Patents by Inventor Jun Sik Lee

Jun Sik Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10916778
    Abstract: Disclosed is a secondary battery which can improve safety by forming a carbon coating layer and an electrode active material layer on an electrode plate such that ends of the carbon coating layer and the electrode active material layer are in different positions.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: February 9, 2021
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Young San Ko, Min Jae Kim, Ki Jun Kim, Chae Woong Cho, Jun Sik Lee
  • Publication number: 20200295332
    Abstract: A composite material for fire protection comprises: a) an inorganic fibre core comprising inorganic fibres interlocked or entangled to form a coherent body resistant against separation laminated between b) at least two layers of phyllosilicate insulation the material further comprising a barrier integral to the material to hinder ingress of humidity to edges of the inorganic fibre core.
    Type: Application
    Filed: November 20, 2018
    Publication date: September 17, 2020
    Inventors: Seob Kyo Jeong, Jeong Mo Shin, Jun Sik Lee, Dean Murray
  • Patent number: 10474000
    Abstract: Disclosed are a liquid lens and a liquid lens module, which enhance the fill factor of a liquid lens having an inclined partition, thereby achieving a low drive voltage and a high fill factor. The liquid lens includes an oil layer and a conductive liquid inside a chamber having an inclined partition. The oil layer is formed of an oil mixture obtained by mixing at least two types of oils having different indices of refraction, and the oil mixture has the index of refraction corresponding to the index of refraction of the material in which the chamber is formed.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: November 12, 2019
    Assignees: LG Display Co., Ltd., Korea Advanced Institute of Science and Technology
    Inventors: Sung-Pil Ryu, Wook-Sung Kim, Han-Saem Kang, Ki-Seok Chang, Yong-Hyub Won, Jun-Sik Lee, Doo-Seub Shin
  • Publication number: 20190237767
    Abstract: Disclosed is a secondary battery which can improve safety by forming a carbon coating layer and an electrode active material layer on an electrode plate such that ends of the carbon coating layer and the electrode active material layer are in different positions.
    Type: Application
    Filed: July 17, 2017
    Publication date: August 1, 2019
    Inventors: Young San KO, Min Jae KIM, Ki Jun KIM, Chae Woong CHO, Jun Sik LEE
  • Publication number: 20180088345
    Abstract: Disclosed are a liquid lens array based on an electrowetting method, a method of manufacturing the same, and a display device using the same. The display device includes a display panel configured to display an image. A liquid lens array of the display device is disposed at a side of the display panel, on which an image is displayed, and is capable of controlling an optical axis of a lens, which is formed by a shape between a first liquid and a second liquid, which is not mixed with the first liquid, filled therein be inclined to left and right sides by using an electrowetting phenomenon. A controller controls the optical axis of the lens formed by the shape between the first liquid and the second liquid to be inclined to left and right sides by applying a voltage to the liquid lens array.
    Type: Application
    Filed: December 15, 2016
    Publication date: March 29, 2018
    Inventors: Yong Hyub WON, Junoh KIM, Cheol Joong KIM, Doo-Seub SHIN, Jun Sik LEE
  • Publication number: 20170363930
    Abstract: Disclosed are a liquid lens and a liquid lens module, which enhance the fill factor of a liquid lens having an inclined partition, thereby achieving a low drive voltage and a high fill factor. The liquid lens includes an oil layer and a conductive liquid inside a chamber having an inclined partition. The oil layer is formed of an oil mixture obtained by mixing at least two types of oils having different indices of refraction, and the oil mixture has the index of refraction corresponding to the index of refraction of the material in which the chamber is formed.
    Type: Application
    Filed: June 21, 2017
    Publication date: December 21, 2017
    Inventors: Sung-Pil RYU, Wook-Sung KIM, Han-Saem KANG, Ki-Seok CHANG, Yong-Hyub WON, Jun-Sik LEE, Doo-Seub SHIN
  • Patent number: 8879738
    Abstract: A system and method of updating a key based on communication and security damage costs are provided. The key updating system for group communication between a plurality of group members, includes a key update cycle determining unit to determine a key update cycle based on a communication cost and a security damage cost, and a key updating unit to perform a key updating with respect to one or more group members of the group communication based on the determined key update cycle.
    Type: Grant
    Filed: May 18, 2009
    Date of Patent: November 4, 2014
    Assignees: Samsung Electronics Co., Ltd., SNU R&DB Foundation
    Inventors: Yongsuk Park, Seung-Woo Seo, Dong Hyun Je, Sung Woo Kim, Jun Sik Lee
  • Patent number: 8518610
    Abstract: Provided is a method for fabricating a photomask. The method includes the following processes. Light blocking patterns are formed on a mask substrate, and surface properties of the mask substrate on which the light blocking patterns are formed are changed into hydrophobicity. When the surface properties of the mask substrate are changed into the hydrophobicity, the mask substrate is treated using plasma gas. The plasma gas may be a gas mixture of trifluoromethane (CHF3), tetrafluoromethane (CF4), and hydrogen (H2).
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: August 27, 2013
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jun Sik Lee
  • Publication number: 20090323964
    Abstract: A system and method of updating a key based on communication and security damage costs are provided. The key updating system for group communication between a plurality of group members, includes a key update cycle determining unit to determine a key update cycle based on a communication cost and a security damage cost, and a key updating unit to perform a key updating with respect to one or more group members of the group communication based on the determined key update cycle.
