Patents by Inventor Jui-Fu Hsu

Jui-Fu Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210340320
    Abstract: An oligomer (2,6-dimethylphenylene ether) is provided. Its structure is shown as follows: which comprises separately independent hydrogen; alkyl or phenyl; separately independent —NR—, —CO—, —SO—, —CS—, —SO2—, —CH2—, —O—, null, —C(CH3)2—, or and a hydrogen, The features of the cured products include a high glass-transition temperature, a low dielectric feature, preferred thermal stability, and good flame retardancy. The present invention effectively controls the number-average molecular weight of the product to obtain excellent organic solubility.
    Type: Application
    Filed: December 22, 2020
    Publication date: November 4, 2021
    Inventors: Sheng-De Li, Ching-Hsuan Lin, Yi-Hsuan Hsieh, Wei-Yen Chen, Way-Chih Hsu, Jui-Fu Kao, Ming-Yu Huang, Jann-Chen Lin, Yih-Ping Wang
  • Publication number: 20210340321
    Abstract: A phosphinated (2,6-dimethylphenyl ether) oligomer, preparation method thereof and cured product are provided. The phosphinated (2,6-dimethylphenyl ether) oligomer includes a structure represented by Formula (1): wherein X is a single bond, —CH2—, —O—, —C(CH3)2— or R?0, R0, R1, R2 and R3 are independently hydrogen, C1-C6 alkyl or phenyl; n and m are independently an integer from 0 to 300; p and q are independently an integer from 1 to 4; Y is hydrogen, U and V are independently an aliphatic structure.
    Type: Application
    Filed: December 4, 2020
    Publication date: November 4, 2021
    Inventors: Sheng-De LI, Ching-Hsuan LIN, Cheng-Liang LIU, Jun-Cheng YE, You-Lin SHIH, Yu An LIN, Wei-Yen CHEN, Way-Chih HSU, Jui-Fu KAO, Ming-Yu HUANG, Jann-Chen LIN, Yih-Ping WANG
  • Patent number: 10724140
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: July 28, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Chan Lo, Yi-Fang Lai, Po-Hsiung Leu, Ding-I Liu, Si-Wen Liao, Kai-Shiung Hsu, Jheng-Uei Hsieh, Shian-Huei Lin, Jui-Fu Hsu, Cheng-Tsung Wu
  • Patent number: 10161041
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: December 25, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Chan Lo, Yi-Fang Lai, Po-Hsiung Leu, Ding-I Liu, Si-Wen Liao, Kai-Shiung Hsu, Jheng-Uei Hsieh, Shian-Huei Lin, Jui-Fu Hsu, Cheng-Tsung Wu
  • Publication number: 20180334747
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Application
    Filed: July 31, 2018
    Publication date: November 22, 2018
    Inventors: Yen-Chan Lo, Yi-Fang Lai, Po-Hsiung Leu, Ding-I Liu, Si-Wen Liao, Kai-Shiung Hsu, Jheng-Uei Hsieh, Shian-Huei Lin, Jui-Fu Hsu, Cheng-Tsung Wu
  • Publication number: 20170107619
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Application
    Filed: July 27, 2016
    Publication date: April 20, 2017
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yen-Chan LO, Yi-Fang LAI, Po-Hsiung LEU, Ding-I LIU, Si-Wen LIAO, Kai-Shiung HSU, Jheng-Uei HSIEH, Shian-Huei LIN, Jui-Fu HSU, Cheng-Tsung WU
  • Publication number: 20130076982
    Abstract: A television (TV) system and a booting method thereof are provided. In the present invention, by additionally adding a self-setting booting item into an OSD (on-screen display) menu provided by the TV system, a plurality of booting modes related to the TV system is self-defined by a user under the self-setting booting item. Accordingly, the TV system performs a booting procedure in response to the self-defined and selected booting mode. Since the booting mode of the TV system can be self-defined/selected by the user, the modules corresponding to functions that are not need by the user in the TV system can be turned off/disabled, which avails saving power and improving a booting speed of the TV system, and even increasing practicability of the TV system.
    Type: Application
    Filed: November 1, 2011
    Publication date: March 28, 2013
    Applicant: HANNSTAR DISPLAY CORPORATION
    Inventors: Yi-Min Bai, Chin-Sheng Lee, Jui-Fu Hsu
  • Patent number: 4805593
    Abstract: A gas soldering iron includes a soldered joint, an on/off knob, a nozzle, a fibermetallic liner, a nozzle tube, a cooling fin, a nozzle protector, a gas outlet port, a gas refill port, a reservoir, a plastic cover, and a cap. When the on/off knob is pushed forward, the gas outlet port will be guided forward and gas injected into the liner. Upon filling the combustion liner, the gas is ignited with an igniter on the cap to heat the soldered joint. When the on/off knob is pulled backward, the nozzle will be guided backward and gas supply cut off, extinguishing the flame.
    Type: Grant
    Filed: December 1, 1987
    Date of Patent: February 21, 1989
    Inventor: Jui-Fu Hsu