Abstract: A method of obtaining a prediction model for predicting fluctuation of imaging characteristics of a projection optical system which is used in an exposure apparatus that exposes a substrate via an original, the method including setting a first value, which is a value of a first coefficient in a first prediction model that is set based on a result of measuring fluctuation of imaging characteristics of a first projection optical system in a first exposure apparatus including the first projection optical system, as a value of the first coefficient in a second prediction model for predicting fluctuation of imaging characteristics of a second projection optical system in a second exposure apparatus including the second projection optical system, while temporarily setting a value of a second coefficient in the second prediction model to a default value.

Abstract: An exposure method includes predicting a change in an optical characteristic of a projection optical system in exposing in which exposure processing is performed on a plurality of substrates via the projection optical system, adjusting the optical characteristic based on a prediction result of the predicting before the exposing, and performing the exposing after the adjusting, wherein, in the adjusting, the optical characteristic at a start of the exposing is adjusted in a direction different from a direction in which the optical characteristic changes, based on a change in the optical characteristic predicted in the predicting.

Abstract: An exposure method includes performing exposure processing via a projection optical system between a start and an end of the exposure processing on a plurality of substrates included in a lot as exposure, predicting a change in an optical characteristic of the projection optical system during the exposure based on an exposure processing condition of the exposure, determining whether the optical characteristic exceeds a predetermined range during the exposure based on a predicted result, and in a case where the optical characteristic is determined to exceed the predetermined range during the exposure, adjusting the optical characteristic before the optical characteristic exceeds the predetermined range, wherein at least one or more of the plurality of substrates is/are exposed after the adjusting.

Abstract: An exposure apparatus that performs an exposure operation of exposing a substrate via a projection optical system is provided. The apparatus includes a temperature regulator configured to regulate a temperature distribution on an optical element of the projection optical system, and a controller configured to perform, in an exposure operation period in which the exposure operation is executed, a first process of controlling the temperature regulator so as to reduce a change of aberration of the projection optical system caused by execution of the exposure operation. In accordance with detection of a predetermined event before the exposure operation period, the controller performs, before performing the first process, a second process for reducing the aberration of the projection optical system using a method different from the first process.

Abstract: An apparatus includes a control unit configured to control an adjustment unit for adjusting imaging characteristics of an optical system. In a period spanning a plurality of lots, the control unit measures imaging characteristics of the optical system, and decides a prediction coefficient in a prediction formula to fit the prediction formula to measurement data obtained by the measurement in the period spanning the plurality of lots. The prediction formula is a polynomial function including a term representing a change in measurement value of the imaging characteristics caused by changing at least one of an illumination mode and an original between lots. The control unit decides the term of the polynomial function such that a fitting residual falls within an allowable range.

Abstract: An exposure method includes predicting a change in an optical characteristic of a projection optical system in exposing in which exposure processing is performed on a plurality of substrates via the projection optical system, adjusting the optical characteristic based on a prediction result of the predicting before the exposing, and performing the exposing after the adjusting, wherein, in the adjusting, the optical characteristic at a start of the exposing is adjusted in a direction different from a direction in which the optical characteristic changes, based on a change in the optical characteristic predicted in the predicting.

Abstract: An exposure method includes performing exposure processing via a projection optical system between a start and an end of the exposure processing on a plurality of substrates included in a lot as exposure, predicting a change in an optical characteristic of the projection optical system during the exposure based on an exposure processing condition of the exposure, determining whether the optical characteristic exceeds a predetermined range during the exposure based on a predicted result, and in a case where the optical characteristic is determined to exceed the predetermined range during the exposure, adjusting the optical characteristic before the optical characteristic exceeds the predetermined range, wherein at least one or more of the plurality of substrates is/are exposed after the adjusting.

Abstract: An apparatus includes a control unit configured to control an adjustment unit for adjusting imaging characteristics of an optical system. In a period spanning a plurality of lots, the control unit measures imaging characteristics of the optical system, and decides a prediction coefficient in a prediction formula to fit the prediction formula to measurement data obtained by the measurement in the period spanning the plurality of lots. The prediction formula is a polynomial function including a term representing a change in measurement value of the imaging characteristics caused by changing at least one of an illumination mode and an original between lots. The control unit decides the term of the polynomial function such that a fitting residual falls within an allowable range.

Abstract: An exposure apparatus that performs an exposure operation of exposing a substrate via a projection optical system is provided. The apparatus includes a temperature regulator configured to regulate a temperature distribution on an optical element of the projection optical system, and a controller configured to perform, in an exposure operation period in which the exposure operation is executed, a first process of controlling the temperature regulator so as to reduce a change of aberration of the projection optical system caused by execution of the exposure operation. In accordance with detection of a predetermined event before the exposure operation period, the controller performs, before performing the first process, a second process for reducing the aberration of the projection optical system using a method different from the first process.

Abstract: An exposure apparatus includes a first temperature controller for controlling a temperature distribution on an optical element of a projection optical system, and a second temperature controller for controlling a temperature distribution on an optical element of the projection optical system, wherein in a first period in which the exposure operation is executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration of the projection optical system due to the exposure operation being executed, and in a second period which follows the first period and in which the exposure operation is not executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration due to the exposure operation not being executed.

Abstract: An exposure apparatus includes a first temperature controller for controlling a temperature distribution on an optical element of a projection optical system, and a second temperature controller for controlling a temperature distribution on an optical element of the projection optical system, wherein in a first period in which the exposure operation is executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration of the projection optical system due to the exposure operation being executed, and in a second period which follows the first period and in which the exposure operation is not executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration due to the exposure operation not being executed.

Abstract: A method for replacing a lens having refractive power in a first projection optical system includes measuring a wavefront of measuring light passing through the first projection optical system in a state in which the lens having refractive power or a master lens is mounted in the first projection optical system, measuring a wavefront of measuring light passing through a second projection optical system in a state in which the master lens or an alternative lens is mounted in the second projection optical system, processing the alternative lens in accordance with measurement results, and replacing the lens having refractive power in the first projection optical system with the processed alternative lens.

Abstract: A method for replacing a lens having refractive power in a first projection optical system includes measuring a wavefront of measuring light passing through the first projection optical system in a state in which the lens having refractive power or a master lens is mounted in the first projection optical system, measuring a wavefront of measuring light passing through a second projection optical system in a state in which the master lens or an alternative lens is mounted in the second projection optical system, processing the alternative lens in accordance with measurement results, and replacing the lens having refractive power in the first projection optical system with the processed alternative lens.