Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater unit. The heater unit includes a first power feeding portion, a second power feeding portion, and a heater line. The heater line includes a plurality of extension portions arranged in a second direction. The plurality of extension portions includes a first extension portion and a second extension portion. A third distance between the first extension portion and a first virtual tangent and a fourth distance between the second extension portion and a second virtual tangent each are not more than a first distance between the first power feeding portion and the second power feeding portion. The third distance and the fourth distance each are not more than a second distance between the plurality of extension portions.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater unit. The heater unit includes first and second heater elements. The first heater element includes a first zone. The first heater element includes first and second protruding portions. The first zone includes a first facing region in which the first protruding portion and the second protruding portion are disposed so as to face and be adjacent to each other. The second heater element includes a second zone. The second zone includes a central region and an outer peripheral region. The central region is positioned at a center of the second zone. The outer peripheral region is positioned outside the central region. The first facing region is located at a position where the first facing region overlaps the central region.

Abstract: An electrostatic chuck includes a base plate, a first heater element, and a plurality of first power feeding terminals. The base plate includes a communicating path having a spiral shape. The first heater element includes a plurality of first zones. The plurality of first power feeding terminals feeds power to the plurality of first zones. Each of the plurality of first zones includes a first heater line and a pair of first power feeding portions feeding power to the first heater line. The pair of first power feeding portions is electrically connected to the plurality of first power feeding terminals. The plurality of first power feeding terminals includes a first and a second annular portion. The communicating path includes a first circumferential portion surrounding the second annular portion between the first annular portion and the second annular portion when viewed along a stacking direction.

Abstract: An electrostatic chuck 10 includes a dielectric substrate 100, a base plate 200 which supports the dielectric substrate 100, and a joining layer 300 which joins the dielectric substrate 100 and the base plate 200. A value of a dielectric tangent of the joining layer 300 when a temperature of the joining layer 300 is 20° C. is set as a reference value. In the electrostatic chuck 10, when the temperature of the joining layer 300 has changed from 20° C. to ?60° C., a range in which the value of the dielectric tangent of the joining layer 300 fluctuates falls within a range from 50% to 200% of the reference value.

Abstract: An electrostatic chuck (10) includes a dielectric substrate (100) and a heater unit (300) configured to heat the dielectric substrate (100). The heater unit (300) includes a power supply portion (390) configured to receive a supply of power from an external source, a heat generation portion (331) that is a conductor drawn in a linear shape and configured to receive the supply of power from the power supply portion (390) and generate heat, and a bypass layer (370) connecting the power supply portion (390) and the heat generation portion (331). The heat generation portion (331) includes a widened portion (332) that is a section in which a line width of the heat generation portion (331) is locally widened. The bypass layer (370) is connected to the heat generation portion (331) at a plurality of locations in the widened portion (332).

Abstract: An electrostatic chuck includes a dielectric substrate, a base plate which is a metallic member joined to the dielectric substrate and in which a gas hole is formed, and a vent plug arranged inside the gas hole. The vent plug has a porous section which is a section made of a porous ceramic with air permeability, and a dense section which is a section made of a dense ceramic without air permeability, and which surrounds a whole circumference of the porous section from an outer circumference side. The porous section and the dense section are formed together into one piece by sintering without sandwiching a joining material made of a material other than a ceramic.

Abstract: An electrostatic chuck includes a dielectric substrate, a base plate which is a metallic member joined to the dielectric substrate and in which a gas hole is formed, and a vent plug arranged inside the gas hole. The vent plug has a porous section which is a section made of a porous ceramic with air permeability, and a dense section which is a section made of a dense ceramic without air permeability, and which surrounds a whole circumference of the porous section from an outer circumference side. The porous section and the dense section are formed together into one piece by sintering without sandwiching a joining material made of a material other than a ceramic.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, a heater part, and a bypass part. The ceramic dielectric substrate includes a substrate upper surface and a substrate lower surface. The heater part is disposed between the substrate upper surface and the substrate lower surface. The heater part includes at least one heater layer. The heater part includes a heater upper surface and a heater lower surface. The bypass part includes a first bypass portion disposed lower than the substrate lower surface. The first bypass portion including a first bypass upper surface and a first bypass lower surface. A second distance between the heater lower surface and the first bypass upper surface is greater than a first distance between the heater upper surface and the substrate upper surface.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate and a base plate. The ceramic dielectric substrate includes a first major surface, a second major surface, a groove part, and a plurality of cooling gas holes. The groove part includes first and second circumferential grooves, and first and second radial-direction grooves. The plurality of cooling gas holes includes first and second holes. The first hole overlaps the first radial-direction groove. The second hole overlaps the second radial-direction groove. The base plate includes a gas inlet path that supplies the cooling gas to the first and second holes. The first circumferential groove includes first and second end portions. The second circumferential groove includes third and fourth end portions. The third end portion and the fourth end portion do not overlap the first end portion in the radial direction.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater unit. The heater unit includes a first power feeding portion, a second power feeding portion, and a heater line. The heater line includes a plurality of extension portions arranged in a second direction. The plurality of extension portions includes a first extension portion and a second extension portion. A third distance between the first extension portion and a first virtual tangent and a fourth distance between the second extension portion and a second virtual tangent each are not more than a first distance between the first power feeding portion and the second power feeding portion. The third distance and the fourth distance each are not more than a second distance between the plurality of extension portions.

