Abstract: A method for structuring a decorative or technical pattern in the thickness of an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material, wherein the object is made of an at least partially transparent material including a top surface and a bottom surface which extends away from the top surface. The top or bottom surfaces is provided with a mask defining an opening whose outline corresponds to the profile of the pattern to be structured, the mask covering the top or bottom surface at the positions which are not to be structured. The pattern is structured with a mono- or multicharged ion beam through the opening of the mask, wherein the mechanical properties of the mask are sufficient to prevent the ions of the ion beam from etching the top or bottom surface at the positions where this top or bottom surface is covered by the mask.

Abstract: A method for colouring a part to be treated made of metal, this method including the step of implanting mono- or multi-charged ions in a surface layer of the part to be treated by directing towards this part to be treated a mono- or multi-charged ion beam produced by a source of mono- or multi-charged ions, the part to be treated changing colour under the effect of this ion implantation. A coloured metal can be obtained with the above method.

Abstract: A method for structuring a decorative or technical pattern in the thickness of an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material, wherein the object is made of an at least partially transparent material including a top surface and a bottom surface which extends away from the top surface. The top or bottom surfaces is provided with a mask defining an opening whose outline corresponds to the profile of the pattern to be structured, the mask covering the top or bottom surface at the positions which are not to be structured. The pattern is structured with a mono- or multicharged ion beam through the opening of the mask, wherein the mechanical properties of the mask are sufficient to prevent the ions of the ion beam from etching the top or bottom surface at the positions where this top or bottom surface is covered by the mask.

Abstract: A method for structuring a decorative or technical pattern in the thickness of an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material, wherein the object is made of an at least partially transparent material including a top surface and a bottom surface which extends away from the top surface. The top or bottom surfaces is provided with a mask defining an opening whose outline corresponds to the profile of the pattern to be structured, the mask covering the top or bottom surface at the positions which are not to be structured. The pattern is structured with a mono- or multicharged ion beam through the opening of the mask, wherein the mechanical properties of the mask are sufficient to prevent the ions of the ion beam from etching the top or bottom surface at the positions where this top or bottom surface is covered by the mask.

Abstract: A method hardens an anti-reflection treatment deposited on a transparent substrate that includes a top surface and a bottom surface which extends remotely from the top surface. The anti-reflection treatment includes depositing at least one anti-reflection layer of at least one material on at least one of the top and bottom surfaces of the transparent substrate, bombarding the at least one top or bottom surface on which the at least one anti-reflection layer has been deposited using a singly-charged and/or multi-charged ion beam produced by a singly-charged and/or multi-charged ECR electron cyclotron resonance ion source. The method produces a transparent substrate having undergone an anti-reflection treatment such that at least one of the top and bottom surfaces of the transparent substrate is coated with at least one anti-reflection layer of at least one material, whereby ions are implanted in the at least one anti-reflection layer.

Abstract: A method for structuring a decorative or technical pattern in the thickness of an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material, wherein the object is made of an at least partially transparent material including a top surface and a bottom surface which extends away from the top surface. The top or bottom surfaces is provided with a mask defining an opening whose outline corresponds to the profile of the pattern to be structured, the mask covering the top or bottom surface at the positions which are not to be structured. The pattern is structured with a mono- or multicharged ion beam through the opening of the mask, wherein the mechanical properties of the mask are sufficient to prevent the ions of the ion beam from etching the top or bottom surface at the positions where this top or bottom surface is covered by the mask.

Abstract: The invention relates to a decorative part (1, 3, 5) including several stones (2) and a device (7, 7?, 47, 47?) for securing the stones (2) in relation to each other. According to the invention, the securing device (7, 7?, 47, 47?) includes a single electrodeposited base (9, 9?, 49, 49?) whose shape matches one part of the stones, thus allowing all the stones (2) to be attached in relation to each other without any stress, and the girdles (6) of the stones (2) are mounted edge-to-edge in relation to each other so that the single base is concealed. The invention also relates to the method for manufacturing a part (1, 3, 5) of this type.

Abstract: The invention relates to a decorative part (1, 3, 5) including several stones (2) and a device (7, 7?, 47, 47?) for securing the stones (2) in relation to each other. According to the invention, the securing device (7, 7?, 47, 47?) includes a single electrodeposited base (9, 9?, 49, 49?) whose shape matches one part of the stones, thus allowing all the stones (2) to be attached in relation to each other without any stress, and the girdles (6) of the stones (2) are mounted edge-to-edge in relation to each other so that the single base is concealed. The invention also relates to the method for manufacturing a part (1, 3, 5) of this type.

Abstract: The invention relates to a decorative part (1, 3, 5) including several stones (2) and a device (7, 7?, 47, 47?) for securing the stones (2) in relation to each other. According to the invention, the securing device (7, 7?, 47, 47?) includes a single electrodeposited base (9, 9?, 49, 49?) whose shape matches one part of the stones, thus allowing all the stones (2) to be attached in relation to each other without any stress, and the girdles (6) of the stones (2) are mounted edge-to-edge in relation to each other so that the single base is concealed. The invention also relates to the method for manufacturing a part (1, 3, 5) of this type.

Abstract: The invention relates to a decorative part (1, 3, 5) including several stones (2) and a device (7, 7?, 47, 47?) for securing the stones (2) in relation to each other. According to the invention, the securing device (7, 7?, 47, 47?) includes a single electrodeposited base (9, 9?, 49, 49?) whose shape matches one part of the stones, allowing all the stones (2) to be attached in relation to each other without any stress, and the girdles (6) of the stones (2) are mounted edge-to-edge in relation to each other so that said single base is concealed. The invention also relates to the method for manufacturing a part (1, 3, 5) of this type. The invention concerns the field of pieces or jewellery or timepieces.