Abstract: The present invention relates to a positive electrode active material and a lithium secondary battery using a positive electrode containing the positive electrode active material. More particularly, the present invention relates to a positive electrode active material that is able to solve a problem of increased resistance according to an increase in Ni content by forming a charge transport channel in a lithium composite oxide and a lithium secondary battery using a positive electrode containing the positive electrode active material.

Abstract: An anti-reflective coating composition is provided. The anti-reflective coating composition of the present invention can be useful in preventing a pull-back phenomenon in which an anti-reflective coating layer tears on a corner of a pattern of a substrate during a heat curing process and improving gap-filling performance of the pattern since a crosslinker is attached to a polymer in the composition and the content of the low-molecular-weight crosslinker in the composition is minimized to regulate a heat curing initiation temperature.

Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a thermal acid generator that comprises: i) a pyridinium component having one or more ring substituents selected from optionally substituted alkyl and optionally substituted heteroalkyl; and ii) a sulfonic acid component.

Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a thermal acid generator that comprises: i) a pyridinium component having one or more ring substituents selected from optionally substituted alkyl and optionally substituted heteroalkyl; and ii) a sulfonic acid component.

Abstract: An anti-reflective coating composition is provided. The anti-reflective coating composition of the present invention can be useful in preventing a pull-back phenomenon in which an anti-reflective coating layer tears on a corner of a pattern of a substrate during a heat curing process and improving gap-filling performance of the pattern since a crosslinker is attached to a polymer in the composition and the content of the low-molecular-weight crosslinker in the composition is minimized to regulate a heat curing initiation temperature.

Abstract: A method of manufacturing a CMOS image sensor comprising forming a first insulating film on a silicon semiconductor substrate which includes a metal pad; selectively etching the first insulating film, so as to form a first insulating film pattern with a first opening which exposes the metal pad; forming a metal pad protective film in the first opening portion with a predetermined thickness; forming a second insulating film on the first insulating film pattern and metal pad protective film; selectively etching the second insulating film, so as to form a second insulating film pattern which includes a second opening which exposes the metal pad protective film; forming a color filter array (CFA) on the second insulating film pattern; forming micro lenses on the CFA; and performing an etching process in order to remove the metal pad protective film so as to form a metal pad opening.

Abstract: Provided is a manufacturing method of a CMOS image sensor. The method includes forming an interlayer insulating layer, a color filter layer, and a planarizing layer. A first photoresist is applied on the planarizing layer, and patterning of the first photoresist is performed using a first mask to form a microlens pattern corresponding to photodiodes on a semiconductor substrate. The microlens pattern is reflowed to form dome-shaped microlenses. A second photoresist is applied on the resulting substrate, and patterning of the second photoresist is preformed using a second mask to retain the second photoresist on top portions of the microlenses. Edge portions of the microlenses are selectively removed using the patterned second photoresist as a mask to make CD (critical dimension) spaces between the microlenses uniform.

Abstract: A method of manufacturing a CMOS image sensor comprising forming a first insulating film on a silicon semiconductor substrate which includes a metal pad; selectively etching the first insulating film, so as to form a first insulating film pattern with a first opening which exposes the metal pad; forming a metal pad protective film in the first opening portion with a predetermined thickness; forming a second insulating film on the first insulating film pattern and metal pad protective film; selectively etching the second insulating film, so as to form a second insulating film pattern which includes a second opening which exposes the metal pad protective film; forming a color filter array (CFA) on the second insulating film pattern; forming micro lenses on the CFA; and performing an etching process in order to remove the metal pad protective film so as to form a metal pad opening.

Abstract: An image sensor includes a semiconductor substrate having a pixel region and a peripheral region defined therein and having a pixel array formed in the pixel region; a PMD layer formed on the semiconductor substrate; at least one IMD layer formed over the PMD layer, wherein a region of the IMD layer formed on the pixel array is etched to a specific depth; a color filter array formed on the etched IMD layer; and a micro lens array formed on the color filter array, wherein the micro lens array is formed to have consecutive curves without any gap between neighboring lenses.