Patents by Inventor Jun Hisada

Jun Hisada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100029969
    Abstract: The present invention provides a copper compound having a decomposition temperature in a range of 100° C. to 300° C. and including one unit or a plurality of connected units represented by the following Formula (1): [R1COO]n[NH3]mCuX1p??(1) where n is 1 to 3; m is 1 to 3; p is 0 to 1; n pieces of R1 respectively represent the following Formula (2), CH2X2, CH2X2(CHX2)q, NH2, or H, and may be the same or different from each other, or n is 2 and two pieces of [R1COO] represent together the following Formula (3); R2, R3, and R4 are respectively CH2X2, CH2X2(CHX2)q, NH2, or H; R5 is —(CHX2)r—; X2 is H, OH, or NH2; r is 0 to 4; q is 1 to 4; and X1 is NH4+, H2O, or solvent molecules According to the above configuration, there are provided a copper compound capable of forming a copper thin film required for producing an electronic device or the like safely, inexpensively, and easily, and a method for producing a copper thin film using the copper compound.
    Type: Application
    Filed: October 13, 2009
    Publication date: February 4, 2010
    Applicant: MEC COMPANY LTD.
    Inventors: Minoru OTANI, Jun HISADA, Toyoki MAWATARI
  • Patent number: 7156904
    Abstract: An aqueous copper-to-resin bonding layer solution comprising: (a) at least one acid type; (b) tin salt or tin oxide; (c) salt or oxide of at least one type of metal selected from the group consisting of: silver, zinc, aluminum, titanium, bismuth, chromium, iron, cobalt, nickel, palladium, gold, and platinum; (d) a reaction accelerator; and (e) a diffusive retaining solvent, so that an alloy layer of tin and the at least one type of metal selected in (c) is formed on the surface of the copper. Subsequently, a portion of the alloy layer is removed, so that a bonding layer containing an alloy of diffused copper, tin, and the at least one type of metal selected in (c) is formed on a surface of copper which enhances the adhesion between copper and resin. The present invention provides the solution, a method of producing the bonding layer, and a product obtained thereby.
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: January 2, 2007
    Assignee: Mec Company Ltd.
    Inventors: Mutsuyuki Kawaguchi, Satoshi Saito, Jun Hisada, Naomi Kanda, Toshiko Nakagawa
  • Patent number: 7029761
    Abstract: A bonding layer for bonding resin is provided that is formed on a copper surface, and contains an alloy of: (a) copper; (b) tin; and (c) at least one type of metal (third metal) selected from the group consisting of: silver, zinc, aluminum, titanium, bismuth, chromium, iron, cobalt, nickel, palladium, gold, and platinum. The copper is contained in an amount of 1 to 50 atom %, the tin is contained in an amount of 20 to 98 atom %, and the third metal is contained in an amount of 1 to 50 atom %. The bonding layer has a thickness of not less than 0.001 ?m and not more than 1 ?m. Thus, adhesion between copper and resin can be enhanced.
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: April 18, 2006
    Assignee: MEC Company Ltd.
    Inventors: Mutsuyuki Kawaguchi, Satoshi Saito, Jun Hisada, Toshiko Nakagawa
  • Publication number: 20050003086
    Abstract: The present invention provides a copper compound having a decomposition temperature in a range of 100° C. to 300° C. and including one unit or a plurality of connected units represented by the following Formula (1): [R1COO]n[NH3]mCuX1p ??(1) where n is 1 to 3; m is 1 to 3; p is 0 to 1; n pieces of R1 respectively represent the following Formula (2), CH2X2, CH2X2(CHX2)q, NH2, or H, and may be the same or different from each other, or n is 2 and two pieces of [R1COO] represent together the following Formula (3); R2, R3, and R4 are respectively CH2X2, CH2X2(CHX2)q, NH2, or H; R5 is —(CHX2)r—; X2 is H, OH, or NH2; r is 0 to 4; q is 1 to 4; and X1 is NH4+, H2O, or solvent molecules According to the above configuration, there are provided a copper compound capable of forming a copper thin film required for producing an electronic device or the like safely, inexpensively, and easily, and a method for producing a copper thin film using the copper compound.
