Abstract: Provided are an adhesive comprising substantially no surface modifier and leaving a less residue behind after a pellicle is separated; a pellicle; and a method of selecting an adhesive leaving a less residue behind. More specifically, provided are an adhesive for a pellicle having a ratio of a peel strength to a tensile strength of from 0.10 to 0.33; a pellicle comprising a pellicle frame, a pellicle film provided over an upper end face of the pellicle frame, and the adhesive adhered to a lower end face of the pellicle frame; and a method of selecting an adhesive, comprising the steps of: measuring a peel strength and a tensile strength of an adhesive, and selecting an adhesive having a ratio of the former to the latter of from 0.10 to 0.33 as the adhesive for a pellicle.

Abstract: A pellicle is proposed in which an adhesive layer is formed of an adhesive which undergoes a hardness change at a rate from ?50% through +50% of its initial hardness, measured after curing, when it is let to sit in atmosphere of a temperature of 300 degrees C. for 7 days on end; the rate of hardness change being defined by a following equation: Rate of hardness change (%)={(hardness after the sitting)?(initial hardness before the sitting)}÷initial hardness before the sitting)×100.

Abstract: A pellicle is proposed in which an adhesive layer which adheres a pellicle film to a pellicle frame is mixed (filled) with powder of thermally conductive material such as metallic compound so that the heat generated by the strong EUV ray is quickly passed to the pellicle frame from the pellicle film lest the latter is deformed by the heat.

Abstract: A pellicle is proposed in which the agglutinant layer which enables the pellicle to adhere to a photomask is doped with a de-foaming agent which depends on a reactive fluorine-modified silicone oil for its anti-foaming performance, and typically such reactive fluorine-modified silicone oil has a vinyl group at both ends of its molecular chain.

Abstract: Provided are an adhesive comprising substantially no surface modifier and leaving a less residue behind after a pellicle is separated; a pellicle; and a method of selecting an adhesive leaving a less residue behind. More specifically, provided are an adhesive for a pellicle having a ratio of a peel strength to a tensile strength of from 0.10 to 0.33; a pellicle comprising a pellicle frame, a pellicle film provided over an upper end face of the pellicle frame, and the adhesive adhered to a lower end face of the pellicle frame; and a method of selecting an adhesive, comprising the steps of: measuring a peel strength and a tensile strength of an adhesive, and selecting an adhesive having a ratio of the former to the latter of from 0.10 to 0.33 as the adhesive for a pellicle.

Abstract: The present invention is directed to a pellicle frame of a pellicle for use in photolithography, comprising: a coating of a layer containing a para-xylylene-based polymer. The invention can inhibit release of sulfate ions, ammonium ions and so on from the pellicle frame and thereby reduce the occurrence of haze under exposure environment.

Abstract: A pellicle is proposed in which the agglutinant layer which enable the pellicle to be adhered to a photomask is doped with a mechanoluminescent material so that the uniformness of the thickness of the agglutinant layer can be confirmed, when the pellicle is adhered to the photomask, by observing visually or by CCD camera for any irregularity in the pattern of the light emitted from the agglutinant layer.

Abstract: A pellicle is proposed in which an adhesive layer is formed of an adhesive which undergoes a hardness change at a rate from ?50% through +50% of its initial hardness ,measured after curing, when it is let to sit in atmosphere of a temperature of 300 degrees C. for 7 days on end; the rate of hardness change being defined by a following equation: Rate of hardness change (%)={(hardness after the sitting)?(initial hardness before the sitting)}÷initial hardness before the sitting)×100.

Abstract: A pellicle is proposed in which an adhesive layer which adheres a pellicle film to a pellicle frame is mixed (filled) with powder of thermally conductive material such as metallic compound so that the heat generated by the strong EUV ray is quickly passed to the pellicle frame from the pellicle film lest the latter is deformed by the heat.

Abstract: There is provided a pellicle having a frame, a membrane and an agglutinant layer (adhesive to bond the pellicle on a photo mask) in which the release liner (detachable sheet) laid to the agglutinant layer for protection thereof is controlled to have a surface roughness of 5-30 micrometers on the side of the liner which is attached to the agglutinant layer, with a result that the releasability of the liner is improved suitably.

