Patents by Inventor Jun-Jie CHANG

Jun-Jie CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240138018
    Abstract: A user equipment assistance information (UAI) negotiation method, for a user equipment (UE) of mobile communication includes receiving a first OtherConfig element of an RRC reconfiguration message comprising a plurality of configuration parameters with SETUP values from a network terminal; sending a first UAI including a first value of a first configuration parameter of the configuration parameters to the network terminal; and receiving a first RRC reconfiguration message corresponding to the first UAI from the network terminal.
    Type: Application
    Filed: October 2, 2023
    Publication date: April 25, 2024
    Applicant: MediaTek Singapore Pte. Ltd.
    Inventors: Hung-Yueh Chen, Yu-Lun Chang, Byeng Hyun Kim, JUNG SHUP SHIN, Hung-Yuan Yang, Jun-Jie Su, Kyung Hyun Ahn
  • Patent number: 11498994
    Abstract: Provided is a block copolymer composition which contains a block copolymer having a specific molecular structure and has a molecular weight distribution within an appropriate range. A polymerizable composition containing a macromonomer (A) which has a group having a radical-reactive unsaturated double bond at one terminal of a poly(meth)acrylate segment, a vinyl monomer (B), and an organic iodine compound (C), or a polymerizable composition containing a macromonomer (A), a vinyl monomer (B), an azo-based radical polymerization initiator (E), and iodine is polymerized to obtain a block copolymer composition containing a block copolymer in which constitutional units of all blocks are derived from vinyl monomers and at least one block has a branched structure.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: November 15, 2022
    Assignees: Mitsubishi Chemical Corporation, Nanyang Technological University
    Inventors: Hiroshi Niino, Shunsuke Chatani, Shuyao Hsu, Atsushi Goto, Longqiang Xiao, Jun Jie Chang
  • Publication number: 20200377638
    Abstract: Provided is a block copolymer composition which contains a block copolymer having a specific molecular structure and has a molecular weight distribution within an appropriate range. A polymerizable composition containing a macromonomer (A) which has a group having a radical-reactive unsaturated double bond at one terminal of a poly(meth)acrylate segment, a vinyl monomer (B), and an organic iodine compound (C), or a polymerizable composition containing a macromonomer (A), a vinyl monomer (B), an azo-based radical polymerization initiator (E), and iodine is polymerized to obtain a block copolymer composition containing a block copolymer in which constitutional units of all blocks are derived from vinyl monomers and at least one block has a branched structure.
    Type: Application
    Filed: November 22, 2018
    Publication date: December 3, 2020
    Applicants: Mitsubishi Chemical Corporation, Nanyang Technological University
    Inventors: Hiroshi NIINO, Shunsuke CHATANI, Shuyao HSU, Atsushi GOTO, Longqiang XIAO, Jun Jie CHANG
  • Patent number: 10772195
    Abstract: A two-dimensional data matrix structure includes a first substrate, a first metal layer disposed on the first substrate, a second substrate disposed on the first metal layer, and a second metal layer disposed on the second substrate. The first metal layer has a plurality of sections and a plurality of empty regions formed according to a two-dimensional data matrix pattern. The first substrate, the second substrate, and the second metal layer commonly have a plurality of through holes, and positions of the through holes correspond to positions of the empty regions. The second substrate and the second metal layer commonly have a plurality of blind holes, and positions of the blind holes correspond to positions of the sections. The sections are exposed through the blind holes, and the configuration of the through holes and the blind holes is the two-dimensional data matrix pattern when viewed from above.
    Type: Grant
    Filed: May 16, 2018
    Date of Patent: September 8, 2020
    Assignee: UNIMICRON TECHNOLOGY CORP.
    Inventors: Jun-Jie Chang, Shian-Tang Chang, Dung-Ying Sung
  • Publication number: 20190327826
    Abstract: A two-dimensional data matrix structure includes a first substrate, a first metal layer disposed on the first substrate, a second substrate disposed on the first metal layer, and a second metal layer disposed on the second substrate. The first metal layer has a plurality of sections and a plurality of empty regions formed according to a two-dimensional data matrix pattern. The first substrate, the second substrate, and the second metal layer commonly have a plurality of through holes, and positions of the through holes correspond to positions of the empty regions. The second substrate and the second metal layer commonly have a plurality of blind holes, and positions of the blind holes correspond to positions of the sections. The sections are exposed through the blind holes, and the configuration of the through holes and the blind holes is the two-dimensional data matrix pattern when viewed from above.
    Type: Application
    Filed: May 16, 2018
    Publication date: October 24, 2019
    Inventors: Jun-Jie CHANG, Shian-Tang CHANG, Dung-Ying SUNG