Abstract: A method for fabricating a color filter (CF) is provided. The method includes steps of providing a substrate and forming a dielectric layer thereon, performing a first lithography process with a first photoresist on the dielectric layer to form a plurality of first pixels, performing a second lithography process with a second photoresist on the dielectric layer to form a plurality of second pixels, wherein the second pixels overlap the first pixels, which the second pixels are next to, performing a third lithography process with a third photoresist on the dielectric layer such that the dielectric layer is covered with the third photoresist, and calendering a cylinder on the third photoresist to form a plurality of third pixels and to form a flat surface by the first, the second and the third pixels.

Abstract: A method for fabricating a color filter (CF) is provided. The method includes steps of providing a substrate and forming a dielectric layer thereon, performing a first lithography process with a first photoresist on the dielectric layer to form a plurality of first pixels, performing a second lithography process with a second photoresist on the dielectric layer to form a plurality of second pixels, wherein the second pixels overlap the first pixels, which the second pixels are next to, performing a third lithography process with a third photoresist on the dielectric layer such that the dielectric layer is covered with the third photoresist, and calendering a cylinder on the third photoresist to form a plurality of third pixels and to form a flat surface by the first, the second and the third pixels.