Abstract: There is provided a pellicle 1 for lithography having a frame 12, a film 11 and an agglutinant layer 13 (an adhesive to bond the pellicle on a photomask), in which the agglutinant layer 13 is doped with a luminescence material so as to facilitate the inspection of the quality of the adhesion between the agglutinant layer 13 and the photomask; preferably the luminescence material is a kind that glows in response to UV irradiation, and a preferable dosage of the luminescence material is no less than 0.01 mass % but less than 1.0 mass %.

Abstract: An EUV pellicle is proposed in which the pellicle frame is made of a material having a linear expansion coefficient of 10×10?6 (1/K) or smaller, and as such this pellicle is recommendable for use in EUV exposure technology wherein temperature is raised and lowered repeatedly and hence the expansion and contraction of the pellicle frame would harm the pellicle membrane and the pellicle flatness.

Abstract: A pellicle is proposed in which the agglutinant layer which enables the pellicle to adhere to a photomask is doped with a de-foaming agent which depends on a reactive fluorine-modified silicone oil for its anti-foaming performance, and typically such reactive fluorine-modified silicone oil has a vinyl group at both ends of its molecular chain.

Abstract: A pellicle is proposed in which the agglutinant layer which enable the pellicle to be adhered to a photomask is doped with a mechanoluminescent material so that the uniformness of the thickness of the agglutinant layer can be confirmed, when the pellicle is adhered to the photomask, by observing visually or by CCD camera for any irregularity in the pattern of the light emitted from the agglutinant layer.

Abstract: There is provided a pellicle having a frame 12, a film 11 and an adhesive 13 for bonding the film 11 to the frame 12, and this adhesive 13 is a silicone compound having a low outgassing tendency and high heat resistance; in a better mode case, it can maintain its adhesive strength at temperatures 100-200 degrees C. and it exhibits results of TML being 1.0% or lower and CVCM being 0.1% or lower when tested in accordance with ASTM E595-93; thus this pellicle is useful for EUV light exposure lithography.

Abstract: The present invention is directed to a pellicle frame of a pellicle for use in photolithography, comprising: a coating of a layer containing a para-xylylene-based polymer. The invention can inhibit release of sulfate ions, ammonium ions and so on from the pellicle frame and thereby reduce the occurrence of haze under exposure environment.

Abstract: There is provided a pellicle having a frame 12, a film 11 and an adhesive 13 for bonding the film 11 to the frame 12, and this adhesive 13 is a silicone compound having a low outgassing tendency and high heat resistance; in a better mode case, it can maintain its adhesive strength at temperatures 100-200 degrees C. and it exhibits results of TML being 1.0% or lower and CVCM being 0.1% or lower when tested in accordance with ASTM E595-93; thus this pellicle is useful for EUV light exposure lithography.

Abstract: There is provided a pellicle 1 for lithography having a frame 12, a film 11 and an agglutinant layer 13 (an adhesive to bond the pellicle on a photomask), in which the agglutinant layer 13 is doped with a luminescence material so as to facilitate the inspection of the quality of the adhesion between the agglutinant layer 13 and the photomask; preferably the luminescence material is a kind that glows in response to UV irradiation, and a preferable dosage of the luminescence material is no less than 0.01 mass % but less than 1.0 mass %.

Abstract: There is provided a pellicle having a frame, a membrane and an agglutinant layer (adhesive to bond the pellicle on a photo mask) in which the release liner (detachable sheet) laid to the agglutinant layer for protection thereof is controlled to have a surface roughness of 5-30 micrometers on the side of the liner which is attached to the agglutinant layer, with a result that the releasability of the liner is improved suitably.

Abstract: There is provided a pellicle having a pellicle frame on which an adhesive layer for attaching the pellicle onto a photo mask is made from a room temperature curable two-part adhesive, so that a formation of the adhesive layer is carried out without heating. The room temperature curable two-part adhesive dispensed on the pellicle frame is not heated for curing.