Abstract: The disclosed technology generally relates semiconductor devices and more particularly to a vertical transistor device, and a method of fabricating the same. In one aspect, the method includes providing, on a substrate, a fin formed of a stack of a first layer, a second layer and a third layer, wherein the second layer is positioned above the first layer and the third layer is positioned above the second layer. The method additionally includes forming a dielectric on the sidewalls of the first and third layers of the fin selectively against a sidewall of the second layer, and the method additionally includes forming a gate contacting layer for contacting a sidewall of the second layer. The first and third layers define a source region and a drain region, respectively, of the vertical transistor device. The second layer defines a channel region of the vertical transistor device.

Abstract: The disclosed technology generally relates to semiconductor devices and more particularly to a semiconductor device comprising stacked complementary transistor pairs.

Abstract: The disclosed technology generally relates to semiconductor fabrication, and more particularly to a method of defining routing tracks for a standard cell semiconductor device, and to the standard cell semiconductor device fabricated using the method. In one aspect, a method of defining routing tracks in a target layer over a standard cell semiconductor device includes forming mandrels and forming a first set and a second set of spacers for defining the routing tracks. The standard cell semiconductor device includes a device layer and the routing tracks for contacting a device layer. The routing tracks include at least two pairs of off-center routing tracks, a central routing track arranged between the pairs of off-center routing tracks, and at least two edge tracks arranged on opposing sides of the at least two pairs of off-center routing tracks.

Abstract: The disclosed technology generally relates to semiconductor fabrication, and more particularly to a method of defining routing tracks for a standard cell semiconductor device, and to the standard cell semiconductor device fabricated using the method. In one aspect, a method of defining routing tracks in a target layer over a standard cell semiconductor device includes forming mandrels and forming a first set and a second set of spacers for defining the routing tracks. The standard cell semiconductor device includes a device layer and the routing tracks for contacting a device layer. The routing tracks include at least two pairs of off-center routing tracks, a central routing track arranged between the pairs of off-center routing tracks, and at least two edge tracks arranged on opposing sides of the at least two pairs of off-center routing tracks.

Abstract: The disclosed technology relates to a memory device for a dynamic random access memory, or DRAM. In one aspect, the memory device includes a substrate supporting a semiconductor device layer in which a plurality of semiconductor devices are formed. The memory device may further include an interconnection portion formed above the substrate and including a number of metallization levels and dielectric layers, the interconnection portion being adapted to interconnect said semiconductor devices. The memory device may further include a plurality of bit cell stacks arranged in the interconnection portion, each bit cell stack including a plurality of bit cells. Further, such bit cells may include elements such as a charge storage element, a write transistor, and a read transistor.

Abstract: A semiconductor device includes: (i) a substrate; (ii) a first elongated semiconductor structure extending in a first horizontal direction along the substrate and protruding vertically above the substrate, wherein a first set of source/drain regions are formed on the first semiconductor structure; (iii) a second elongated semiconductor structure extending along the substrate in parallel to the first semiconductor structure and protruding vertically above the substrate, wherein a second set of source/drain regions are formed on the second semiconductor structure; and (iv) a first set of source/drain contacts formed on the first set of source/drain regions, wherein a first source/drain contact of the first set of source/drain contacts includes: (a) a vertically extending contact portion formed directly above a first source/drain region of the first set of source/drain regions, and (b) a via landing portion protruding horizontally from the vertically extending contact portion in a direction towards the second se

Abstract: According to one aspect, a ferroelectric field effect transistor (FeFET) memory device and a method of programming the device is disclosed. The FeFET is configured such that a ferroelectric memory region of the FeFET is programmable by an electric field applied between a gate structure and a source region and a drain region through the ferroelectric region.