    Type: Application
    Filed: May 18, 2009
    Publication date: December 31, 2009
    Inventors: Yongsuk PARK, Seung-woo Seo, Dong Hyun Je, Sung Woo Kim, Jun Sik Lee
  • Publication number: 20090004574
    Abstract: Provided is a method for fabricating a photomask. The method includes following processes. Light blocking patterns are formed on a mask substrate, and surface properties of the mask substrate on which the light blocking patterns are formed are changed into hydrophobicity. When the surface properties of the mask substrate are changed into the hydrophobicity, the mask substrate is treated using plasma gas. The plasma gas may be a gas mixture of trifluoromethane (CHF3), tetrafluoromethane (CF4), and hydrogen (H2).
    Type: Application
    Filed: December 12, 2007
    Publication date: January 1, 2009
    Applicant: Hyinx Semiconductor Inc.
    Inventor: Jun Sik LEE
  • Patent number: 6927438
    Abstract: A nonvolatile ferroelectric memory device and a method for fabricating the same are provided that increase a process margin and simplify process steps. In addition, a number of masks is reduced to save the cost and at the same time minimize or reduce a layout area. The nonvolatile ferroelectric memory device can include first and second split wordlines formed along a first direction on a substrate at prescribed intervals, a first electrode of a first ferroelectric capacitor on the second split wordline and a first electrode of a second ferroelectric capacitor on the first split wordline, first and second ferroelectric layers respectively on surfaces of the first electrodes of the first and second ferroelectric capacitors, and second electrodes of the first and second ferroelectric capacitors, respectively, on surfaces of the first and second ferroelectric layers.
    Type: Grant
    Filed: July 12, 2004
    Date of Patent: August 9, 2005
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Hee Bok Kang, Jun Sik Lee
  • Patent number: 6841394
    Abstract: A nonvolatile ferroelectric memory device and a method for fabricating the same are provided that increase a process margin and simplify process steps. In addition, a number of masks is reduced to save the cost and at the same time minimize or reduce a layout area. The nonvolatile ferroelectric memory device can include first and second split wordlines formed along a first direction on a substrate at prescribed intervals, a first electrode of a first ferroelectric capacitor on the second split wordline and a first electrode of a second ferroelectric capacitor on the first split wordline, first and second ferroelectric layers respectively on surfaces of the first electrodes of the first and second ferroelectric capacitors, and second electrodes of the first and second ferroelectric capacitors, respectively, on surfaces of the first and second ferroelectric layers.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: January 11, 2005
    Assignee: Hyundai Electronics Industries, Co., Ltd.
    Inventors: Hee Bok Kang, Jun Sik Lee
  • Publication number: 20040241943
    Abstract: A nonvolatile ferroelectric memory device and a method for fabricating the same are provided that increase a process margin and simplify process steps. In addition, a number of masks is reduced to save the cost and at the same time minimize or reduce a layout area. The nonvolatile ferroelectric memory device can include first and second split wordlines formed along a first direction on a substrate at prescribed intervals, a first electrode of a first ferroelectric capacitor on the second split wordline and a first electrode of a second ferroelectric capacitor on the first split wordline, first and second ferroelectric layers respectively on surfaces of the first electrodes of the first and second ferroelectric capacitors, and second electrodes of the first and second ferroelectric capacitors, respectively, on surfaces of the first and second ferroelectric layers.
    Type: Application
    Filed: July 12, 2004
    Publication date: December 2, 2004
    Applicant: Hyundai Electronics Industries Co., Ltd.
    Inventors: Hee Bok Kang, Jun Sik Lee
  • Patent number: 6713363
    Abstract: A method for fabricating a capacitor of a semiconductor device is disclosed, in which loss of and damage to a lower electrode is minimized to improve process yield.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: March 30, 2004
    Inventor: Jun Sik Lee
  • Patent number: 6319731
    Abstract: A nonvolatile ferroelectric memory device and a method for manufacturing the same increase capacitance by ensuring an area of a capacitor to the maximum degree and simplify process steps by facilitating layout design.
    Type: Grant
    Filed: June 19, 2000
    Date of Patent: November 20, 2001
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Hee Bok Kang, Jun Sik Lee
  • Publication number: 20010006473
    Abstract: A nonvolatile ferroelectric memory device and a method for fabricating the same are provided that increase a process margin and simplify process steps. In addition, a number of masks is reduced to save the cost and at the same time minimize or reduce a layout area. The nonvolatile ferroelectric memory device can include first and second split wordlines formed along a first direction on a substrate at prescribed intervals, a first electrode of a first ferroelectric capacitor on the second split wordline and a first electrode of a second ferroelectric capacitor on the first split wordline, first and second ferroelectric layers respectively on surfaces of the first electrodes of the first and second ferroelectric capacitors, and second electrodes of the first and second ferroelectric capacitors, respectively, on surfaces of the first and second ferroelectric layers.
    Type: Application
    Filed: December 20, 2000
    Publication date: July 5, 2001
    Applicant: Hyundai Electronics Industries Co., Ltd.
    Inventors: Hee Bok Kang, Jun Sik Lee
  • Patent number: 6077450
    Abstract: A method for etching platinum in which used are an etch gas and a mask having a good etch ratio with platinum when a lower electrode is made of platinum is disclosed, including the steps of depositing a platinum layer on an insulator; depositing on the platinum layer a mask layer having a high selectivity with the platinum layer; patterning the mask layer to be spaced apart by a predetermined distance; and implanting an etch gas making an etch ratio of the platinum layer and the mask layer more than 2 to etch the platinum layer by using the mask layer.
    Type: Grant
    Filed: April 15, 1998
    Date of Patent: June 20, 2000
    Assignee: LG Semicon Co., Ltd.
    Inventor: Jun Sik Lee