Patents by Inventor Jun Irisawa
Jun Irisawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11059977Abstract: Provided is a near-infrared-absorbing dye increasing a visible light transmittance and having a near-infrared blocking characteristic. The near-infrared-absorbing dye has an absorption characteristic measured by dissolving the dye in dichloromethane satisfying the following requirements. ?In an absorption spectrum at a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in a wavelength region of 670 nm or more. ?The following relational expression is established between a maximum absorption constant ?A with respect to light with a wavelength of 430 to 550 nm and a maximum absorption constant ?B with respect to light with a wavelength of 670 nm or more, where ?B/?A?65. ?In a spectral transmittance curve, an average transmittance of light with a wavelength of 430 to 460 nm is 94.0% or more when a transmittance at the maximum absorption wavelength ?max is set to 1%.Type: GrantFiled: August 2, 2018Date of Patent: July 13, 2021Assignee: AGC Inc.Inventors: Noriaki Miyake, Satoshi Okada, Jun Irisawa, Teppei Konishi, Keigo Matsuura
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Publication number: 20180346729Abstract: Provided is a near-infrared-absorbing dye increasing a visible light transmittance and having a near-infrared blocking characteristic. The near-infrared-absorbing dye has an absorption characteristic measured by dissolving the dye in dichloromethane satisfying the following requirements. ?In an absorption spectrum at a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in a wavelength region of 670 nm or more. ?The following relational expression is established between a maximum absorption constant ?A with respect to light with a wavelength of 430 to 550 nm and a maximum absorption constant ?B with respect to light with a wavelength of 670 nm or more, where ?B/?A?65. ?In a spectral transmittance curve, an average transmittance of light with a wavelength of 430 to 460 nm is 94.0% or more when a transmittance at the maximum absorption wavelength ?max is set to 1%.Type: ApplicationFiled: August 2, 2018Publication date: December 6, 2018Applicant: AGC Inc.Inventors: Noriaki MIYAKE, Satoshi Okada, Jun Irisawa, Teppei Konishi, Keigo Matsuura
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Publication number: 20040048005Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A):Type: ApplicationFiled: September 3, 2003Publication date: March 11, 2004Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Ikuo Matsukura, Naoko Shirota, Jun Irisawa
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Patent number: 6660346Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A): fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.Type: GrantFiled: January 27, 2003Date of Patent: December 9, 2003Assignee: Asahi Glass Company, LimitedInventors: Ikuo Matsukura, Naoko Shirota, Jun Irisawa
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Publication number: 20030134057Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A):Type: ApplicationFiled: January 27, 2003Publication date: July 17, 2003Applicant: Asahi Glass Company, LimitedInventors: Ikuo Matsukura, Naoko Shirota, Jun Irisawa
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Patent number: 6548129Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A): fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.Type: GrantFiled: March 13, 2001Date of Patent: April 15, 2003Assignee: Asahi Glass Company, LimitedInventors: Ikuo Matsukura, Naoko Shirota, Jun Irisawa
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Publication number: 20010024701Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A):Type: ApplicationFiled: March 13, 2001Publication date: September 27, 2001Applicant: Asahi Glass Company, LimitedInventors: Ikou Matsukura, Naoko Shirota, Jun Irisawa
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Patent number: 6166125Abstract: A graded-refractive-index optical plastic material comprising an amorphous fluorine-containing polymer (A) having substantially no C--H bond, and at least one fluorine-containing polycyclic compound (B) having a refractive index higher by at least 0.Type: GrantFiled: October 1, 1998Date of Patent: December 26, 2000Assignee: Asahi Glass Company Ltd.Inventors: Norihide Sugiyama, Hidenobu Murofushi, Takashi Okazoe, Masayuki Tamura, Shin Tatematsu, Jun Irisawa
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Patent number: 5419851Abstract: The present invention provides a difluoro-derivative compound of the formula R.sup.1 --(A.sup.1 --Y.sup.1).sub.m --A.sup.2 --CF.dbd.CF--C.tbd.C--A.sup.3 --(Y.sup.2 --A.sup.4).sub.n --R.sup.2 (wherein each of A.sup.1 to A.sup.4 is a trans-1,4-cyclohexylene group, a 1,4-cyclohexenylene group or a 1,4-phenylene group, each of m and n is 0 or 1, and each of R.sup.1 and R.sup.2 is a C.sub.1-10 alkyl group, a halogen atom or a cyano group).The compound of the present invention has a low viscosity and is stable against lights, and a high speed response is expected by using it for a liquid crystal composition.Type: GrantFiled: April 20, 1994Date of Patent: May 30, 1995Assignee: Asahi Glass Company Ltd.Inventors: Osamu Yokokoji, Jun Irisawa, Hidemasa Koh