Patents by Inventor Juliane Charlotte BEHREND

Juliane Charlotte BEHREND has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and associated method
    Patent number: 10599040
    Abstract: A method of determining compatibility of a patterning device with a lithographic apparatus. The method includes determining an intensity distribution of a conditioned radiation beam across a sensor plane of an illumination system of the lithographic apparatus. The method further includes using the determined intensity distribution to calculate a non-uniformity of intensity caused by contamination and/or degradation of a collector. The method further includes determining the effect of the non-uniformity on a characteristic of an image of the patterned radiation beam. The method further includes determining the compatibility of the patterning device with the lithographic apparatus based on the effect of the non-uniformity on the characteristic.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: March 24, 2020
    Assignee: ASML Netherland B.V.
    Inventors: James Malcolm Weidman, Franciscus Johannes Blok, Erika Jane Prime, Juliane Charlotte Behrend
  • LITHOGRAPHIC APPARATUS AND ASSOCIATED METHOD
    Publication number: 20190056669
    Abstract: A method of determining compatibility of a patterning device with a lithographic apparatus. The method includes determining an intensity distribution of a conditioned radiation beam across a sensor plane of an illumination system of the lithographic apparatus. The method further includes using the determined intensity distribution to calculate a non-uniformity of intensity caused by contamination and/or degradation of a collector. The method further includes determining the effect of the non-uniformity on a characteristic of an image of the patterned radiation beam. The method further includes determining the compatibility of the patterning device with the lithographic apparatus based on the effect of the non-uniformity on the characteristic.
    Type: Application
    Filed: July 20, 2018
    Publication date: February 21, 2019
    Applicants: ASML NETHERLANDS B.V., ASML Holding N.V.
    Inventors: James Malcolm WEIDMAN, Franciscus Johannes BLOK, Erika Jane PRIME, Juliane Charlotte BEHREND