Patents by Inventor Julian Gerharz

Julian Gerharz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing a flat free contacting surface for semiconductor nanostructures
    Patent number: 10714568
    Abstract: A method for producing a planar free surface comprising embedded, contactable nanostructures includes arranging at least one nanostructure on a surface of an initial substrate; applying a first layer to the surface of the initial substrate, wherein the first layer embeds the at least one nanostructure; applying a target substrate to the first layer; and separating the initial substrate from the first layer such that the at least one nanostructure embedded in the first layer has a planar free surface. An additional layer is applied to the surface of the initial substrate before the at least one nanostructure is applied to the initial substrate, and in that the initial substrate is removed from the first layer using a solvent.
    Type: Grant
    Filed: October 22, 2016
    Date of Patent: July 14, 2020
    Assignee: FORSCHUNGZENTRUM JUELICH GMBH
    Inventors: Sebastian Heedt, Julian Gerharz, Thomas Schaepers, Detlev Gruetzmacher
  • METHOD FOR PRODUCING A FLAT FREE CONTACTING SURFACE FOR SEMICONDUCTOR NANOSTRUCTURES
    Publication number: 20180366543
    Abstract: A method for producing a planar free surface comprising embedded, contactable nanostructures includes arranging at least one nanostructure on a surface of an initial substrate; applying a first layer to the surface of the initial substrate, wherein the first layer embeds the at least one nanostructure; applying a target substrate to the first layer; and separating the initial substrate from the first layer such that the at least one nanostructure embedded in the first layer has a planar free surface. An additional layer is applied to the surface of the initial substrate before the at least one nanostructure is applied to the initial substrate, and in that the initial substrate is removed from the first layer using a solvent.
    Type: Application
    Filed: October 22, 2016
    Publication date: December 20, 2018
    Inventors: Sebastian Heedt, Julian Gerharz, Thomas Schaepers, Detlev Gruetzmacher