Patents by Inventor Jun Tomioka
Jun Tomioka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6383709Abstract: A positive resist composition which gives improved profile without lowering other properties such as sensitivity and resolution, and comprises an alkali-soluble novolak resin, a quinone diazide type radiation-sensitive agent and N-(n-octylsulfonyloxy)succinimideType: GrantFiled: March 21, 2001Date of Patent: May 7, 2002Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Jun Tomioka, Sang-Ho Lee
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Publication number: 20010051313Abstract: A positive resist composition which gives improved profile without lowering other properties such as sensitivity and resolution, and comprises an alkali-soluble novolak resin, a quinone diazide type radiation-sensitive agent and N-(n-octylsulfonyloxy) succinimideType: ApplicationFiled: March 21, 2001Publication date: December 13, 2001Inventors: Yasunori Uetani, Jun Tomioka, Sang-Ho Lee
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Patent number: 6068962Abstract: A non-chemically enhanced type positive resist composition includes an alkali-soluble novolak resin, a quinonediazide type sensitizer and at least one of the following compounds (a) and (b):(a) an acid-generator which is decomposed by the action of an alkali developer and generates an acid, and(b) compounds represented by the following formula (IV) or (V): ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 independently represents hydrogen, halogen, hydroxy, alkyl, alkoxy, aryl or nitro, each of R.sup.9 and R.sup.10 independently represents hydrogen, halogen, alkyl, aryl, nitro, a group of --(CH.sub.2).sub.n --OR.sup.11 or a group of --(CH.sub.2).sub.n --COOR.sup.12 in which R.sup.11 represents hydrogen, alkyl, aryl or alkanoyl and R.sup.12 represents hydrogen, alkyl or aryl, and n is a number from 0 to 3 and R.sup.13 represents hydrogen, halogen, alkyl, alkoxy or aryl.Type: GrantFiled: September 19, 1997Date of Patent: May 30, 2000Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Hiroshi Moriuma, Jun Tomioka
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Patent number: 5965748Abstract: N-(10-camphorsulfonyloxy)-succinimide represented by the formula (I): ##STR1## is provided, which can be produced by reacting N-hydroxysuccinimide with 10-camphorsulfonic acid, a salt thereof or a halide thereof. Using the compound as an acid generating agent, a resist composition can be obtained by including an alkali-soluble resin having a protective group removable by the action of an acid; and the resist composition is excellent in heat resistance, ratio of residual film thickness after developing, uniformity of film thickness, profile, photospeed and resolution and is improved in the time delay effect and attachment of pattern.Type: GrantFiled: April 3, 1998Date of Patent: October 12, 1999Assignee: Sumitomo Chemical Company, LimitedInventors: Akira Kamabuchi, Naoki Takeyama, Jun Tomioka, Haruyoshi Osaki
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Patent number: 5726217Abstract: A tetraphenol compound represented by the formula (I): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 represent hydrogen 1,2-naphthoquinonediazide-4-sulfonyl or 1,2-naphthoquinonediazide-5-sulfonyl and a method for producing the compound are provided, and the compound can be used as a photosensitizer for a positive resist which exhibits superior properties.Type: GrantFiled: March 8, 1996Date of Patent: March 10, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Haruyoshi Osaki, Jun Tomioka
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Patent number: 5714620Abstract: A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.Type: GrantFiled: August 27, 1996Date of Patent: February 3, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5587492Abstract: A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.Type: GrantFiled: April 18, 1995Date of Patent: December 24, 1996Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5556995Abstract: A process for preparing the polyhydric phenol compounds represented by the formula (I): ##STR1## (wherein R.sub.1, R.sub.2 and R.sub.3 represent independently hydrogen atom, alkyl group, etc.) which comprises subjecting the compounds represented by the formula (II): ##STR2## (wherein R.sub.1, R.sub.2 and R.sub.3 are as defined above) to a condensation reaction with pyrogallol in the presence of an organic solvent and an acid catalyst.Type: GrantFiled: January 26, 1995Date of Patent: September 17, 1996Assignee: Sumitomo Chemical Co., Ltd.Inventors: Naoko Suzuki, Hirotoshi Nakanishi, Jun Tomioka
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Patent number: 5436107Abstract: A positive resist composition which comprises, in admixture, an alkali-soluble resin; at least one quinone diazide sulfonate of a polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group; anda quinone diazide sulfonate of a phenol compound of the formula ##STR2## wherein R.sub.6 to R.sub.10 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.6 and R.sub.7 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group.Type: GrantFiled: March 18, 1992Date of Patent: July 25, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5413895Abstract: A positive resist composition comprising an alkali-soluble resin containing a novolak resin which is obtained by a condensation reaction of a phenol compound and a carbonyl compound and has an area in a GPC pattern of a range in that a molecular weight as converted to polystyrene is not larger than 900 not exceeding 20% of a whole pattern area excluding the unreacted phenol compound, a quinonediazide compound and a polyphenol compound of the formula: ##STR1## in which R.sub.1 and R.sub.2 are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a group: --OCOR.sub.3 in which R.sub.3 is an alkyl group or a phenyl group, x and y are independently an integer of 1 to 3, and m is an integer of 0 to 4, wherein a weight ratio of said polyphenol compound (I) to said alkali-soluble resin is from 3:10 to 5:10, which is excellent in heat resistance, sensitivity, resolution and a depth of focus and leaves no scum after development.Type: GrantFiled: August 18, 1992Date of Patent: May 9, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Yasunori Uetani, Ayako Ida
