Patents by Inventor Jui-Pin WU

Jui-Pin WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240385542
    Abstract: An apparatus for manufacturing semiconductors includes a power amplifier to power a laser, a catalyst disposed in the power amplifier, an inlet port, and an exhaust port. The inlet port introduces a mixing gas to an interior of the power amplifier during a cleaning operation so that the mixing gas contacts a surface of the catalyst having a build-up thereon. The mixing gas reacts with and removes the build-up by generating gaseous by-products. The exhaust port removes the gaseous by-products from the power amplifier.
    Type: Application
    Filed: July 26, 2024
    Publication date: November 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Ping YEN, Yen-Shuo SU, Jui-Pin WU, Chun-Lin CHANG, Han-Lung CHANG, Heng-Hsin LIU
  • Patent number: 12147166
    Abstract: An apparatus for manufacturing semiconductors includes a power amplifier to power a laser, a catalyst disposed in the power amplifier, an inlet port, and an exhaust port. The inlet port introduces a mixing gas to an interior of the power amplifier during a cleaning operation so that the mixing gas contacts a surface of the catalyst having a build-up thereon. The mixing gas reacts with and removes the build-up by generating gaseous by-products. The exhaust port removes the gaseous by-products from the power amplifier.
    Type: Grant
    Filed: June 15, 2023
    Date of Patent: November 19, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Ping Yen, Yen-Shuo Su, Jui-Pin Wu, Chun-Lin Chang, Han-Lung Chang, Heng-Hsin Liu
  • Publication number: 20230400787
    Abstract: An apparatus for manufacturing semiconductors includes a power amplifier to power a laser, a catalyst disposed in the power amplifier, an inlet port, and an exhaust port. The inlet port introduces a mixing gas to an interior of the power amplifier during a cleaning operation so that the mixing gas contacts a surface of the catalyst having a build-up thereon. The mixing gas reacts with and removes the build-up by generating gaseous by-products. The exhaust port removes the gaseous by-products from the power amplifier.
    Type: Application
    Filed: June 15, 2023
    Publication date: December 14, 2023
    Inventors: Chih-Ping YEN, Yen-Shuo SU, Jui-Pin WU, Chun-Lin CHANG, Han-Lung CHANG, Heng-Hsin LIU
  • Patent number: 11720035
    Abstract: In order to prevent observed long-term energy decay of power amplifiers and correspondingly increase the lifespan of CO2 lasers employing them, a hydrogen-doped mixing gas is supplied from an external pipeline during operation or periodic maintenance in order to effectively remove solid contaminants that build-up over time on a surface of a catalyst disposed within the power amplifier.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: August 8, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Ping Yen, Yen-Shuo Su, Jui-Pin Wu, Chun-Lin Chang, Han-Lung Chang, Heng-Hsin Liu
  • Publication number: 20230069707
    Abstract: In order to prevent observed long-term energy decay of power amplifiers and correspondingly increase the lifespan of CO2 lasers employing them, a hydrogen-doped mixing gas is supplied from an external pipeline during operation or periodic maintenance in order to effectively remove solid contaminants that build-up over time on a surface of a catalyst disposed within the power amplifier.
    Type: Application
    Filed: August 27, 2021
    Publication date: March 2, 2023
    Inventors: Chih-Ping YEN, Yen-Shuo SU, Jui-Pin WU, Chun-Lin CHANG, Han-Lung CHANG, Heng-Hsin LIU
  • Patent number: 11506986
    Abstract: In accordance with some embodiments, a lithography method in semiconductor manufacturing is provided. The lithography method includes transmitting a main pulse laser to a zone of excitation through a first optic assembly. The lithography method further includes supplying a coolant to the first optic assembly and detecting a temperature of the coolant with a use of at least one sensor. The lithography method also includes adjusting a heat transfer rate between the coolant and the first optic assembly based on the temperature of the first optic assembly. In addition, the lithography method includes generating a droplet of a target material into the zone of excitation. The lithography method further includes exciting the droplet of the target material into plasma with the main pulse laser in the zone of excitation.
    Type: Grant
    Filed: April 9, 2020
    Date of Patent: November 22, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi Yang, Yen-Shuo Su, Jui-Pin Wu, Li-Jui Chen
  • Publication number: 20210318625
    Abstract: In accordance with some embodiments, a lithography method in semiconductor manufacturing is provided. The lithography method includes transmitting a main pulse laser to a zone of excitation through a first optic assembly. The lithography method further includes supplying a coolant to the first optic assembly and detecting a temperature of the coolant with a use of at least one sensor. The lithography method also includes adjusting a heat transfer rate between the coolant and the first optic assembly based on the temperature of the first optic assembly. In addition, the lithography method includes generating a droplet of a target material into the zone of excitation. The lithography method further includes exciting the droplet of the target material into plasma with the main pulse laser in the zone of excitation.
