Abstract: The disclosure relates an atomic layer deposition and/or etching method comprising drawing, using a first precursor fluid, on a substrate a first line extending longitudinally and having, in lateral direction, a first linewidth, and drawing, using a second precursor fluid, on the substrate a second line extending longitudinally and having, in lateral direction, a second linewidth. The first and second lines partly overlap one another laterally by less than the first linewidth and the second linewidth, and/or the first and second lines are laterally spaced apart from one another by less than the first linewidth and the second linewidth, such that a first protrusion is formed of which a largest width in lateral direction is smaller than the first linewidth and the second linewidth, and/or a first recess is formed of which a largest width, in lateral direction, is smaller than the first linewidth and the second linewidth.

Abstract: A method (500) for conditioning or hydrolysis of an extruded membrane is disclosed. The method (500) comprising ion exchange processes in divided electrochemical cells using a cation exchanger membrane. The method (500) includes extruding the perfluorosulfonyl fluoride membranes from perfluorosulfonyl fluoride granulate. The method (500) also includes using a pretreatment technique to increase the ionic conductivity of the extruded perfluorosulfonyl fluoride membranes before using the perfluorosulfonic acid membranes in electrolysis cells. The method (500) also includes applying a milder pretreatment technique by activating S—F bonds to execute nucleophilic exchange of the fluoride group in a reaction. The method (500) also includes hydrolyzing sulfonyl fluoride groups to sulfonic acid using triethylsilanol.

Abstract: The invention relates to an atomic layer process printer for material deposition, etching and/or cleaning on an atomic scale in a selective area. The invention further relates to a method for material deposition, etching and/or cleaning on an atomic scale in a selective area using the atomic layer process printer.

Abstract: The invention relates to an atomic layer process printer for material deposition, etching and/or cleaning on an atomic scale in a selective area. The invention further relates to a method for material deposition, etching and/or cleaning on an atomic scale in a selective area using the atomic layer process printer.

Abstract: The invention consists of a new form of digital media document comprising content, applications and services that facilitate sharing and social expression on the Internet within a unified media object instead of being confined to specific websites such as social-networking services. This invention transforms content into content which is reusable, particularly for social expression, by enabling encapsulation of said content within an online document. This can be achieved by presenting a set of library applications to the user, where each application connects to a specific third-party web service, and presents the third-party service reusable content to the user, so the user can reuse in a very simple way, such as drag-and-drop. The invention promotes social engagement with digital multimedia while enabling social expression, commenting and editing of content or of the online document and optionally linking these activities to the website or service timeline.