Abstract: The present invention discloses a method for non-fluorescence higher harmonic generation ground state depletion super-resolution microscopy, it includes the following steps: providing an organic material unit, focusing excitation light and ground state depletion light, generating a higher harmonic signal, performing ground state depletion and performing microscopic imaging. With the implementation of the present invention, the stimulated electrons of the organic material remains majorly on the singlet (S1) state or the triplet (T1) state, instead of the ground (S0) state, to provide modulation of the spatial distribution of the non-fluorescence signal, and make STED microscopy applicable to non-fluorescence signals to promote the resolution of the images.

Abstract: The present invention discloses a method for non-fluorescence higher harmonic generation ground state depletion super-resolution microscopy, it includes the following steps: providing an organic material unit, focusing excitation light and ground state depletion light, generating a higher harmonic signal, performing ground state depletion and performing microscopic imaging. With the implementation of the present invention, the stimulated electrons of the organic material remains majorly on the singlet (S1) state or the triplet (T1) state, instead of the ground (S0) state, to provide modulation of the spatial distribution of the non-fluorescence signal, and make STED microscopy applicable to non-fluorescence signals to promote the resolution of the images.

Abstract: The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film of said electronic or photonic material on said substrate; and using a fluoropolymer to protect regions of said electronic or photonic material during a patterning process.

Abstract: The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film of said electronic or photonic material on said substrate; and using an adhesive to selectively remove regions of said electronic or photonic material from said film, thereby leaving on said substrate said patterned electronic or photonic material.

Abstract: The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film (polymer A) of said electronic or photonic material on said substrate; and using a fluoropolymer (e.g. cytop) to protect regions of said electronic or photonic material during a patterning process.

Abstract: The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film of said electronic or photonic material on said substrate; and using an adhesive to selectively remove regions of said electronic or photonic material from said film, thereby leaving on said substrate said patterned electronic or photonic material.