Patents by Inventor Jun Yashiro

Jun Yashiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8410379
    Abstract: An electric operating device includes an operation member for operating to activate a plurality of electric functions provided at a vehicle seat. An operating structure for switching a pivoting position of the operation member is configured as a switching structure for selecting the electric function that is an operational object. Further, an operating structure for switching a slide position in a diametrical direction of the operation member is configured as an operation control structure by which the electric function selected as the operational object is operated to activate. Further, a pushing operation structure of the operation portion is configured as a switching structure for switching a category of an electric function group. The pushing operating structure of the operation member is provided with a return mechanism for returning the operation member operated to be pushed to an initial position taken before the pushing operation by urging the operation member.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: April 2, 2013
    Assignee: Toyota Boshoku Kabushiki Kaisha
    Inventors: Satoru Kuno, Toshihide Azuma, Hisato Shimomura, Jun Yashiro, Yukio Kanzaki
  • Patent number: 8367949
    Abstract: An electric operating device includes an operation member for operating to activate a plurality of electric functions provided at a vehicle seat. The operation member is disposed at a position outside of the vehicle seat allowing operation by a seated person seated on the vehicle seat. The operation member is constructed to be capable of operating to pivot about an axis and operating to move to slide in a diametrical direction. Further, an operation structure for pivoting about the axis for switching a pivoting position of the operation member is configured as an electric function mode switching structure for selecting the electric function as an operational object from the plurality of electric functions. Further, a slide moving operating structure for switching a slide position in the diametrical direction of the operation member is configured as an activation control structure for operating to activate the electric function selected as the operational object.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: February 5, 2013
    Assignee: Toyota Boshoku Kabushiki Kaisha
    Inventors: Satoru Kuno, Toshihide Azuma, Hisato Shimomura, Jun Yashiro, Yukio Kanzaki
  • Patent number: 8303719
    Abstract: A deposit removing method that can reliably remove deposit produced in plasma processing using plasma produced from a process gas containing methane gas and oxygen gas. In a chamber in which an electrode to which radio frequency electrical power is supplied is disposed, plasma processing is carried out on a substrate using the plasma produced from the process gas containing methane gas and oxygen gas, and then a cleaning step is carried out in which plasma is produced from a mixed gas containing fluorinated compound gas containing hydrogen in the chamber.
    Type: Grant
    Filed: February 19, 2009
    Date of Patent: November 6, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Sungtae Lee, Yusuke Nakagawa, Jun Yashiro
  • Patent number: 8177990
    Abstract: Disclosed is a method of etching a substrate having a layered structure in which a photoresist mask with a pattern, a coating film made of silicon oxide, and an organic film are laminated in that order from the top. Before etching the coating film of silicon oxide, a deposit is deposited on the photoresist mask by using plasma generated from a hydrocarbon gas such as CH4 gas so as to narrow the size of openings in the pattern of the photoresist mask. The pattern of the photoresist mask is well transferred to the organic film through the coating film, and a pattern with openings having a high aspect ratio can be formed in the organic film and toppling of the pattern in the organic film can be prevented. The organic film with the transferred pattern is used as an etch mask for etching the underlying layer.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: May 15, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Ryou Mochizuki, Jun Yashiro
  • Publication number: 20100044202
    Abstract: An electric operating device includes an operation member for operating to activate a plurality of electric functions provided at a vehicle seat. The operation member is disposed at a position outside of the vehicle seat allowing operation by a seated person seated on the vehicle seat. The operation member is constructed to be capable of operating to pivot about an axis and operating to move to slide in a diametrical direction. Further, an operation structure for pivoting about the axis for switching a pivoting position of the operation member is configured as an electric function mode switching structure for selecting the electric function as an operational object from the plurality of electric functions. Further, a slide moving operating structure for switching a slide position in the diametrical direction of the operation member is configured as an activation control structure for operating to activate the electric function selected as the operational object.
