Patents by Inventor Jun Irisawa

Jun Irisawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11059977
    Abstract: Provided is a near-infrared-absorbing dye increasing a visible light transmittance and having a near-infrared blocking characteristic. The near-infrared-absorbing dye has an absorption characteristic measured by dissolving the dye in dichloromethane satisfying the following requirements. ?In an absorption spectrum at a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in a wavelength region of 670 nm or more. ?The following relational expression is established between a maximum absorption constant ?A with respect to light with a wavelength of 430 to 550 nm and a maximum absorption constant ?B with respect to light with a wavelength of 670 nm or more, where ?B/?A?65. ?In a spectral transmittance curve, an average transmittance of light with a wavelength of 430 to 460 nm is 94.0% or more when a transmittance at the maximum absorption wavelength ?max is set to 1%.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: July 13, 2021
    Assignee: AGC Inc.
    Inventors: Noriaki Miyake, Satoshi Okada, Jun Irisawa, Teppei Konishi, Keigo Matsuura
  • Publication number: 20180346729
    Abstract: Provided is a near-infrared-absorbing dye increasing a visible light transmittance and having a near-infrared blocking characteristic. The near-infrared-absorbing dye has an absorption characteristic measured by dissolving the dye in dichloromethane satisfying the following requirements. ?In an absorption spectrum at a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in a wavelength region of 670 nm or more. ?The following relational expression is established between a maximum absorption constant ?A with respect to light with a wavelength of 430 to 550 nm and a maximum absorption constant ?B with respect to light with a wavelength of 670 nm or more, where ?B/?A?65. ?In a spectral transmittance curve, an average transmittance of light with a wavelength of 430 to 460 nm is 94.0% or more when a transmittance at the maximum absorption wavelength ?max is set to 1%.
    Type: Application
    Filed: August 2, 2018
    Publication date: December 6, 2018
    Applicant: AGC Inc.
    Inventors: Noriaki MIYAKE, Satoshi Okada, Jun Irisawa, Teppei Konishi, Keigo Matsuura
  • Publication number: 20040048005
    Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A):
    Type: Application
    Filed: September 3, 2003
    Publication date: March 11, 2004
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Ikuo Matsukura, Naoko Shirota, Jun Irisawa
  • Patent number: 6660346
    Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A): fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.
    Type: Grant
    Filed: January 27, 2003
    Date of Patent: December 9, 2003
    Assignee: Asahi Glass Company, Limited
    Inventors: Ikuo Matsukura, Naoko Shirota, Jun Irisawa
  • Publication number: 20030134057
    Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A):
    Type: Application
    Filed: January 27, 2003
    Publication date: July 17, 2003
    Applicant: Asahi Glass Company, Limited
    Inventors: Ikuo Matsukura, Naoko Shirota, Jun Irisawa
  • Patent number: 6548129
    Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A): fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.
    Type: Grant
    Filed: March 13, 2001
    Date of Patent: April 15, 2003
    Assignee: Asahi Glass Company, Limited
    Inventors: Ikuo Matsukura, Naoko Shirota, Jun Irisawa
  • Publication number: 20010024701
    Abstract: A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A):
    Type: Application
    Filed: March 13, 2001
    Publication date: September 27, 2001
    Applicant: Asahi Glass Company, Limited
    Inventors: Ikou Matsukura, Naoko Shirota, Jun Irisawa
  • Patent number: 6166125
    Abstract: A graded-refractive-index optical plastic material comprising an amorphous fluorine-containing polymer (A) having substantially no C--H bond, and at least one fluorine-containing polycyclic compound (B) having a refractive index higher by at least 0.
    Type: Grant
    Filed: October 1, 1998
    Date of Patent: December 26, 2000
    Assignee: Asahi Glass Company Ltd.
    Inventors: Norihide Sugiyama, Hidenobu Murofushi, Takashi Okazoe, Masayuki Tamura, Shin Tatematsu, Jun Irisawa
  • Patent number: 5419851
    Abstract: The present invention provides a difluoro-derivative compound of the formula R.sup.1 --(A.sup.1 --Y.sup.1).sub.m --A.sup.2 --CF.dbd.CF--C.tbd.C--A.sup.3 --(Y.sup.2 --A.sup.4).sub.n --R.sup.2 (wherein each of A.sup.1 to A.sup.4 is a trans-1,4-cyclohexylene group, a 1,4-cyclohexenylene group or a 1,4-phenylene group, each of m and n is 0 or 1, and each of R.sup.1 and R.sup.2 is a C.sub.1-10 alkyl group, a halogen atom or a cyano group).The compound of the present invention has a low viscosity and is stable against lights, and a high speed response is expected by using it for a liquid crystal composition.
    Type: Grant
    Filed: April 20, 1994
    Date of Patent: May 30, 1995
    Assignee: Asahi Glass Company Ltd.
    Inventors: Osamu Yokokoji, Jun Irisawa, Hidemasa Koh