    Type: Application
    Filed: April 9, 2020
    Publication date: October 14, 2021
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi YANG, Yen-Shuo SU, Jui-Pin WU, Li-Jui CHEN
  • Publication number: 20200256346
    Abstract: A method for controlling a rotational speed of a motor of a fan is provided in the present application, applicable to an air cleaner and including: calculating a suitable rotational speed range according to a space size of a use environment and a filter gauze type of the air cleaner; calculating a suitable rotational speed according to air quality sensed by a sensor or air quality information; subsequently, adjusting a rotational speed offset according to a relatively high or a relatively low rotational speed preferred by a user; checking whether a range at present is a timing enhancement range; determining that the rotational speed is not higher than a noise upper limit rotational speed; and setting a rotational speed of a motor of a fan.
    Type: Application
    Filed: April 29, 2020
    Publication date: August 13, 2020
    Inventors: Jui-Pin Wu, Chun-Yuan Lee, Chen-Chia Tsai, Ying-Peng Wu
  • Publication number: 20200232898
    Abstract: A method for calculating a service life of a filter gauze is applicable to an air cleaner. The method includes: according to data of a rotational speed of a fan and an airborne particle concentration, calculating an outlet air velocity, and a blocking ratio of the filter gauze; and further calculating a remaining service life of the filter gauze. In this way, a user can be more accurately informed of the remaining service life of the filter gauze, and instructed to change the filter gauze at the most appropriate time.
    Type: Application
    Filed: April 2, 2020
    Publication date: July 23, 2020
    Inventors: Jui-Pin Wu, Chun-Yuan Lee, Chen-Chia Tsai, Ying-Peng Wu
  • Publication number: 20180223855
    Abstract: A method for controlling a rotational speed of a motor of a fan is provided in the present application, applicable to an air cleaner and including: calculating a suitable rotational speed range according to a space size of a use environment and a filter gauze type of the air cleaner; calculating a suitable rotational speed according to air quality sensed by a sensor or air quality information; subsequently, adjusting a rotational speed offset according to a relatively high or a relatively low rotational speed preferred by a user; checking whether a range at present is a timing enhancement range; determining that the rotational speed is not higher than a noise upper limit rotational speed; and setting a rotational speed of a motor of a fan.
    Type: Application
    Filed: December 6, 2017
    Publication date: August 9, 2018
    Inventors: Jui-Pin Wu, Chun-Yuan Lee, Chen-Chia Tsai, Ying-Peng Wu
  • Publication number: 20180164204
    Abstract: The method for estimating a service life of a filter gauze in this application is applicable to an air cleaner. The method includes: calculating a relationship between an outlet air velocity, a rotational speed, and a blocking ratio of the filter gauze; and estimating a remaining service life of the filter gauze. In this way, a user can be more accurately informed of a remaining service life of a filter gauze, and instructed to change the filter gauze at a most appropriate time.
    Type: Application
    Filed: December 6, 2017
    Publication date: June 14, 2018
    Inventors: Jui-Pin Wu, Chun-Yuan Lee, Chen-Chia Tsai, Ying-Peng Wu
  • Publication number: 20160150148
    Abstract: A wireless network photographing apparatus and a setting method thereof are provided, where the wireless network photographing apparatus includes a switching unit, a network unit, and a processing unit. The processing unit enables a server mode or a client mode according to switching setting of the switching unit. When enabling the server mode, the processing unit enables, by using the network unit, an electronic apparatus to connect to the processing unit and set an apparatus connection parameter. When enabling the client mode, the processing unit performs a network connection according to the apparatus connection parameter and by using the network unit.
    Type: Application
    Filed: April 30, 2015
    Publication date: May 26, 2016
    Inventors: Chen-Chia TSAI, Jui-Pin WU, Wen-Wei CHANG, Hung-Hsin CHENG
  • Publication number: 20160142791
    Abstract: Provided is a video bandwidth adapting device and adapting method. This device first sets a plurality of network transmission paths according to bit rate settings of an IP camera (IPCam), selects one from the network transmission paths to acquire a video stream provided by the IPCam, then plays the video stream in a streaming playback manner, and afterwards, when it is determined that an average delay during playing of the video stream reaches or exceeds an upper limit, selects a network transmission path corresponding to a bit rate setting whose level is lower than that of the bit rate setting of the video stream, so as to acquire a video stream with a lower-level bit rate setting through the network transmission path.
    Type: Application
    Filed: May 19, 2015
    Publication date: May 19, 2016
    Inventors: Jui-Pin WU, Ying-Peng WU