Abstract: An etching plasma processing apparatus including a consumable metal member is disclosed. The etching plasma processing apparatus includes a vacuum chamber, a substrate support member arranged inside the chamber, a gas supply member for injecting gas into the chamber, a consumable part arranged inside the chamber and generating a metallic byproduct containing ions or radicals of a first metal when plasma is generated inside the chamber, a first electrode for applying power to generate plasma inside the chamber, a second electrode facing the first electrode, and a power supply supplying power to the first and second electrodes.

Abstract: A plasma processing apparatus may include a lower electrode supporting a wafer; a focus ring surrounding an edge of the lower electrode and having a ring shape; and an edge ring disposed in a position lower than a position of the focus ring. The focus ring may include a lower region and an upper region disposed on the lower region, and the upper region increases in electrical conductivity as the upper region is closer to the lower region.

Abstract: A plasma processing apparatus may include a lower electrode supporting a wafer; a focus ring surrounding an edge of the lower electrode and having a ring shape; and an edge ring disposed in a position lower than a position of the focus ring. The focus ring may include a lower region and an upper region disposed on the lower region, and the upper region increases in electrical conductivity as the upper region is closer to the lower region.

Abstract: A method for detecting wrong positioning of an earphone, and an electronic device and storage medium therefor are provided. The electronic device includes a speaker positioned on surface of a housing; and at least one processor configured to determine a positioning state of an earphone detachably connectable to the electronic device based on a difference between a first audio signal received through at least one microphone positioned in a first body of the earphone and a second audio signal received through at least one microphone positioned in a second body of the earphone.

Abstract: A plasma processing apparatus may include a lower electrode supporting a wafer; a focus ring surrounding an edge of the lower electrode and having a ring shape; and an edge ring disposed in a position lower than a position of the focus ring. The focus ring may include a lower region and an upper region disposed on the lower region, and the upper region increases in electrical conductivity as the upper region is closer to the lower region.

Abstract: Disclosed is a control method for an electronic device. An electronic device according to an embodiment comprises: at least one speaker; and a processor. The processor may be configured to: obtain sound source data; obtain first sound source data, corresponding to a first designated frequency band, from the sound source data by using a filter; generate second sound source data by applying sound effect to at least a portion of sound source data corresponding to a second designated frequency band among the sound source data; generate synthesized sound source data corresponding to the sound source data by synthesizing the first sound source data and the second sound source data; and output the synthesized sound source data through the at least one speaker. Other embodiments may also be possible.

Abstract: The inventive concept provides a method of manufacturing a semiconductor device using a plasma etching apparatus including an alignment chamber and a process chamber. The method includes: loading a wafer in the alignment chamber of the plasma etching apparatus; rotating the wafer loaded in the alignment chamber according to a plurality of heating zones arranged in an electrostatic chuck of the process chamber, thereby rotating a reference point of the wafer; transferring the wafer that was rotated in the alignment chamber onto the electrostatic chuck of the process chamber; and plasma-etching the wafer that was rotated in the alignment chamber on the electrostatic chuck of the process chamber.

Abstract: A method for detecting wrong positioning of an earphone, and an electronic device and storage medium therefor are provided. The electronic device includes a speaker positioned on surface of a housing; and at least one processor configured to determine a positioning state of an earphone detachably connectable to the electronic device based on a difference between a first audio signal received through at least one microphone positioned in a first body of the earphone and a second audio signal received through at least one microphone positioned in a second body of the earphone.

Abstract: The inventive concept provides a method of manufacturing a semiconductor device using a plasma etching apparatus including an alignment chamber and a process chamber. The method includes: loading a wafer in the alignment chamber of the plasma etching apparatus; rotating the wafer loaded in the alignment chamber according to a plurality of heating zones arranged in an electrostatic chuck of the process chamber, thereby rotating a reference point of the wafer; transferring the wafer that was rotated in the alignment chamber onto the electrostatic chuck of the process chamber; and plasma-etching the wafer that was rotated in the alignment chamber on the electrostatic chuck of the process chamber.

Abstract: Disclosed is a control method for an electronic device. An electronic device according to an embodiment comprises: at least one speaker; and a processor. The processor may be configured to: obtain sound source data; obtain first sound source data, corresponding to a first designated frequency band, from the sound source data by using a filter; generate second sound source data by applying sound effect to at least a portion of sound source data corresponding to a second designated frequency band among the sound source data; generate synthesized sound source data corresponding to the sound source data by synthesizing the first sound source data and the second sound source data; and output the synthesized sound source data through the at least one speaker. Other embodiments may also be possible.