    Type: Application
    Filed: October 12, 2007
    Publication date: February 25, 2010
    Applicant: TOYOTA BOSHOKU KABUSHIKI KAISHA
    Inventors: Satoru Kuno, Toshihide Azuma, Hisato Shimomura, Jun Yashiro, Yukio Kanzaki
  • Publication number: 20090294259
    Abstract: An electric operating device includes an operation member for operating to activate a plurality of electric functions provided at a vehicle seat. An operating structure for switching a pivoting position of the operation member is configured as a switching structure for selecting the electric function that is an operational object. Further, an operating structure for switching a slide position in a diametrical direction of the operation member is configured as an operation control structure by which the electric function selected as the operational object is operated to activate. Further, a pushing operation structure of the operation portion is configured as a switching structure for switching a category of an electric function group. The pushing operating structure of the operation member is provided with a return mechanism for returning the operation member operated to be pushed to an initial position taken before the pushing operation by urging the operation member.
    Type: Application
    Filed: October 12, 2007
    Publication date: December 3, 2009
    Applicant: TOYOTA BOSHOKU KABUSHIKI KAISHA
    Inventors: Satoru Kuno, Toshihide Azuma, Hisato Shimomura, Jun Yashiro, Yukio Kanzaki
  • Publication number: 20090205678
    Abstract: A deposit removing method that can reliably remove deposit produced in plasma processing using plasma produced from a process gas containing methane gas and oxygen gas. In a chamber in which an electrode to which radio frequency electrical power is supplied is disposed, plasma processing is carried out on a substrate using the plasma produced from the process gas containing methane gas and oxygen gas, and then a cleaning step is carried out in which plasma is produced from a mixed gas containing fluorinated compound gas containing hydrogen in the chamber.
    Type: Application
    Filed: February 19, 2009
    Publication date: August 20, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Sungtae LEE, Yusuke Nakagawa, Jun Yashiro
  • Publication number: 20070284337
    Abstract: Disclosed is a method of etching a substrate having a layered structure in which a photoresist mask with a pattern, a coating film made of silicon oxide, and an organic film are laminated in that order from the top. Before etching the coating film of silicon oxide, a deposit is deposited on the photoresist mask by using plasma generated from a hydrocarbon gas such as CH4 gas so as to narrow the size of openings in the pattern of the photoresist mask. The pattern of the photoresist mask is well transferred to the organic film through the coating film, and a pattern with openings having a high aspect ratio can be formed in the organic film and toppling of the pattern in the organic film can be prevented. The organic film with the transferred pattern is used as an etch mask for etching the underlying layer.
    Type: Application
    Filed: March 29, 2007
    Publication date: December 13, 2007
    Inventors: Ryou Mochizuki, Jun Yashiro
  • Patent number: 6441325
    Abstract: A multidirectional input device is disclosed wherein one rotary electric part and two first and second push-switches are operated by one operating member. In comparison with the prior art, a larger number of electric parts can be operated and thus the multidirectional input device is suitable for use in a portable electronic device for which various functions are required.
    Type: Grant
    Filed: March 7, 2001
    Date of Patent: August 27, 2002
    Assignee: Alps Electric Co., Ltd.
    Inventors: Kisaburo Takahashi, Jun Yashiro
  • Publication number: 20010020573
    Abstract: A multidirectional input device is disclosed wherein one rotary electric part and two first and second push-switches are operated by one operating member. In comparison with the prior art, a larger number of electric parts can be operated and thus the multidirectional input device is suitable for use in a portable electronic device for which various functions are required.
    Type: Application
    Filed: March 7, 2001
    Publication date: September 13, 2001
    Applicant: Alps Electric Co., Ltd.
    Inventors: Kisaburo Takahashi, Jun Yashiro
  • Patent number: 5494522
    Abstract: A plasma process system for producing gas plasma in an air-tight chamber by high frequency power to process a substrate with the gas plasma comprising a lower electrode on which the substrate to be plasma-processed is mounted, an upper electrode arranged above the lower electrode, a plasma generator circuit for generating plasma between the upper and the lower electrode, a power source for supplying high frequency power to the plasma generator circuit, and bias generator for generating negative voltage in the upper or lower electrode when high frequency power is supplied from the power source to the upper or lower electrode, wherein the plasma generator circuit includes transformer for supplying a part of high frequency power, which is supplied from the power source, to the bias generator.
    Type: Grant
    Filed: March 17, 1994
    Date of Patent: February 27, 1996
    Assignee: Tokyo Electron Limited
    Inventors: Shuji Moriya, Masahiro Ogasawara, Jun Yashiro, Yoshifumi Tahara, Satoru Kawakami, Susumu Tanaka