Patents by Inventor Juing-Yu Wu

Juing-Yu Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150050810
    Abstract: A method for ameliorating corner rounding effects in a photolithographic process is provided. A semiconductor workpiece having an active device region is provided, and a photoresist layer is formed over the semiconductor workpiece. A mask is provided for patterning for the photoresist layer, wherein the mask comprises pattern having a sharp corner associated with the active device region. The sharp corner is separated from the active device region by a first distance in a first direction and a second distance in a second direction, wherein the first distance meets a minimum criteria for the photolithographic process, and wherein the second distance is greater than the first distance. The photoresist layer is then exposed to a radiation source, and the radiation source patterns the photoresist layer through the mask, defining an exposure region on the semiconductor workpiece having a rounded corner associated with the sharp corner.
    Type: Application
    Filed: August 15, 2013
    Publication date: February 19, 2015
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Liang-Yao Lee, Jyh-Kang Ting, Tsung-Chieh Tsai, Juing-Yu Wu