Abstract: A method for measuring parameters of one or more optical beams emitted by an optoelectronic system, and an associated device. The measurement method includes a calculation of a position of an attachment area of a movement system on which an optical device is attached, such that an alignment axis of the attachment zone coincides with an expected emission axis of the optical beam. The calculation is carried out based on characteristic data of the optoelectronic system. The method includes positioning the attachment area relative to the optoelectronic system, in the calculated position, and a measurement of one or more parameters of the optical beam by the optical device.