Patents by Inventor Jui-Hung FU

Jui-Hung FU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating reticle
    Patent number: 11940737
    Abstract: A method includes receiving a device design layout and a scribe line design layout surrounding the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is performed on the rotated device design layout and the rotated scribe line design layout. A reticle includes the device design layout and the scribe line design layout is formed after performing the OPC process.
    Type: Grant
    Filed: May 7, 2021
    Date of Patent: March 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsueh-Yi Chung, Yung-Cheng Chen, Fei-Gwo Tsai, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu, Jui-Ping Chuang, Tzong-Sheng Chang, Kuei-Shun Chen, Meng-Wei Chen
  • Organometallic cluster photoresists for EUV lithography
    Patent number: 11767336
    Abstract: The present disclosure is directed to organotin cluster compounds having formula (I) and their use as photoresists in extreme ultraviolet lithography processes.
    Type: Grant
    Filed: July 21, 2022
    Date of Patent: September 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hsu-Kai Chang, Chi-Ming Yang, Jui-Hsiung Liu, Jui-Hung Fu, Hsin-Yi Wu
  • Organometallic cluster photoresists for EUV lithography
    Patent number: 11579531
    Abstract: The present disclosure is directed to organotin cluster compounds having formula (I) and their use as photoresists in extreme ultraviolet lithography processes.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: February 14, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hsu-Kai Chang, Chi-Ming Yang, Jui-Hsiung Liu, Jui-Hung Fu, Hsin-Yi Wu
  • ORGANOMETALLIC CLUSTER PHOTORESISTS FOR EUV LITHOGRAPHY
    Publication number: 20220380392
    Abstract: The present disclosure is directed to organotin cluster compounds having formula (I) and their use as photoresists in extreme ultraviolet lithography processes.
    Type: Application
    Filed: July 21, 2022
    Publication date: December 1, 2022
    Inventors: Hsu-Kai CHANG, Chi-Ming YANG, Jui-Hsiung LIU, Jui-Hung FU, Hsin-Yi WU
  • ORGANOMETALLIC CLUSTER PHOTORESISTS FOR EUV LITHOGRAPHY
    Publication number: 20210087210
    Abstract: The present disclosure is directed to organotin cluster compounds having formula (I) and their use as photoresists in extreme ultraviolet lithography processes.
    Type: Application
    Filed: September 25, 2019
    Publication date: March 25, 2021
    Inventors: Hsu-Kai Chang, Chi-Ming YANG, Jui-Hsiung LIU, Jui-Hung FU, Hsin-Yi WU