Abstract: A refractory object may include a zircon body that is intentionally doped with a dopant including an alkaline earth element and aluminum. The refractory object can have an improved creep deformation rate. In an embodiment, the refractory object can have a creep deformation rate of not greater than about 1.8 E-5 h?1 at a temperature of 1350° C. and a stress of 2 MPa. In another embodiment, the zircon body may include an amorphous phase including an alkaline earth metal element.

Abstract: A refractory object may include a zircon body that is intentionally doped with a dopant including an alkaline earth element and aluminum. The refractory object can have an improved creep deformation rate. In an embodiment, the refractory object can have a creep deformation rate of not greater than about 1.8 E-5 h?1 at a temperature of 1350° C. and a stress of 2 MPa. In another embodiment, the zircon body may include an amorphous phase including an alkaline earth metal element.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.

Abstract: A refractory object may include a Cr2O3 content of at least about 80 wt. % of a total weight of the refractory object, an Al2O3 content of at least about 0.7 wt. % and not greater than about 10.0 wt. % of the total weight of the refractory object, a SiO2 content of at least about 0.3 wt. % and not greater than about 5.0 wt. % of the total weight of the refractory object and a TiO2 content of at least about 1.0 wt. % and not greater than about 5.6 wt. % TiO2 of the total weight of the refractory object. The refractory object may further include an MOR of at least about 37 MPa as measured at 1200° C.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A component includes a body including zircon (ZrSiO4) grains, the body having a free silica intergranular phase present between the zircon grains and distributed substantially uniformly through the body. The body comprises a content of free silica not greater than about 2 wt. % for the total weight of the body.

Abstract: A zircon body for use in glass manufacturing is provided containing zircon grains and an intergranular phase present between the zircon grains. The intergranular phase may contain silicon oxide. The body may be exposed to a halide to at least partially remove at least a majority of the silicon oxide contained in the intergranular phase from the outer portion or to at least partially remove the intergranular phase along an outer portion of the component.

Abstract: A zircon body for use in glass manufacturing is provided containing zircon grains and an intergranular phase present between the zircon grains. The intergranular phase may contain silicon oxide. The body may be exposed to a halide to at least partially remove at least a majority of the silicon oxide contained in the intergranular phase from the outer portion or to at least partially remove the intergranular phase along an outer portion of the component.

Abstract: A component includes a body including zircon (ZrSiO4) grains, the body having a free silica intergranular phase present between the zircon grains and distributed substantially uniformly through the body. The body comprises a content of free silica not greater than about 2 wt. % for the total weight of the body.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A zircon body for use in glass manufacturing is provided containing zircon grains and an intergranular phase present between the zircon grains The intergranular phase may contain silicon oxide. The body may be exposed to a halide to at least partially remove at least a majority of the silicon oxide contained in the intergranular phase from the outer portion or to at least partially remove the intergranular phase along an outer portion of the component.

Abstract: A component includes a body including zircon (ZrSiO4) grains, the body having a free silica intergranular phase present between the zircon grains and distributed substantially uniformly through the body. The body comprises a content of free silica not greater than about 2 wt. % for the total weight of the body.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.

Abstract: A zircon body for use in glass manufacturing is provided containing zircon grains and an intergranular phase present between the zircon grains. The intergranular phase may contain silicon oxide. The body may be exposed to a halide to at least partially remove at least a majority of the silicon oxide contained in the intergranular phase from the outer portion or to at least partially remove the intergranular phase along an outer portion of the component.

Abstract: A tin oxide-based electrode formed from a composition including a majority component comprising tin-oxide (SnO2), and additives comprising CuO, ZnO, and a resistivity modifying species. The total amount of CuO and ZnO is not greater than about 0.3 wt %, and the ZnO is present in an amount within a range between about 0.1 wt % and about 0.19 wt %.

Abstract: A refractory article including a bushing block having a body comprising an opening extending through the body, wherein the bushing block is formed from a composition comprising a primary component comprising tin oxide. The composition for forming the bushing block body can further include at least one additive selected from the group of additives consisting of a corrosion inhibitor, a sintering aid, and a resistivity modifying species, or a combination thereof.