Abstract: In an aspect of the disclosed technology, a SRAM device includes a first stack of transistors and a second stack of transistors arranged on a substrate. Each of the first and second stacks includes a pull-up transistor, a pull-down transistor and a pass transistor, where each of the transistors includes a horizontally extending channel. In each of the first and second stacks, the pull-up transistor and the pull-down transistor have a common gate electrode extending vertically therebetween, and the pass transistor has a gate electrode separated from the common gate electrode. A source/drain of each of the pull-up transistor and the pull-down transistor and a source/drain of the pass transistor included in one of the first stack and the second stack are electrically interconnected with the common gate electrode of the pull-up transistor and the pull-down transistor included in the other of the first stack and the second stack.

Abstract: A method for forming a pattern for an integrated circuit is disclosed. In one aspect, the method includes (a) providing a hardmask layer; (b) overlaying the hard mask layer with a set of parallel material lines delimiting gaps therebetween; and (c) providing a spacer layer following the shape of the material layer. The method further includes (d) removing a top portion of the spacer layer, thereby forming spacer lines alternatively separated by material lines and by gaps; and (e) providing a blocking element in a portion of a gap. The method also includes (f) etching selectively the hard mask layer by using the material layer, the spacer lines and the blocking element as a mask, thereby providing a first set of parallel trenches in the hardmask layer, wherein a trench has a blocked portion; and (g) selectively removing the blocking element.

Abstract: The disclosed technology generally relates semiconductor devices and more particularly to a vertical transistor device, and a method of fabricating the same. In one aspect, the method includes providing, on a substrate, a fin formed of a stack of a first layer, a second layer and a third layer, wherein the second layer is positioned above the first layer and the third layer is positioned above the second layer. The method additionally includes forming a dielectric on the sidewalls of the first and third layers of the fin selectively against a sidewall of the second layer, and the method additionally includes forming a gate contacting layer for contacting a sidewall of the second layer. The first and third layers define a source region and a drain region, respectively, of the vertical transistor device. The second layer defines a channel region of the vertical transistor device.

Abstract: The disclosed technology generally relates to semiconductor fabrication and more particularly to forming vertical transistor devices. In an aspect, a method of forming a vertical transistor device includes forming, on a substrate, a fin comprising a stack including a first layer, a second layer formed above the first layer and a third layer formed above the second layer. The method additionally includes forming a gate layer serving as an etch mask above the third layer. The method further includes etching the second and third layers of the fin using the gate layer as the etch mask to form a pillar. First and third layers of the pillar define a source region and a drain region, respectively, of the vertical transistor device. A second layer of the pillar defines a channel region of the vertical transistor device. The gate layer comprises a gate electrode arranged on at least one sidewall of the second layer.

Abstract: A semiconductor circuit comprises a Front End of Line (FEOL) comprising a plurality of transistors, each of which having a source region, a drain region and a gate region arranged between the source region and the drain region and comprising a gate electrode. The semiconductor circuit also comprises a buried interconnect that is arranged in the FEOL and electrically connected to the gate region from below through a bottom contact portion of the gate electrode. By using a buried interconnect the routing of the circuit may be facilitated.

Abstract: The disclosed technology generally relates to semiconductor devices, and more particularly to a standard cell semiconductor device comprising transistors having vertical channels and a common gate. In one aspect, a standard cell semiconductor device comprises a substrate, a unit cell having a first transistor and a second transistor, a gate layer common to the first and second transistor, and a set of routing tracks for contacting the first and second transistor. Each one of the first and second transistors is formed of a stack of layers arranged between at least some of the routing tracks and the substrate, wherein each stack comprises a bottom terminal arranged on the substrate, a channel arranged on the bottom terminal and a top terminal arranged on the channel. The channel of the first transistor is an N-type channel, and the channel of the second transistor is a P-type channel.

