture and the other hand is recognized with an open gesture, tracking an index fingertip of the point gesture hand, determining whether the index fingertip of the point gesture hand is close to the open gesture hand within a predefined rule, interpreting a movement of the index fingertip of the point gesture hand as a click command when the index fingertip of the point gesture hand is close to the open gesture hand within the predefined rule, and in response to the click command, generating image data with a character object of the virtual user interface object.Type: GrantFiled: October 21, 2018Date of Patent: June 9, 2020Assignee: XRSpace CO., LTD.Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
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Publication number: 20200125176Abstract: A method of virtual user interface interaction based on gesture recognition comprises detecting two hands in a plurality of images, recognizing each hand's gesture, projecting a virtual user interface on an open gesture hand when one hand is recognized with a point gesture and the other hand is recognized with an open gesture, tracking an index fingertip of the point gesture hand, determining whether the index fingertip of the point gesture hand is close to the open gesture hand within a predefined rule, interpreting a movement of the index fingertip of the point gesture hand as a click command when the index fingertip of the point gesture hand is close to the open gesture hand within the predefined rule, and in response to the click command, generating image data with a character object of the virtual user interface object.Type: ApplicationFiled: October 21, 2018Publication date: April 23, 2020Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
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Publication number: 20200097091Abstract: A method of interactive display based on gesture recognition includes determining a plurality of gestures corresponding to a plurality of images, interpreting a predetermined combination of gestures among the plurality of gestures as a command, and displaying a scene in response to the command.Type: ApplicationFiled: September 25, 2018Publication date: March 26, 2020Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
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Publication number: 20130098411Abstract: A safety umbrella includes a top notch member fixed on an upper end of a central shaft and having a resilient tongue which extends downwardly to form a hook end with an actuated shoulder surface. A runner has a slot for retaining the hook end therein at an upper position. An operating sleeve surrounds and is axially movable relative to the runner and has an actuating friction block which is matingly engaged with the actuated shoulder surface at the upper position such that, when the operating sleeve is moved downwardly, the actuated shoulder surface is pressed to withdraw the hook end inwardly so as to disengage the hook end from the slot.Type: ApplicationFiled: June 7, 2012Publication date: April 25, 2013Inventor: Jui-Chieh CHEN
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Patent number: 5923712Abstract: A system for linearly transmitting an amplified output signal using predistortion whereby a straight inverse modeling scheme is used to more easily and accurately determine the inverse of the distortion caused by a power amplifier of a RF transmitter. The "inverse" of the power amplifier is directly modeled by considering the power amplifier as a signal processing block with the input and output ports reversed. As a result, the computationally intensive inversion required by conventional schemes is avoided. The predistorter system stores complex coefficients in a predistorter LUT, which are then used as the tap weights of a digital filter implementing the predistorter. The predistortion is done by a non-linear filter which incorporates both instantaneous and average envelope power or magnitude effects. The predistortion LUT is addressed as a function of the instantaneous envelope power or magnitude and past power or magnitude envelopes.Type: GrantFiled: May 5, 1997Date of Patent: July 13, 1999Assignee: Glenayre Electronics, Inc.Inventors: Robert Richard Leyendecker, Jay Jui-Chieh Chen, Armando Cova Garrido, Yan Guo, Vladimir Pavlovic, Claudio Gustavo Rey, Desmond Wai Ming Yan
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Patent number: 5732333Abstract: A linear transmitter (101) using predistortion includes a modulator (103), a predistorter (107), a digital quadrature modulator (111), an upconverter (113), a power amplifier (115), and an antenna (117). In addition, the transmitter (101) has a feedback loop including a coupler (119), a downconverter (123), a digital quadrature demodulator (125), and a trainer (131). The digital data to be transmitted is provided into the modulator (103), which converts the digital data into in-phase and quadrature component signals. The in-phase and quadrature component signals are then provided to the predistorter (107), which "predistorts" the component signals prior to amplification. The digital quadrature modulator (111) converts the component signals into a single analog signal. The upconverter (113) upconverts this signal from the predistorter (107) into the desired frequency of transmission, which is provided to the power amplifier (115) and the antenna (117) for amplification and broadcast.Type: GrantFiled: February 14, 1996Date of Patent: March 24, 1998Assignee: Glenayre Electronics, Inc.Inventors: Charles Brian Cox, David Kent Bonds, Jay Jui-Chieh Chen, Flaviu C. Costescu, Joel Richard Dierks, Wayne Douglas Duello, Thomas L. Frederick, Paul A. Goud, Derek Stephen Hilborn, Richard Johnathan Hinkle, Terry Lee Hinkle, David E. Jones, Theron Lee Jones, Patricia Fern Kavanagh, David W. Kroeger, Robert Richard Leyendecker, Vladimir Pavlovic, Claudio Gustavo Rey, Ray M.R. Sewlochan, Emre Tapucu, Mark A. Walker