Patents by Inventor Jui-Fu HSUEH

Jui-Fu HSUEH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering apparatus and method
    Patent number: 9410236
    Abstract: A sputtering apparatus comprises a chamber configured to contain at least one sputter target and at least one substrate to be coated. The chamber has at least one adjustable shielding member defining an adjustable aperture. The member is positioned between the at least one sputter target and the at least one substrate. The aperture is adjustable in at least one of the group consisting of area and shape.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: August 9, 2016
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wen-Tsai Yen, Chung-Hsien Wu, Shih-Wei Chen, Ying-Hsin Wu, Jui-Fu Hsueh, Kuan-Chu Chen
  • SPUTTERING APPARATUS AND METHOD
    Publication number: 20140144769
    Abstract: A sputtering apparatus comprises a chamber configured to contain at least one sputter target and at least one substrate to be coated. The chamber has at least one adjustable shielding member defining an adjustable aperture. The member is positioned between the at least one sputter target and the at least one substrate. The aperture is adjustable in at least one of the group consisting of area and shape.
    Type: Application
    Filed: November 29, 2012
    Publication date: May 29, 2014
    Applicant: TSMC SOLAR LTD.
    Inventors: Wen-Tsai YEN, Chung-Hsien WU, Shih-Wei CHEN, Ying-Hsin WU, Jui-Fu HSUEH, Kuan-Chu CHEN