Abstract: An information processing device includes a processor configured to acquire a document image illustrating a document, acquire a related character string associated with a target character string included in the document image, and extract target information corresponding to the target character string from a region set with reference to a position of the related character string in the document image.

Abstract: A fibrous body processing apparatus includes a humidifying unit, a first processing unit, a second processing unit, a first supply passage, a second supply passage, and a returning passage. The humidifying unit generates humidified air. The first processing unit processes a material that contains fibers. The second processing unit processes the material that was processed at the first processing unit. Humidified air is supplied from the humidifying unit to the first processing unit through the first supply passage. Humidified air is supplied from the first processing unit to the second processing unit, together with the material, through the second supply passage. The returning passage includes an upstream-side end portion and a downstream-side end portion. Humidified air is returned from the second supply passage or the second processing unit to the humidifying unit through the returning passage.

Abstract: A fibrous body processing apparatus includes a coarsely-crushed-pieces reservoir unit; a humidifying unit that generates humidified air and supplies the humidified air to the coarsely-crushed-pieces reservoir unit; a weight measurement unit that measures a weight of the coarsely crushed pieces let out of the coarsely-crushed-pieces reservoir unit; a fixed amount supplying unit that supplies a fixed amount of the coarsely crushed pieces measured by the weight measurement unit; a defibrating unit that defibrates the coarsely crushed pieces supplied from the fixed amount supplying unit; a first transportation portion through which the coarsely crushed pieces are sent from the coarsely-crushed-pieces reservoir unit to the weight measurement unit; a second transportation portion through which the coarsely crushed pieces are sent from the fixed amount supplying unit to the defibrating unit; and a generated at the humidifying unit is supplied to the defibrating unit while bypassing the weight measurement unit.

Abstract: Provided is a method for producing a lithium tantalate single crystal substrate capable of suppressing increase in volume resistivity of the lithium tantalate single crystal substrate owing to reduction failure even when a lithium carbonate power is repeatedly used in heat treatment for the lithium tantalate single crystal substrate. The invention is a method for producing a lithium tantalate single crystal substrate having a volume resistivity of 1×1010 ?·cm or more and less than 1×1012 ?·cm, including a step of heat-treating a lithium tantalate single crystal substrate having a volume resistivity of 1×1012 ?·cm or more and having a single-domain structure, under normal pressure and at a temperature of 350° C. or higher but not higher than the Curie temperature thereof while burying it in a lithium carbonate powder having a BET specific surface area of 0.

Abstract: There is provided a plasma processing apparatus for performing plasma processing or a substrate, comprising: a chamber; a substrate support disposed in the chamber and including a base, an electrostatic chuck on the base, and an edge ring disposed to surround a substrate mounted on the electrostatic chuck; a Radio Frequency (RF) power supply for supplying RF power for generating plasma from gases in the chamber; a DC power supply for applying a negative DC voltage to the edge ring; a waveform control element for controlling a waveform of the DC voltage; and a controller for controlling a time taken for the DC voltage to reach a desired value by adjusting a constant of the waveform control element.

Abstract: An apparatus for plasma processing is configured to generate plasma in a chamber and periodically apply a pulsed negative DC voltage to an upper electrode from a DC power supply in the plasma processing on a substrate and in plasma cleaning. A duty ratio of the pulsed negative DC voltage used for the plasma processing is smaller than a duty ratio of the pulsed negative DC voltage used for the plasma cleaning. An absolute value of an average value of an output voltage of the DC power supply used for the plasma processing is smaller than an absolute value of an average value of the output voltage of the DC power supply used for the plasma cleaning.

