Patents by Inventor Jui Min Lim

Jui Min Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9960079
    Abstract: A method of forming a device associated with a via includes forming an opening or via, and forming at least a pair of conducting paths within the via. Also disclosed is a via having at pair of conducting paths therein.
    Type: Grant
    Filed: May 17, 2013
    Date of Patent: May 1, 2018
    Assignee: Intel Corporation
    Inventors: Todd B. Myers, Nicholas R. Watts, Eric C. Palmer, Jui Min Lim
  • Publication number: 20130249112
    Abstract: A method of forming a device associated with a via includes forming an opening or via, and forming at least a pair of conducting paths within the via. Also disclosed is a via having at pair of conducting paths therein.
    Type: Application
    Filed: May 17, 2013
    Publication date: September 26, 2013
    Inventors: Todd B. Myers, Nicolas R. Watts, Eric C. Palmer, Jui Min Lim
  • Patent number: 8487446
    Abstract: A method of forming a device associated with a via includes forming an opening or via, and forming at least a pair of conducting paths within the via. Also disclosed is a via having at pair of conducting paths therein.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: July 16, 2013
    Assignee: Intel Corporation
    Inventors: Todd B Myers, Nicolas R Watts, Eric C Palmer, Jui Min Lim
  • Patent number: 8018072
    Abstract: A semiconductor device has a substrate. A die is attached to a first surface of the substrate. A heat sink is provided having an approximately planer member and support members extending from the planer member. The support members are attached to the first surface of the substrate to form a cavity over the die with the planer member positioned above the die. An encapsulant is provided for encapsulating the device, wherein an exterior surface of the planer member is exposed. A non-tapered opening is formed in the planer member. The encapsulant is injected through the opening to encapsulate the cavity and the encapsulant will partially fill the non-tapered opening.
    Type: Grant
    Filed: December 23, 2008
    Date of Patent: September 13, 2011
    Assignee: Amkor Technology, Inc.
    Inventors: Jeffrey A. Miks, Jui Min Lim
  • Publication number: 20110198723
    Abstract: A method of forming a device associated with a via includes forming an opening or via, and forming at least a pair of conducting paths within the via. Also disclosed is a via having at pair of conducting paths therein.
    Type: Application
    Filed: April 27, 2011
    Publication date: August 18, 2011
    Inventors: Todd B. Myers, Nicholas R. Watts, Eric C. Palmer, Jui Min Lim
  • Patent number: 7952202
    Abstract: A method of forming a device associated with a via includes forming an opening or via, and forming at least a pair of conducting paths within the via. Also disclosed is a via having at pair of conducting paths therein.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: May 31, 2011
    Assignee: Intel Corporation
    Inventors: Todd B Myers, Nicholas R. Watts, Eric C Palmer, Jui Min Lim
  • Patent number: 7737025
    Abstract: A method for forming an plurality of paths on a substrate includes drilling an opening for a via to a depth to expose a first pad and a second pad, lining the opening with a conductive material, and insulating a first portion of the lining in the opening from a second portion of the lining in the opening to form a first electrical path contacting the first pad and a second electrical path contacting the second pad.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: June 15, 2010
    Assignee: Intel Corporation
    Inventors: Todd B Myers, Nicholas R. Watts, Eric C Palmer, Renee M Defeo, Jui Min Lim
  • Publication number: 20090057910
    Abstract: A method of forming a device associated with a via includes forming an opening or via, and forming at least a pair of conducting paths within the via. Also disclosed is a via having at pair of conducting paths therein.
    Type: Application
    Filed: August 30, 2007
    Publication date: March 5, 2009
    Inventors: Todd B. Myers, Nicholas R. Watts, Eric C. Palmer, Jui Min Lim
  • Patent number: 7275316
    Abstract: A method of forming a device associated with a via includes forming an opening or via, and forming at least a pair of conducting paths within the via. Also disclosed is a via having at pair of conducting paths therein.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: October 2, 2007
    Assignee: Intel Corporation
    Inventors: Todd B Myers, Nicholas R. Watts, Eric C Palmer, Jui Min Lim
  • Patent number: 7183653
    Abstract: A system includes a device having at least one integrated circuit. The integrated circuit further includes a first layer of conductive material, a second layer of conductive material, and a via having multiple electrical paths for interconnecting the first layer of conductive material and the second layer of conductive material. A method for forming a via includes drilling an opening to a depth to expose a first pad and a second pad, lining the opening with a conductive material, and insulating a first portion of the lining in the opening from a second portion of the lining in the opening to form a first electrical path contacting the first pad and a second electrical path contacting the second pad.
    Type: Grant
    Filed: December 17, 2003
    Date of Patent: February 27, 2007
    Assignee: Intel Corporation
    Inventors: Todd B Myers, Nicholas R. Watts, Eric C Palmer, Renee M Defeo, Jui Min Lim