Abstract: A method for detecting wrong positioning of an earphone, and an electronic device and storage medium therefor are provided. The electronic device includes a speaker positioned on surface of a housing; and at least one processor configured to determine a positioning state of an earphone detachably connectable to the electronic device based on a difference between a first audio signal received through at least one microphone positioned in a first body of the earphone and a second audio signal received through at least one microphone positioned in a second body of the earphone.

Abstract: A plasma processing apparatus includes a process chamber including an inner space; an electrostatic chuck on which a substrate is loaded in the process chamber; a side-gas injection unit that is installed above the electrostatic chuck and includes at least one gas nozzle having an inclined gas flow path that is inclined with respect to a nozzle axis to obliquely supply a process gas into the process chamber from a sidewall of the process chamber; a plasma generation unit configured to generate plasma from the process gas injected into the process chamber; and a controller configured to control the electrostatic chuck, the side-gas injection unit, and the plasma generation unit. The controller controls process parameters under a cyclic ramping condition in which a cycle of the process parameters is continuously increased or decreased.

Abstract: Methods of forming patterns for semiconductor devices are provided. A method may include preparing a substrate including an etch target layer on a surface of the substrate; forming a mask pattern that includes a lower masking layer having a first density and an upper masking layer having a second density that is less than the first density, on the etch target layer; forming spacers that cover sidewalls of the lower masking layer and the upper masking layer; removing the mask pattern; and etching the etch target layer by using the spacers as an etching mask.

Abstract: A method for detecting wrong positioning of an earphone, and an electronic device and storage medium therefor are provided. The electronic device includes a speaker positioned on surface of a housing; and at least one processor configured to determine a positioning state of an earphone detachably connectable to the electronic device based on a difference between a first audio signal received through at least one microphone positioned in a first body of the earphone and a second audio signal received through at least one microphone positioned in a second body of the earphone.

Abstract: A plasma processing apparatus includes a process chamber providing a space for plasma processing, a lower electrode that is in the process chamber, a surface of the lower electrode being for mounting a wafer thereon, an upper electrode that is in the process chamber and faces the lower electrode, a gas supplier configured to supply process gas between the upper electrode and the lower electrode, a focus ring arranged on the lower electrode to surround an edge of the wafer mounted on the lower electrode, an edge ring arranged below the focus ring and including first bodies that are separate from each other with a space therebetween, a plurality of heaters installed in the first bodies, and a heater controller configured to separately control driving of each of the heaters.

Abstract: The present disclosure provides an electronic device and method for playing image data. The method for playing back image data in an electronic device includes storing an audiovisual (A/V) data for a predetermined period of time in a memory of the electronic device. The electronic device plays back the A/V data, wherein upon playing back, by the electronic device, the A/V data comprises analyzing an audio signal of the A/V data dynamically to select one of a plurality of sound effects based on the analyzed audio signal. The A/V data is played back by applying the selected sound effect to at least a part of the A/V signal.

Abstract: Methods of forming patterns for semiconductor devices are provided. A method may include preparing a substrate including an etch target layer on a surface of the substrate; forming a mask pattern that includes a lower masking layer having a first density and an upper masking layer having a second density that is less than the first density, on the etch target layer; forming spacers that cover sidewalls of the lower masking layer and the upper masking layer; removing the mask pattern; and etching the etch target layer by using the spacers as an etching mask.

Abstract: A method terminal includes an apparatus for automatically adjusting volume in the terminal. An automatic volume adjuster extracts a representative volume from individual frame information of an audio file, and adjusts a master volume by a deviation between the extracted representative volume and a reference volume, and a controller plays the audio file with the master volume adjusted by the automatic volume adjuster.

Abstract: An exemplary embodiment of the present invention provides starch-based hot melt adhesive comprised of a composition including starch, a thermoplastic polymer, a tackifier, a plasticizer, and an adhesion promoter. The hot melt adhesive according to the exemplary embodiment of the present invention contains about 25 to 55 weight % of the starch which is infinitely renewable biomass, and, thus, it is less harmful and more eco-friendly and has a reduced manufacturing costs and is less sensitive to exhaustion of petroleum-based resources, as compared with the conventional hot melt adhesive mainly containing a petroleum-based material. Further, the hot melt adhesive according to the exemplary embodiment of the present invention imparts excellent adhesion strength and workability at the time of adhesion between different kinds of adherends such as a hydrophobic adherend and a hydrophilic adherend and can be applied to various fields such as packaging, bookbinding, construction, woodworking, and textile fields.