Abstract: The light wave distance meter is disclosed, including: a distance measuring light-emitting unit; a light-receiving signal generating unit; and a control arithmetic unit. A light-receiving signal includes a first intermittent light-receiving signal corresponding to a first distance measuring light, a second intermittent light-receiving signal corresponding to a second distance measuring light, a third intermittent light-receiving signal corresponding to a third distance measuring light, and a fourth intermittent light-receiving signal corresponding to a fourth distance measuring light. The control arithmetic unit executes an error determination control to acquire a shift signal generated by shifting at least a phase of any one of the first to fourth intermittent light-receiving signals by 2?·n??/2 or 2?·n+?/2, and compares the phase of the shift signal and the phase of the intermittent light-receiving signal at least between either the first frequencies or between the second frequencies.

Abstract: The inclination sensor includes a gimbal mechanism rotatably supported around a first shaft and a second shaft, a first motor, a second motor, an acceleration sensor disposed in the gimbal mechanism with an origin point of coordinate axes being coincident with a point of intersection of a shaft center of the first shaft and a shaft center of the second shaft, and a control unit that simultaneously rotates the first shaft and the second shaft to continuously rotate the acceleration sensor around the first shaft and the second shaft and applies frequency analysis to the output values from the acceleration sensor to arithmetically determine the inclination angle with respect to the horizontal direction.

Abstract: An electro-optical distance meter measures an electrical noise signal in a state where a received light amount adjusting means completely blocks light and measure a distance-measuring signal under a proper state of the adjusting means to calculate a distance by subtracting the electrical noise signal and an optical noise signal from the distance-measuring signal. The distance meter measures a first noise signal in a state where the adjusting means completely blocks light with a noise measuring jig having a unique jig-derived noise signal attached and a second noise signal in a state where the adjusting means transmits light most with the noise measuring jig attached, to calculate the optical noise signal by subtracting the first noise signal and the jig-derived noise signal from the second noise signal. The noise measuring jig is detachably attached to the electro-optical distance meter and removes reflected light entering the light receiving element when attached.

Abstract: Provided is an electro-optical distance meter includes a light transmitting unit configured to emit distance-measuring light along a collimation axis toward a measuring object; a light receiving unit including a light receiving element configured to receive reflected distance-measuring light and convert the reflected distance-measuring light into a distance-measuring signal, and a received light amount adjuster configured to adjust a light amount entering the light receiving element; an arithmetic control unit; and a storage unit. The arithmetic control unit calculates a true distance-measuring signal by subtracting an optical noise signal stored in advance in the storage unit and an electrical noise signal measured before a distance measurement from the distance-measuring signal, and calculates a distance to the measuring object based on the true distance-measuring signal.

Abstract: Provided is a method for producing a lithium tantalate single crystal substrate capable of suppressing increase in volume resistivity of the lithium tantalate single crystal substrate owing to reduction failure even when a lithium carbonate power is repeatedly used in heat treatment for the lithium tantalate single crystal substrate. The invention is a method for producing a lithium tantalate single crystal substrate having a volume resistivity of 1×1010 ?·cm or more and less than 1×1012 ?·cm, including a step of heat-treating a lithium tantalate single crystal substrate having a volume resistivity of 1×1012 ?·cm or more and having a single-domain structure, under normal pressure and at a temperature of 350° C. or higher but not higher than the Curie temperature thereof while burying it in a lithium carbonate powder having a BET specific surface area of 0.

Abstract: In a plasma processing apparatus, a controller specifies a time point when a current starts to flow between an edge ring and a DC power supply after beginning an application of a negative DC voltage to the edge ring from the DC power supply. The controller specifies, from a voltage measurement value indicating a voltage of the edge ring at the time point, an estimate of a self-bias voltage of the edge ring generated by a supply of a radio frequency power. The controller sets a sum of an absolute value of the estimate of the self-bias voltage and a set value as an absolute value of the negative DC voltage to be applied to the edge ring by the DC power supply.

Abstract: A plasma processing method according to an exemplary embodiment includes generating plasma from a film formation gas in a chamber of a plasma processing apparatus by supplying radio frequency power from a radio frequency power source. The plasma processing method further includes forming a protective film on an inner wall surface of a side wall of the chamber by depositing a chemical species from the plasma on the inner wall surface. In the forming a protective film, a pulsed negative direct-current voltage is periodically applied from a direct-current power source device to an upper electrode of the plasma processing apparatus.

