Abstract: A pixel structure includes a pixel unit layer and a first metal wire layer. Each of control signal line and first and second scan signal lines in the first metal wire layer is connected to each pixel unit in a corresponding row. An insulating layer is disposed between each first metal patterned section in the first metal wire layer and a corresponding row of pixel units. A second metal wire layer includes initial signal lines and second metal patterned sections. Each initial signal line is connected to each pixel unit in a corresponding row. Each second metal patterned section overlaps with one of the first metal patterned sections to form a capacitor. Each connection signal line in a third metal wire layer connects the first scan signal line of a current row of pixel units to the second scan signal line of a next row of pixel units.

Abstract: A pixel structure includes a pixel unit layer and a first metal wire layer. Each of control signal line and first and second scan signal lines in the first metal wire layer is connected to each pixel unit in a corresponding row. An insulating layer is disposed between each first metal patterned section in the first metal wire layer and a corresponding row of pixel units. A second metal wire layer includes initial signal lines and second metal patterned sections. Each initial signal line is connected to each pixel unit in a corresponding row. Each second metal patterned section overlaps with one of the first metal patterned sections to form a capacitor. Each connection signal line in a third metal wire layer connects the first scan signal line of a current row of pixel units to the second scan signal line of a next row of pixel units.