Patents by Inventor Julio R. Reyes

Julio R. Reyes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask assembly and method for protecting the same from contaminants generated during a lithography process
    Patent number: 7531275
    Abstract: A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.
    Type: Grant
    Filed: July 26, 2006
    Date of Patent: May 12, 2009
    Assignee: Toppan Photomasks, Inc.
    Inventors: Xun Zhang, Joseph Stephen Gordon, Janice M. Paduano, Xiaoming Chen, Julio R. Reyes
  • Photomask assembly and method for protecting the same from contaminants generated during a lithography process
    Patent number: 7094505
    Abstract: A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: August 22, 2006
    Assignee: Toppan Photomasks, Inc.
    Inventors: Xun Zhang, Joseph Stephen Gordon, Janice M. Paduano, Xiaoming Chen, Julio R. Reyes
  • Photomask assembly and method for protecting the same from contaminants generated during a lithography process
    Publication number: 20040137339
    Abstract: A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.
    Type: Application
    Filed: October 29, 2003
    Publication date: July 15, 2004
    Applicant: DuPont Photomasks, Inc.
    Inventors: Xun Zhang, Joseph Stephen Gordon, Janice M. Paduano, Xiaoming Chen, Julio R. Reyes