Patents by Inventor Jui-Kuo LAI

Jui-Kuo LAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • APPARATUS AND METHODS FOR DETERMINING FLUID DYNAMICS OF LIQUID FILM ON WAFER SURFACE
    Publication number: 20220406632
    Abstract: An apparatus for inspecting a semiconductor substrate includes a rotatable base configured to support a substrate, and a nozzle arm includes a nozzle and a light monitoring device. The light monitoring device includes a laser transmitter and an array of light sensors arranged in the nozzle arm and facing the substrate. The light monitoring device is configured to transmit a laser pulse towards the substrate, wherein the laser pulse impinges on the substrate, receive a reflected laser pulse from the substrate, calculate whether one or more light sensors received the laser pulse, and calculate a distance between the light monitoring device and the substrate using the turnaround time for determining a process quality on the substrate.
    Type: Application
    Filed: June 18, 2021
    Publication date: December 22, 2022
    Inventors: Chung-Pin CHOU, Kai-Lin CHUANG, Yan-Cheng CHEN, Jui Kuo LAI, Jun Xiu LIU
  • Inspection and cleaning system and method for the same
    Patent number: 11017522
    Abstract: A system includes an inspection device and an image processing unit. The inspection device is configured to scan a wafer to generate an inspected image. The image processing unit is configured to receive the inspected image, and is configured to analyze the inspected image by using at least one deep learning algorithm in order to determine whether there is any defect image shown in a region of interest in the inspected image. When there is at least one defect image shown in the region of interest in the inspected image, the inspection device is further configured to magnify the region of interest in the inspected image to generate a magnified inspected image for identification of defects.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: May 25, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chung-Pin Chou, In-Tsang Lin, Sheng-Wen Huang, Yu-Ting Wang, Jui-Kuo Lai, Hsin-Hui Chou, Jun-Xiu Liu, Tien-Wen Wang
  • INSPECTION SYSTEM AND METHOD
    Publication number: 20200334800
    Abstract: A system includes an inspection device and an image processing unit. The inspection device is configured to scan a wafer to generate an inspected image. The image processing unit is configured to receive the inspected image, and is configured to analyze the inspected image by using at least one deep learning algorithm in order to determine whether there is any defect image shown in a region of interest in the inspected image. When there is at least one defect image shown in the region of interest in the inspected image, the inspection device is further configured to magnify the region of interest in the inspected image to generate a magnified inspected image for identification of defects.
    Type: Application
    Filed: April 18, 2019
    Publication date: October 22, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chung-Pin CHOU, In-Tsang LIN, Sheng-Wen HUANG, Yu-Ting WANG, Jui-Kuo LAI, Hsin-Hui CHOU, Jun-Xiu LIU, Tien-Wen WANG