Abstract: The disclosed technology generally relates to semiconductor memory devices, and more particularly to a static random access memory (SRAM) device. One aspect of the disclosed technology is a bit cell for a static random access memory (SRAM) comprising: a first and a second vertical stack of transistors arranged on a substrate. Each stack includes a pull-up transistor, a pull-down transistor and a pass transistor, each transistor including a horizontally extending channel, the pull-up transistor and the pull-down transistor having a common gate electrode extending vertically between the pull-up transistor and the pull-down transistor and the pass transistor having a gate electrode being separate from the common gate electrode. A source/drain of the pull-up transistor and of the pull-down transistor of the first stack, a source/drain of the pass transistor of the first stack and the common gate electrode of the pull-up and pull-down transistors of the second stack are electrically interconnected.

Abstract: An integrated circuit (IC) chip having power and ground rails incorporated in the front end of line (FEOL) is disclosed. In one aspect, these power and ground rails are at the same level as the active devices and are therefore buried deep in the IC, as seen from the front of the chip. The connection from the buried interconnects to the source and drain areas is established by local interconnects. These local interconnects are not part of the back end of line, but they are for the most part embedded in a pre-metal dielectric layer onto which the BEOL is produced. In a further aspect, a power delivery network (PDN) of the IC is located in its entirety on the backside of the chip. The PDN is connected to the buried interconnects through suitable connections, for example metal-filled through-semiconductor vias or through silicon vias.

Abstract: The disclosed technology generally relates to semiconductor fabrication, and more particularly to a method of defining routing tracks for a standard cell semiconductor device, and to the standard cell semiconductor device fabricated using the method. In one aspect, a method of defining routing tracks in a target layer over a standard cell semiconductor device includes forming mandrels and forming a first set and a second set of spacers for defining the routing tracks. The standard cell semiconductor device includes a device layer and the routing tracks for contacting a device layer. The routing tracks include at least two pairs of off-center routing tracks, a central routing track arranged between the pairs of off-center routing tracks, and at least two edge tracks arranged on opposing sides of the at least two pairs of off-center routing tracks.

Abstract: The disclosed technology relates to a memory device for a dynamic random access memory, or DRAM. In one aspect, the memory device includes a substrate supporting a semiconductor device layer in which a plurality of semiconductor devices are formed. The memory device may further include an interconnection portion formed above the substrate and including a number of metallization levels and dielectric layers, the interconnection portion being adapted to interconnect said semiconductor devices. The memory device may further include a plurality of bit cell stacks arranged in the interconnection portion, each bit cell stack including a plurality of bit cells. Further, such bit cells may include elements such as a charge storage element, a write transistor, and a read transistor.

Abstract: The disclosed technology generally relates to semiconductor devices, and more particularly to semiconductor devices having a stacked arrangement, and further relates to methods of fabricating such devices. In one aspect, a semiconductor device comprises a first memory device and a second memory device formed over a substrate and at least partly stacked in a vertical direction. Each of the first and second memory devices has a plurality of vertical transistors, wherein each vertical transistor has a vertical channel extending in the vertical direction.

Abstract: A method for forming a pattern for an integrated circuit is disclosed. In one aspect, the method includes (a) providing a hardmask layer; (b) overlaying the hard mask layer with a set of parallel material lines delimiting gaps therebetween; and (c) providing a spacer layer following the shape of the material layer. The method further includes (d) removing a top portion of the spacer layer, thereby forming spacer lines alternatively separated by material lines and by gaps; and (e) providing a blocking element in a portion of a gap. The method also includes (f) etching selectively the hard mask layer by using the material layer, the spacer lines and the blocking element as a mask, thereby providing a first set of parallel trenches in the hardmask layer, wherein a trench has a blocked portion; and (g) selectively removing the blocking element.

Abstract: The disclosed technology generally relates to semiconductor devices and more particularly to a gate structure for a semiconductor device, and to methods of forming the same. In an aspect a method for forming a gate structure includes forming a first set of one or more semiconductor features and a second set of one or more semiconductor features. The method additionally includes forming a sacrificial gate extending across the semiconductor features of the first set and the semiconductor features of the second set.