Patents by Inventor Jui-Chieh CHEN

Jui-Chieh CHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240118583
    Abstract: A display apparatus including a display panel, a camera module, and a diffraction suppression device is provided. The display panel is provided with multiple signal lines and multiple display pixels. The signal lines and the display pixels are alternately arranged along at least one direction. The camera module has a light receiving surface facing the display panel. The light receiving surface is overlapped with the display panel. The diffraction suppression device is disposed between the display panel and the camera module, and has multiple first light-transmitting regions and multiple second light-transmitting regions alternately arranged along the at least one direction. The first light-transmitting regions are respectively overlapped with the display pixels. The second light-transmitting regions are respectively overlapped with the signal lines.
    Type: Application
    Filed: April 19, 2023
    Publication date: April 11, 2024
    Applicant: Acer Incorporated
    Inventors: Jui-Chieh Hsiang, Chih-Chiang Chen
  • Publication number: 20240119283
    Abstract: A method of performing automatic tuning on a deep learning model includes: utilizing an instruction-based learned cost model to estimate a first type of operational performance metrics based on a tuned configuration of layer fusion and tensor tiling; utilizing statistical data gathered during a compilation process of the deep learning model to determine a second type of operational performance metrics based on the tuned configuration of layer fusion and tensor tiling; performing an auto-tuning process to obtain a plurality of optimal configurations based on the first type of operational performance metrics and the second type of operational performance metrics; and configure the deep learning model according to one of the plurality of optimal configurations.
    Type: Application
    Filed: October 6, 2023
    Publication date: April 11, 2024
    Applicant: MEDIATEK INC.
    Inventors: Jui-Yang Hsu, Cheng-Sheng Chan, Jen-Chieh Tsai, Huai-Ting Li, Bo-Yu Kuo, Yen-Hao Chen, Kai-Ling Huang, Ping-Yuan Tseng, Tao Tu, Sheng-Je Hung
  • Patent number: 11927870
    Abstract: A pixel structure is provided. The pixel structure includes a display unit and a shading unit, and at least a portion of the shading unit is disposed on the display unit. The display unit includes a pixel switch element and a self-illuminating element, and the self-illuminating element is electrically connected to the pixel switch element. The shading unit includes a shading electrode and a shading layer, and the shading layer is disposed on the self-illuminating element and electrically connected to the shading layer.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: March 12, 2024
    Assignee: ACER INCORPORATED
    Inventors: Jui-Chieh Hsiang, Chih-Chiang Chen
  • Publication number: 20230288820
    Abstract: Particulate deposition rate on a photolithographic mask, particularly of tin (Sn) particles produced within an EUV light source, is reduced by producing turbulence within a radiation source chamber of the EUV light source. Turbulence can be produced by changing the temperature, pressure, and/or gas flow rate within the radiation source chamber. The turbulence reduces the number of particles exiting the EUV light source which could be deposited on the photomask.
    Type: Application
    Filed: May 19, 2023
    Publication date: September 14, 2023
    Inventors: Jui Chieh Chen, Yi-Wei Lee
  • Patent number: 11693325
    Abstract: Particulate deposition rate on a photolithographic mask, particularly of tin (Sn) particles produced within an EUV light source, is reduced by producing turbulence within a radiation source chamber of the EUV light source. Turbulence can be produced by changing the temperature, pressure, and/or gas flow rate within the radiation source chamber. The turbulence reduces the number of particles exiting the EUV light source which could be deposited on the photomask.
    Type: Grant
    Filed: June 28, 2021
    Date of Patent: July 4, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jui Chieh Chen, Yi-Wei Lee
  • Publication number: 20230073062
    Abstract: A method for preventing photomask contamination includes securing a photomask on a bottom surface of an electrostatic chuck; generating a first voltage at a peripheral area of the bottom surface of the electrostatic chuck to attract a particle onto the peripheral area of the bottom surface of the electrostatic chuck, wherein the peripheral area of the bottom surface of the electrostatic chuck is not directly above the photomask; after generating the first voltage, generating a second voltage at the peripheral area of the bottom surface of the electrostatic chuck to repulse the particle, wherein the first voltage and the second voltage have opposite electrical properties; and generating a third voltage, by using a collecting plate, near a sidewall of the photomask to attract the repulsed particle.