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Patent number: 5407779Abstract: A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid ester of at least one phenol compound represented by the following general formulas: ##STR1## wherein R.sub.1 represents hydrogen, halogen, or the like; R.sub.3 represents alkyl or phenyl; x represents 1-3; Q.sub.1 to Q.sub.12 represent hydrogen, alkyl or phenyl; and Z.sub.1 to Z.sub.5 represent the groups of the following formulas: ##STR2## wherein R.sub.2 is hydrogen, halogen or the like; R.sub.3 is as defined above; y is 1-3; and p is 0 or 1. This positive resist composition is excellent in the balance between properties such as resolution, profile, depth of focus, etc.Type: GrantFiled: June 4, 1993Date of Patent: April 18, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Jun Tomioka, Hirotoshi Nakanishi
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Patent number: 5407778Abstract: A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid diester of at least one member selected from the phenol compounds represented by the following general formulas: ##STR1## wherein R.sub.1 and R.sub.2 each represent hydrogen, halogen, --OCOR.sub.3, alkyl or alkoxy in which R.sub.3 represents alkyl or phenyl, x and y each represent 1, 2 or 3, and R, R.sub.o, R' and R.sub.o ' each represent hydrogen atom, alkyl or phenyl group; wherein the content of said diester is 50% or greater based on the total light-sensitive quinonediazide material. This composition is excellent in the balance between properties such as resolution, profile and depth of focus.Type: GrantFiled: May 13, 1993Date of Patent: April 18, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Jun Tomioka, Hirotoshi Nakanishi
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Patent number: 5354644Abstract: A photoresist composition which includes a sensitizing compound, a resin and, as a light absorber, a styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15.Type: GrantFiled: September 1, 1992Date of Patent: October 11, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akihiro Furuta, Takeshi Hioki, Jun Tomioka
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Patent number: 5290656Abstract: A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group; X is ##STR2## in which R.sub.1 and R.sub.2 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo-alkyl group, an alkoxy group or an aryl group, provided that when at least one of R.sub.1 and R.sub.Type: GrantFiled: January 19, 1993Date of Patent: March 1, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto, Fumio Oi, Jun Tomioka
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Patent number: 5283324Abstract: A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.Type: GrantFiled: April 17, 1992Date of Patent: February 1, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Hiroshi Takagaki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa
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Patent number: 5220027Abstract: This invention provides azamethine compounds represented by the formula (I): ##STR1## wherein X represents ##STR2## R.sub.1 to R.sub.4 represent independently a hydrogen atom, an alkyl group, an alkoxyl group, a halogen atom, a nitro group, a cyano group, a hydroxyl group, an amino group, ##STR3## R.sub.5 and R.sub.6 represent independently a hydrogen atom or an alkyl group which may be substituted by a hydroxyl group; R.sub.7 represents a hydrogen atom, an alkyl group, an alkyoxyl group, a hydroxyl group, a halogen atom, a nitro group, a cyano group, ##STR4## wherein -A represents ##STR5## and R and R' represent independently a hydrogen atom or an alkyl group; and R.sub.10 to R.sub.12 represent independently a hydrogen atom or an alkyl group, a process for producing such compounds, and a medium for recording optical information using these compounds.Type: GrantFiled: April 12, 1991Date of Patent: June 15, 1993Assignee: Sumitomo Chemical Company, LimitedInventors: Takeshi Hioki, Kiyoteru Kojima, Jun Tomioka
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Patent number: 5218136Abstract: A styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composition.Type: GrantFiled: December 27, 1988Date of Patent: June 8, 1993Assignee: Sumitomo Chemical Company, LimitedInventors: Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akirhiro Furuta, Takeshi Hioki, Jun Tomioka
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Patent number: 5136054Abstract: This invention provides azamethine compounds represented by the formula (I): ##STR1## (wherein X represents ##STR2## Y represents C.dbd.O, C.dbd.C(CN).sub.2 or SO.sub.2 ; R.sub.1 to R.sub.4 represent independently a hydrogen atom, an alkyl group which may be substituted, an alkoxyl group which may be substituted, a halogen atom, a nitro group, a cyano group, a hydroxyl group, an amino group which may be substituted, --A--R or ##STR3## R.sub.5 and R.sub.6 represent independently a hydrogen atom, an alkyl group which may be substituted, an aryl group which may be substituted or a cyclohexyl group; R.sub.5 and R.sub.6 may be combined to form a ring or may form a ring with a hetero atom; R.sub.7 and R.sub.Type: GrantFiled: April 12, 1990Date of Patent: August 4, 1992Assignee: Sumitomo Chemical Company, LimitedInventors: Takeshi Hioki, Kiyoteru Kojima, Jun Tomioka
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Patent number: 5080997Abstract: A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.Type: GrantFiled: December 5, 1989Date of Patent: January 14, 1992Assignee: Sumitomo Chemical Company, LimitedInventors: Takeshi Hioki, Koji Kuwana, Jun Tomioka, Hirotoshi Nakanishi, Yasunori Uetani, Yukio Hanamoto, Fumio Oi
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Patent number: 5061796Abstract: This invention provides azamethine compounds represented by the formula (I): ##STR1## (wherein X represents ##STR2## Y represents C.dbd.O, C.dbd.C(CN).sub.2 or SO.sub.2 ; R.sub.1 to R.sub.4 represent independently a hydrogen atom, an alkyl group which may be substituted, an alkoxyl group which may be substituted, a halogen atom, a nitro group, a cyano group, a hydroxyl group, an amino group which may be substituted, ##STR3## R.sub.5 and R.sub.6 represent independently a hydrogen atom, an alkyl group which may be substituted, an aryl group which may be substituted or a cyclohexyl group; R.sub.5 and R.sub.6 may be combined to form a ring or may form a ring with a hetero atom; R.sub.7 and R.sub.Type: GrantFiled: July 21, 1989Date of Patent: October 29, 1991Assignee: Sumitomo Chemical Company, Ltd.Inventors: Takeshi Hioki, Kiyoteru Kojima, Jun Tomioka