Abstract: An electrostatic chuck includes a base plate, a first heater element, and a plurality of first power feeding terminals. The base plate includes a communicating path having a spiral shape. The first heater element includes a plurality of first zones. The plurality of first power feeding terminals feeds power to the plurality of first zones. Each of the plurality of first zones includes a first heater line and a pair of first power feeding portions feeding power to the first heater line. The pair of first power feeding portions is electrically connected to the plurality of first power feeding terminals. The plurality of first power feeding terminals includes a first and a second annular portion. The communicating path includes a first circumferential portion surrounding the second annular portion between the first annular portion and the second annular portion when viewed along a stacking direction.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate and a base plate. The base plate includes a communicating path configured to allow a coolant to pass. The communicating path includes a first flow path part having a pair of side surfaces along a first direction. The first direction is along a flow of the coolant. When viewed along a stacking direction, one side surface of the pair of side surfaces includes a plurality of convex portions and a plurality of concave portions. The plurality of convex portions is convex in a second direction. The second direction is perpendicular to the first direction. The second direction is from the other side surface toward the one side surface of the pair of side surfaces. The plurality of concave portions is convex in an opposite direction of the second direction.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater unit. The heater unit includes first and second heater elements. The first heater element includes a first zone. The first heater element includes first and second protruding portions. The first zone includes a first facing region in which the first protruding portion and the second protruding portion are disposed so as to face and be adjacent to each other. The second heater element includes a second zone. The second zone includes a central region and an outer peripheral region. The central region is positioned at a center of the second zone. The outer peripheral region is positioned outside the central region. The first facing region is located at a position where the first facing region overlaps the central region.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate; a base plate; and a heater unit which heats the ceramic dielectric substrate. The heater unit includes a first heater element. The first heater element has a plurality of sub-zones. The sub-zones include a first sub-zone. The first sub-zone includes a sub-heater line generating heat by allowing a current to flow, a first sub-power feeding portion feeding a power to the sub-heater line, and a second sub-power feeding portion feeding a power to the sub-heater line. The first sub-zone has a central region located centrally in the first sub-zone and an outer peripheral region located outside the central region when viewed along a Z-direction perpendicular to the first major surface. At least one of the first sub-power feeding portion and the second sub-power feeding portion is provided in the central region.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate; a base plate; and a heater unit which heats the ceramic dielectric substrate. The heater unit includes first and second heater elements. The second heater element has a plurality of main zones separated from each other in a radial direction. The first heater element has a plurality of sub-zones separated from each other. A number of the sub-zones is larger than a number of the main zones. The main zones include a first main zone. The first main zone has a main heater line and a first main power feeding portion. The sub-zones include a first sub-zone overlapping the first main zone. The first sub-zone has a central region and an outer peripheral region. The first main power feeding portion is provided at a position where the first main power feeding portion overlaps the central region.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate and a base plate. The ceramic dielectric substrate includes a first major surface, a second major surface, a groove part, and a plurality of cooling gas holes. The groove part includes first and second circumferential grooves, and first and second radial-direction grooves. The plurality of cooling gas holes includes first and second holes. The first hole overlaps the first radial-direction groove. The second hole overlaps the second radial-direction groove. The base plate includes a gas inlet path that supplies the cooling gas to the first and second holes. The first circumferential groove includes first and second end portions. The second circumferential groove includes third and fourth end portions. The third end portion and the fourth end portion do not overlap the first end portion in the radial direction.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate; a base plate; and a heater unit which heats the ceramic dielectric substrate. The heater unit includes first and second heater elements. The second heater element has main zones separated from each other in a radial direction. The first heater element has sub-zones separated from each other. A number of the sub-zones is larger than a number of the main zones. The main zones include a first main zone and a second main zone adjacent to the first main zone with a first boundary therebetween in the radial direction. The sub-zones include a first sub-zone having a first radial end as an end portion thereof in the radial direction. The first sub-zone overlaps at least one of the first main zone and the second main zone. At least a portion of the first radial end does not overlap the first boundary.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate; a base plate; and a heater unit which heats the ceramic dielectric substrate. The heater unit includes first and second heater elements. The second heater element has a plurality of main zones separated from each other in a radial direction. The first heater element has a plurality of sub-zones separated from each other. A number of the sub-zones is larger than a number of the main zones. The main zones include a first main zone. The first main zone has a main heater line and a first main power feeding portion. The sub-zones include a first sub-zone overlapping the first main zone. The first sub-zone has a central region and an outer peripheral region. The first main power feeding portion is provided at a position where the first main power feeding portion overlaps the central region.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate; a base plate; and a heater unit which heats the ceramic dielectric substrate. The heater unit includes a first heater element. The first heater element has a plurality of sub-zones. The sub-zones include a first sub-zone. The first sub-zone includes a sub-heater line generating heat by allowing a current to flow, a first sub-power feeding portion feeding a power to the sub-heater line, and a second sub-power feeding portion feeding a power to the sub-heater line. The first sub-zone has a central region located centrally in the first sub-zone and an outer peripheral region located outside the central region when viewed along a Z-direction perpendicular to the first major surface. At least one of the first sub-power feeding portion and the second sub-power feeding portion is provided in the central region.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate; a base plate; and a heater unit heating the ceramic dielectric substrate. The heater unit includes a first heater element. The first heater element has a plurality of sub-zones and a plurality of cooling gas holes. The sub-zones are separated from each other in a circumferential direction. The cooling gas holes are provided in the sub-zones. The cooling gas holes are disposed in the circumferential direction and are provided at positions where the cooling gas holes do not overlap a boundary in the circumferential direction between the sub-zones in a Z-direction perpendicular to the first major surface.