    Type: Application
    Filed: November 16, 2022
    Publication date: March 9, 2023
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jui-Chieh CHEN, Tsung-Chih CHIEN, Chih-Tsung SHIH, Tsung-Chuan LEE
  • Patent number: 11506985
    Abstract: A method for preventing photomask contamination includes generating a first electric field from an electrostatic chuck to attract a charged particle onto the electrostatic chuck, controlling the first electric field to detach the charged particle from the electrostatic chuck, and generating a second electric field below the electrostatic chuck to attract the charged particle.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: November 22, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jui-Chieh Chen, Tsung-Chih Chien, Chih-Tsung Shih, Tsung-Chuan Lee
  • Publication number: 20220326628
    Abstract: Particulate deposition rate on a photolithographic mask, particularly of tin (Sn) particles produced within an EUV light source, is reduced by producing turbulence within a radiation source chamber of the EUV light source. Turbulence can be produced by changing the temperature, pressure, and/or gas flow rate within the radiation source chamber. The turbulence reduces the number of particles exiting the EUV light source which could be deposited on the photomask.
    Type: Application
    Filed: June 28, 2021
    Publication date: October 13, 2022
    Inventors: Jui Chieh Chen, Yi-Wei Lee
  • Patent number: 11119420
    Abstract: In accordance with some embodiments, a method for processing a semiconductor wafer is provided. The method includes transporting a carrier along with a reticle supported by the carrier in a lithography exposure apparatus. The method also includes regulating particles in the carrier through a magnetic field. In addition, the method includes removing the reticle from the carrier. The method further includes performing, using the reticle, a lithography exposure process to the semiconductor wafer in the lithography exposure apparatus.
    Type: Grant
    Filed: May 27, 2020
    Date of Patent: September 14, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yi-Wei Lee, Jui-Chieh Chen, Chih-Tsung Shih, Tsung-Chuan Lee
  • Publication number: 20210191283
    Abstract: In accordance with some embodiments, a method for processing a semiconductor wafer is provided. The method includes transporting a carrier along with a reticle supported by the carrier in a lithography exposure apparatus. The method also includes regulating particles in the carrier through a magnetic field. In addition, the method includes removing the reticle from the carrier. The method further includes performing, using the reticle, a lithography exposure process to the semiconductor wafer in the lithography exposure apparatus.
    Type: Application
    Filed: May 27, 2020
    Publication date: June 24, 2021
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yi-Wei LEE, Jui-Chieh CHEN, Chih-Tsung SHIH, Tsung-Chuan LEE
  • Publication number: 20200341388
    Abstract: A method for preventing photomask contamination includes generating a first electric field from an electrostatic chuck to attract a charged particle onto the electrostatic chuck, controlling the first electric field to detach the charged particle from the electrostatic chuck, and generating a second electric field below the electrostatic chuck to attract the charged particle.
    Type: Application
    Filed: April 29, 2019
    Publication date: October 29, 2020
    Inventors: Jui-Chieh CHEN, Tsung-Chih CHIEN, Chih-Tsung SHIH, Tsung-Chuan LEE
  • Patent number: 10732725
    Abstract: A method of interactive display based on gesture recognition includes determining a plurality of gestures corresponding to a plurality of images, interpreting a predetermined combination of gestures among the plurality of gestures as a command, and displaying a scene in response to the command.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: August 4, 2020
    Assignee: XRSpace CO., LTD.
    Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
  • Patent number: 10678342
    Abstract: A method of virtual user interface interaction based on gesture recognition comprises detecting two hands in a plurality of images, recognizing each hand's gesture, projecting a virtual user interface on an open gesture hand when one hand is recognized with a point gesture and the other hand is recognized with an open gesture, tracking an index fingertip of the point gesture hand, determining whether the index fingertip of the point gesture hand is close to the open gesture hand within a predefined rule, interpreting a movement of the index fingertip of the point gesture hand as a click command when the index fingertip of the point gesture hand is close to the open gesture hand within the predefined rule, and in response to the click command, generating image data with a character object of the virtual user interface object.
    Type: Grant
    Filed: October 21, 2018
    Date of Patent: June 9, 2020
    Assignee: XRSpace CO., LTD.
    Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
  • Publication number: 20200125176
    Abstract: A method of virtual user interface interaction based on gesture recognition comprises detecting two hands in a plurality of images, recognizing each hand's gesture, projecting a virtual user interface on an open gesture hand when one hand is recognized with a point gesture and the other hand is recognized with an open gesture, tracking an index fingertip of the point gesture hand, determining whether the index fingertip of the point gesture hand is close to the open gesture hand within a predefined rule, interpreting a movement of the index fingertip of the point gesture hand as a click command when the index fingertip of the point gesture hand is close to the open gesture hand within the predefined rule, and in response to the click command, generating image data with a character object of the virtual user interface object.
    Type: Application
    Filed: October 21, 2018
    Publication date: April 23, 2020
    Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
  • Publication number: 20200097091
    Abstract: A method of interactive display based on gesture recognition includes determining a plurality of gestures corresponding to a plurality of images, interpreting a predetermined combination of gestures among the plurality of gestures as a command, and displaying a scene in response to the command.
    Type: Application
    Filed: September 25, 2018
    Publication date: March 26, 2020
    Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
  • Publication number: 20130098411
    Abstract: A safety umbrella includes a top notch member fixed on an upper end of a central shaft and having a resilient tongue which extends downwardly to form a hook end with an actuated shoulder surface. A runner has a slot for retaining the hook end therein at an upper position. An operating sleeve surrounds and is axially movable relative to the runner and has an actuating friction block which is matingly engaged with the actuated shoulder surface at the upper position such that, when the operating sleeve is moved downwardly, the actuated shoulder surface is pressed to withdraw the hook end inwardly so as to disengage the hook end from the slot.
    Type: Application
    Filed: June 7, 2012
    Publication date: April 25, 2013
    Inventor: Jui-Chieh CHEN
  • Patent number: 5923712
    Abstract: A system for linearly transmitting an amplified output signal using predistortion whereby a straight inverse modeling scheme is used to more easily and accurately determine the inverse of the distortion caused by a power amplifier of a RF transmitter. The "inverse" of the power amplifier is directly modeled by considering the power amplifier as a signal processing block with the input and output ports reversed. As a result, the computationally intensive inversion required by conventional schemes is avoided. The predistorter system stores complex coefficients in a predistorter LUT, which are then used as the tap weights of a digital filter implementing the predistorter. The predistortion is done by a non-linear filter which incorporates both instantaneous and average envelope power or magnitude effects. The predistortion LUT is addressed as a function of the instantaneous envelope power or magnitude and past power or magnitude envelopes.
    Type: Grant
    Filed: May 5, 1997
    Date of Patent: July 13, 1999
    Assignee: Glenayre Electronics, Inc.
    Inventors: Robert Richard Leyendecker, Jay Jui-Chieh Chen, Armando Cova Garrido, Yan Guo, Vladimir Pavlovic, Claudio Gustavo Rey, Desmond Wai Ming Yan
  • Patent number: 5732333
    Abstract: A linear transmitter (101) using predistortion includes a modulator (103), a predistorter (107), a digital quadrature modulator (111), an upconverter (113), a power amplifier (115), and an antenna (117). In addition, the transmitter (101) has a feedback loop including a coupler (119), a downconverter (123), a digital quadrature demodulator (125), and a trainer (131). The digital data to be transmitted is provided into the modulator (103), which converts the digital data into in-phase and quadrature component signals. The in-phase and quadrature component signals are then provided to the predistorter (107), which "predistorts" the component signals prior to amplification. The digital quadrature modulator (111) converts the component signals into a single analog signal. The upconverter (113) upconverts this signal from the predistorter (107) into the desired frequency of transmission, which is provided to the power amplifier (115) and the antenna (117) for amplification and broadcast.
    Type: Grant
    Filed: February 14, 1996
    Date of Patent: March 24, 1998
    Assignee: Glenayre Electronics, Inc.
    Inventors: Charles Brian Cox, David Kent Bonds, Jay Jui-Chieh Chen, Flaviu C. Costescu, Joel Richard Dierks, Wayne Douglas Duello, Thomas L. Frederick, Paul A. Goud, Derek Stephen Hilborn, Richard Johnathan Hinkle, Terry Lee Hinkle, David E. Jones, Theron Lee Jones, Patricia Fern Kavanagh, David W. Kroeger, Robert Richard Leyendecker, Vladimir Pavlovic, Claudio Gustavo Rey, Ray M.R. Sewlochan, Emre Tapucu, Mark A. Walker