Abstract: [Object] It is an object of the present invention to provide a lithium tantalate single crystal substrate which undergoes only small warpage, is free from cracks and scratches, has better temperature non-dependence characteristics and a larger electromechanical coupling coefficient than a conventional Y-cut LiTaO3 substrate.

Abstract: A plasma processing method according to an exemplary embodiment includes generating plasma from a film formation gas in a chamber of a plasma processing apparatus by supplying radio frequency power from a radio frequency power source. The plasma processing method further includes forming a protective film on an inner wall surface of a side wall of the chamber by depositing a chemical species from the plasma on the inner wall surface. In the forming a protective film, a pulsed negative direct-current voltage is periodically applied from a direct-current power source device to an upper electrode of the plasma processing apparatus.

Abstract: An apparatus for plasma processing is configured to generate plasma in a chamber and periodically apply a pulsed negative DC voltage to an upper electrode from a DC power supply in the plasma processing on a substrate and in plasma cleaning. A duty ratio of the pulsed negative DC voltage used for the plasma processing is smaller than a duty ratio of the pulsed negative DC voltage used for the plasma cleaning. An absolute value of an average value of an output voltage of the DC power supply used for the plasma processing is smaller than an absolute value of an average value of the output voltage of the DC power supply used for the plasma cleaning.

Abstract: A lithium tantalate single crystal substrate for a surface acoustic wave device that is a rotated Y-cut LiTaO3 substrate whose crystal orientation has a Y-cut angle of not smaller than 36° and not larger than 49° and which has such a Li concentration profile after diffusion of Li into the substrate from the surface thereof that the Li concentration at the surface of the substrate differs from that inside the substrate. A shear vertical type elastic wave whose main components are vibrations in the thickness direction and in the propagation direction and which is among those elastic waves which propagate in the X axis direction within the surface of this LiTaO3 substrate has an acoustic velocity of not lower than 3140 m/s and not higher than 3200 m/s.

Abstract: Decrease in a measurable distance that occurs when a distance measuring light is obliquely incident on an object is suppressed. A distance measuring device 100 includes an emitting unit 103, a detecting unit 104, a frequency-modulated component separating unit 105, a selecting unit 107, and a distance calculating unit 108. The emitting unit 103 emits distance measuring light to an object to be measured. The distance measuring light is modulated by multiple modulation frequencies. The detecting unit 104 receives and detects light of the distance measuring light that is reflected from the object. The separating unit 105 separates components of the received reflected light into multiple frequency-modulated components. The selecting unit 107 selects a frequency-modulated component that has a received-light intensity exceeding a threshold value from among the separated multiple modulation frequencies.

Abstract: [Object] An object of the present invention is to provide a method for manufacturing an oxide single crystal substrate having less dispersion in characteristics within the substrate surface. [Means to solve the Problems] In the manufacture method of the present invention, a powder containing a Li compound is dispersed in a medium to form a slurry, and heat is applied while the slurry is in contact with the surface of the oxide single crystal substrate, so as to diffuse Li into the substrate from the surface thereof to effect a modification of the substrate; or after the slurry is brought into contact with the surface of the oxide single crystal substrate, the oxide single crystal substrate is buried in a powder containing the Li compound, and heat is applied to effect the diffusion of Li in the substrate from the surface thereof whereby a modification of the substrate occurs.

Abstract: There are provided a substrate processing apparatus and a substrate processing method realizing an effective reduction of a voltage change of a substrate on an electrode to reduce the variation of incident energy of ions entering the substrate. The substrate processing apparatus includes: a first electrode holding a substrate on a main surface of the first electrode; a second electrode facing the first electrode; a RF power source applying to the first electrode a RF voltage whose frequency is equal to or higher than 40 MHz; and a pulse voltage applying unit applying to the first electrode a pulse voltage decreasing in accordance with a lapse of time, by superimposing the pulse voltage on the RF voltage.