    Type: Application
    Filed: June 30, 2004
    Publication date: January 6, 2005
    Applicant: MEC COMPANY LTD.
    Inventors: Minoru Otani, Jun Hisada, Toyoki Mawatari
  • Publication number: 20040219375
    Abstract: A bonding layer for bonding resin is provided that is formed on a copper surface, and contains an alloy of: (a) copper; (b) tin; and (c) at least one type of metal (third metal) selected from the group consisting of: silver, zinc, aluminum, titanium, bismuth, chromium, iron, cobalt, nickel, palladium, gold, and platinum. The copper is contained in an amount of 1 to 50 atom %, the tin is contained in an amount of 20 to 98 atom %, and the third metal is contained in an amount of 1 to 50 atom %. The bonding layer has a thickness of not less than 0.001 &mgr;m and not more than 1 &mgr;m. Thus, adhesion between copper and resin can be enhanced.
    Type: Application
    Filed: April 16, 2004
    Publication date: November 4, 2004
    Applicant: MEC COMPANY LTD.
    Inventors: Mutsuyuki Kawaguchi, Satoshi Saito, Jun Hisada, Toshiko Nakagawa
  • Publication number: 20040219377
    Abstract: A surface of copper is brought into contact with an aqueous solution for forming a bonding layer for bonding resin comprising: (a) at least one type of acid selected from inorganic acid and organic acid; (b) tin salt or tin oxide; (c) salt or oxide of at least one type of metal selected from the group consisting of: silver, zinc, aluminum, titanium, bismuth, chromium, iron, cobalt, nickel, palladium, gold, and platinum; (d) a reaction accelerator; and (e) a diffusive retaining solvent, so that an alloy layer of tin and the at least one type of metal selected in (c) is formed on the surface of the copper.
    Type: Application
    Filed: April 16, 2004
    Publication date: November 4, 2004
    Applicant: MEC COMPANY LTD.
    Inventors: Mutsuyuki Kawaguchi, Satoshi Saito, Jun Hisada, Naomi Kanda, Toshiko Nakagawa
  • Patent number: 6733886
    Abstract: A laminate is made by adhering at least one metal layer selected from the group consisting of copper and a copper alloy to a resin layer. A coating film of an azole-copper complex compound formed by a contact with an aqueous solution containing an azole compound in an range from 0.1 mass % to 15 mass % and an organic acid in a range from 1 mass % to 80 mass % is formed on the metal layer surface, and the metal layer adheres to the resin layer via the coating film of the azole-copper complex compound. Thereby, the present invention provides a laminate with improved adhesion between a surface of copper or a copper alloy and resin in a multilayered printed circuit board, and also a method of manufacturing the laminate.
    Type: Grant
    Filed: April 23, 2002
    Date of Patent: May 11, 2004
    Assignee: MEC Company Ltd.
    Inventors: Mutsuyuki Kawaguchi, Jun Hisada, Toshiko Nakagawa
  • Publication number: 20020192460
    Abstract: A laminate is made by adhering at least one metal layer selected from the group consisting of copper and a copper alloy to a resin layer. A coating film of an azole-copper complex compound formed by a contact with an aqueous solution containing an azole compound in an range from 0.1 mass % to 15 mass % and an organic acid in a range from 1 mass % to 80 mass % is formed on the metal layer surface, and the metal layer adheres to the resin layer via the coating film of the azole-copper complex compound. Thereby, the present invention provides a laminate with improved adhesion between a surface of copper or a copper alloy and resin in a multilayered printed circuit board, and also a method of manufacturing the laminate.
    Type: Application
    Filed: April 23, 2002
    Publication date: December 19, 2002
    Applicant: MEC COMPANY LTD.
    Inventors: Mutsuyuki Kawaguchi, Jun Hisada, Toshiko Nakagawa